1 - 11 |
Structure and Chemistry of CuInSe2 for Solar-Cell Technology - Current Understanding and Recommendations Rockett A, Abouelfotouh F, Albin D, Bode M, Ermer J, Klenk R, Lommasson T, Russell TW, Tomlinson RD, Tuttle J, Stolt L, Walter T, Peterson TM |
12 - 15 |
Structural Investigations on Laser-Deposited Hydroxyapatite Films Torrisi L |
16 - 18 |
Preparation of ZnO Films by Reactive Evaporation Jin M, Ying LS |
19 - 21 |
Chemically-Induced Anisotropy in Antibody Langmuir-Blodgett-Films Facci P, Erokhin V, Antolini F, Nicolini C |
22 - 24 |
Strain Dependence of Binding-Energies for Carbon Adatoms on the Si(100) Surface Halicioglu T |
25 - 28 |
Comparative-Study of Hypersonic Dynamics in CaF2 and SrF2 Films on Si(111) Aleksandrov VV, Potapova JB, Diakonov AM, Yakovlev NL |
29 - 31 |
Alkaline Bath Chemical-Deposition of Antimony (III) Sulfide Thin-Films Desai JD, Lokhande CD |
32 - 37 |
Boron-Nitride Films Prepared by Remote Plasma-Enhanced Chemical-Vapor-Deposition from Borazine (B3N3H6) Smirnova TP, Jakovkina LV, Jashkin IL, Sysoeva NP, Amosov JI |
38 - 47 |
Role of Additive in the Physico-Chemistry of Graphite-Based Transfer Films Langlade C, Fayeulle S, Olier R |
48 - 56 |
Pulsed-Laser Deposition of BN Onto Silicon (100) Substrates at 600-Degrees-C Friedmann TA, Mccarty KF, Klaus EJ, Barbour JC, Clift WM, Johnsen HA, Medlin DL, Mills MJ, Ottesen DK |
57 - 65 |
Compositional and Structural-Analysis of Aluminum-Oxide Films Prepared by Plasma-Enhanced Chemical-Vapor-Deposition Kim YC, Park HH, Chun JS, Lee WJ |
66 - 71 |
Electrodeposition of CuInSe2 Thin-Films from Aqueous Citric Solutions .1. Influence of Potential and Mass-Transfer Rate on Composition and Structure of Films Molin AN, Dikusar AI, Kiosse GA, Petrenko PA, Sokolovsky AI, Saltanovsky YG |
72 - 77 |
Electrodeposition of CuInSe2 Thin-Films from Aqueous Citric Solutions .2. Investigation of Macrokinetics of Electrodeposition by Means of Rotating-Disk Electrode Molin AN, Dikusar AI |
78 - 86 |
Microstructure and Electrical-Resistivity of Tin Films Deposited on Heated and Negatively Biased Silicon Substrates Maheo D, Poitevin JM |
87 - 90 |
Phthalocyanines Ultrathin Alternating Layer Film on Silicon, Prepared by Molecular-Beam Deposition Nonaka T, Date T, Tomita S, Nagai N, Nishimura M, Murata Y, Ishitani A |
91 - 97 |
X-Ray Photoelectron and Vibrational Spectroscopic Studies of Te-C-H Films for Optical Disk Memory Ohkawa H, Matsubara M, Yasuda N, Ozawa N |
98 - 104 |
Low-Temperature Epitaxial-Growth of Undoped and N-Doped Silicon by Photochemical Vapor-Deposition Using SiH4/Sih2Cl2/H-2/PH3 Mixtures Alonso JC, Oshima T, Yamada A, Konagai M, Takahashi K |
105 - 111 |
Preparation and Properties of Amorphous TiO2 Thin-Films by Plasma-Enhanced Chemical-Vapor-Deposition Lee WG, Woo SI, Kim JC, Choi SH, Oh KH |
112 - 117 |
The Effect of Substrate-Temperature on the Properties of Sputtered Tin Oxide-Films Meng LJ, Dossantos MP |
118 - 123 |
Electrodeposition of Zinc Selenide Natarajan C, Sharon M, Levyclement C, Neumannspallart M |
124 - 128 |
GaN Films Prepared by ECR Plasma-Assisted Deposition Zhang S, Brodie DE |
129 - 133 |
Thermodynamical Study of the Preparation of CuInSe2 Thin-Films in Vertical Closed Tube Systems Masse G, Djessas K |
134 - 140 |
Electron Spectroscopic Study of the Growth, Composition and Stability of Gesx Films Prepared in Ultra-High-Vacuum Horton JH, Moggridge GD, Ormerod RM, Kolobov AV, Lambert RM |
141 - 147 |
Structural and Optoelectronic Properties of Chemically Deposited Cuxs Thin-Film and the Precipitate Fernandez AM, Sebastian PJ, Campos J, Gomezdaza O, Nair PK, Nair MT |
148 - 154 |
Electrooxidation of Ethanolamine on Modified Layers of Cu-Ni Alloys in Alkaline Environment Niedbala J, Budniok A, Matyja P |
155 - 159 |
Growth and Crystallographic, Surface and Defect Structures of Antimony Particles Deposited in a High-Resolution Transmission Electron-Microscope Isshiki T, Nishio K, Saijo H, Shiojiri M |
160 - 163 |
Microstructure and Composition Analysis of PbTiO3 Films Zhong WL, Wang YG, Kong DS, Zhang PL, Qu BD |
164 - 171 |
Influence of Oxygen Partial-Pressure on the Adhesion of Metallic-Films Evaporated on Pet Silvain JF, Veyrat A, Ehrhardt JJ |
172 - 174 |
Oxidation Behavior of AISI-304 Steel in the Presence of Na2SO4 and Fe-2(SO4)(3) at 973 K Amin MM |
175 - 180 |
Surface Characterization of Nitrogen-Ion-Implanted Etched and Polished AISI-316 Stainless-Steel Aggarwal S, Goel AK, Mohindra RK, Ghosh PK, Bhatnagar MC |
181 - 186 |
Studies on the Interfaces and Adhesion Mechanisms in Reinforced Diamond Composite Coatings Tsai C, Nelson JC, Gerberich WW, Liu DZ, Heberlein J, Pfender E |
187 - 192 |
Hall-Effect in MnTe Films Angadi MA, Thanigaimani V |
193 - 199 |
Changes of the Optical-Properties of Plasma Polymer Silver Composite Films Caused by Laser-Annealing Werner J, Heilmann A, Hopfe V, Homilius F, Steiger B, Stenzel O |
200 - 207 |
Influence of Low-Energy Ion-Bombardment on the Properties of Tin Films Deposited by RF Magnetron Sputtering Jouan PY, Lemperiere G |
208 - 212 |
Mossbauer Study of Fe-Al-O Layers Obtained by Ion-Beam Deposition and Ion-Implantation Thimon F, Marest G, Moncoffre N |
213 - 216 |
Phase-Formation in Films of the As2Se3-Yb System Efendiyev EG, Hajiyev ES, Shafizade RB, Ilyasov TM |
217 - 224 |
Structure and Morphology of Langmuir-Blodgett-Films of Rod-Like Poly(Phthalocyaninato Germoxane)S, Studied by Transmission Electron-Microscopy Embs FW, Thomas EL, Gittinger A, Dulog L |
225 - 230 |
Scanning-Tunneling-Microscopy Imaging of Conducting Langmuir-Blodgett-Films Mule M, Stussi E, Derossi D, Berzina TS, Troitsky VI |
231 - 235 |
Structure and Optical-Properties of Langmuir-Blodgett-Films Based on Ladder-Type Polyheteroarylenes Prepared via Polymer Precursor Bliznyuk VN, Ponomarev II, Rusanov AL |
236 - 243 |
The Lamellar-Columnar Transition in Langmuir-Blodgett Multilayers of Cadmium Soaps Merle HJ, Steitz R, Pietsch U, Peterson IR |
244 - 249 |
Molecular Arrangement and Polycondensation of Octadecyl Esters of Aromatic-Amino-Acids in Langmuir-Blodgett-Films Liu MH, Nakahara H, Shibasaki Y, Fukuda K |
250 - 254 |
C-Adsorption Behavior of Thin Fluoride Films Kaiser U, Kaiser N |
255 - 267 |
Comparative-Study of Large Grains and High-Performance TFTs in Low-Temperature Crystallized LPCVD and APCVD Amorphous-Silicon Films Panwar OS, Moore RA, Raza SH, Gamble HS, Armstrong BM |
268 - 271 |
Stability of Conductance in Electroinactive Polypyrrole Osaka T, Jiang ZY, Momma T, Kanagawa H |
272 - 276 |
Doping Mechanisms of Phthalocyanines by Oxidizing Gases - Application to Gas Sensors Passard M, Pauly A, Blanc JP, Dogo S, Germain JP, Maleysson C |
277 - 281 |
Excitation of Surface-Plasmons on Titanium Nitride Films - Determination of the Dielectric Function Steinmullernethl D, Kovacs R, Gornik E, Rodhammer P |
282 - 290 |
Structural Characterization of Si/Ge Superlattices Grown on an Si(001) Surface by Molecular-Beam Epitaxy Tamagawa T, Shintani T, Ueba H, Tatsuyama C, Nakagawa K, Miyao M |
291 - 296 |
X-Ray, Reflection High Electron-Energy Diffraction and X-Ray Photoelectron-Spectroscopy Studies of InSe and Gamma-In2Se3 Thin-Films Grown by Molecular-Beam Deposition Brahimotsmane L, Emery JY, Eddrief M |
297 - 309 |
Elastic and Structural-Properties of fcc (111) Thin-Films .2. A Monolayer on a (110) Bcc Substrate Vandermerwe JH, Tonsing DL, Stoop PM |
310 - 313 |
Light-Induced-Changes in the Photoconductivity of Rapidly-Deposited Hydrogenated Amorphous-Silicon Films Lin XY, Wang H, Lin KX, Yu YP, Fu SL |
314 - 319 |
Characterization of Spin-Coated Silicate and Phosphosilicate Thin-Films Prepared by the Sol-Gel Method Nam CW, Woo SI |
320 - 325 |
Observation of Nonideal Lithium Insertion into Sputtered Thin-Films of Tungsten-Oxide Burdis MS, Siddle JR |
326 - 326 |
Dark-Field Electron-Microscopy of Langmuir-Blodgett-Films of Fatty-Acids and Their Barium Salts (Vol 223, Pg 358, 1993) Matsumoto M, Uyeda N, Fujiyoshi Y, Aoyama K |