1 - 3 |
On the properties of CuxC1-xTe: a novel semiconductor alloy Jimenez-Sandoval S, Lopez-Lopez S, Chao BS, Melendez-Lira M |
4 - 7 |
Probing the surface forces of atomic layered SrTiO3 films by atomic force microscopy Tanaka H, Tabata N, Kawai T |
8 - 10 |
Yellow organic electroluminescent device based on novel thiophene Al complex as an emitting layer Okada K, Wang YF, Nakaya T |
11 - 14 |
Structural and magnetoresistive properties of sputtered Co/Cu multilayers in the vicinity of the first maximum of magnetoresistance Rozenberg E, Mogilaynski D, Pelleg J, Gorodetsky G, Somekh R |
15 - 19 |
Characteristics and sensing properties of dipped La0.8Sr0.2Co1-xNixO3-delta film for CO gas sensors Chiu CM, Chang YH |
20 - 29 |
Effects of octa decyl thiol (ODT) treatment on the gallium arsenide surface and interface state density Remashan K, Bhat KN |
30 - 34 |
Growth behavior and surface morphology of Ag rough thin films deposited on silicone oil surfaces Feng CM, Ge HL, Tong MR, Ye GX, Jiao ZK |
35 - 41 |
Electrostatic sol-spray deposition (ESSD) and characterisation of nanostructured TiO2 thin films Chen CH, Kelder EM, Schoonman J |
42 - 46 |
Phase diagrams for CVD diamond deposition from halogen-containing gas phase Liu ZJ, Zhang DW, Zhang JY, Wan YZ, Wang JT |
47 - 51 |
Characterization of boron-doped tin oxide thin films Nasser SA |
52 - 60 |
Mechanical and chemical properties of organic coatings applied to metallic sheet substrates Roche AA, Guillemenet J |
61 - 66 |
Pulsed laser deposition of conducting porous La-Sr-Co-O films Chen X, Wu NJ, Ritums DL, Ignatiev A |
67 - 73 |
The effects of ion irradiation on NiTi shape memory alloy thin films Goldberg F, Knystautas EJ |
74 - 82 |
Influence of oxygen and nitrogen on the growth of hot-filament chemical vapor deposited diamond films Yu Z, Karlsson U, Flodstrom A |
83 - 92 |
Mechanical, optical and structural properties of TiO2 and MgF2 thin films deposited by plasma ion assisted deposition Atanassov G, Turlo J, Fu JK, Dai YS |
93 - 99 |
Evidence of omega-phase in ion beam sputtered zirconium thin films Pichon L, Girardeau T, Lignou F, Straboni A |
100 - 107 |
Tungsten-containing amorphous carbon films deposited by pulsed vacuum arc Monteiro OR, Delplancke-Ogletree MP, Brown IG |
108 - 112 |
Growth of spinel zinc thioindionate thin film by single-source MOCVD Nomura R, Matsuda H, Miyai T, Baba A |
113 - 118 |
Effects of organic As-precursors on the incorporation of In and Ga into (GaIn)As films grown by metal-organic vapor-phase epitaxy Kirpal G, Gerhardt M, Gottschalch V, Franzheld R, Semmelhack HC |
119 - 126 |
Films obtained by plasma polymerization of pyrrole Cruz GJ, Morales J, Olayo R |
127 - 135 |
Structural investigations on ultrathin Mo layers in a-Si : H with emphasis on the island-continuous layer transition Lohmann M, Klabunde F, Blasing J, Veit P, Drusedau T |
136 - 141 |
Electrical and gated photoluminescence intensity studies on Schottky and oxidized Schottky structures Ahaitouf A, Bath A |
142 - 147 |
In situ photoluminescence characterization of porous silicon formation Chi N, Phillips DL, Chan KY |
148 - 152 |
Photoelectrochemical studies of dye-sensitized polycrystalline titanium oxide thin films prepared by sputtering Gomez M, Rodriguez J, Lindquist SE, Granqvist CG |
153 - 159 |
Simple method for the determination of optical parameters of inhomogeneous thin films De Caro L, Ferrara MC |
160 - 166 |
Characterization of SnO2 thin films through thermoelectric power measurements Gordillo G, Paez B, Jacome C, Florez JM |
167 - 173 |
Free-carrier plasma resonance effects and electron transport in reactively sputtered degenerate ZnO : Al films Brehme S, Fenske F, Fuhs W, Nebauer E, Poschenrieder M, Selle B, Sieber I |
174 - 179 |
An X-ray diffraction study of interface roughness and diffusion in Ag/Pd superlattices Temst K, Van Bael MJ, Van Haesendonck C, Bruynseraede Y, de Groot DG, Koeman N, Griessen R |
180 - 183 |
Electroepitaxy: the control of the kinetics and morphology of InSb Borisova LA, Akkerman ZL, Koretskaya TP |
184 - 187 |
Enhancement of TiC/stainless steel interfaces by N+-implantation Kang TW, Hong CY, Chung CK, Kim TW |
188 - 193 |
Hardness enhancement of sputtered Ni3Al/Ni multilayers Tixier S, Boni P, Van Swygenhoven H |
194 - 200 |
Tribological performance and tribochemistry of nanocrystalline WC/amorphous diamond-like carbon composites Voevodin AA, O'Neill JP, Zabinski JS |
201 - 206 |
Elastic modulus of plasma-sprayed coatings determined by indentation and bend tests Kim HJ, Kweon YG |
207 - 213 |
Adhesion and failure mechanisms of tungsten-carbon containing multilayered and graded coatings subjected to scratch tests Harry E, Rouzaud A, Juliet P, Pauleau Y |
214 - 220 |
Thin film TiC/TaC thermocouples Bhatt HD, Vedula R, Desu SB, Fralick GC |
221 - 229 |
Chemical vapor etching of copper using oxygen and 1,1,1,5,5,5-hexafluoro-2,4-pentanedione Steger R, Masel R |
230 - 237 |
Ellipsometric studies of porous silicon Makara VA, Odarych VA, Vakulenko OV, Dacenko OI |
238 - 243 |
The surface reaction and diffusion of NO2 in lead phthalocyanine thin film Ju YH, Hsieh C, Liu CJ |
244 - 248 |
Scanning photothermal beam deflection- and scanning photothermal displacement-imaging of polymer channel waveguides: a comparison Kreiter MJS, Mittler-Neher S |
249 - 256 |
Enhanced-Raman scattering from organic thin films in an attenuated total reflection geometry mediated by half-leaky guided modes Hayashi S, Kitagawa T, Sekiguchi Y, Kume T |
257 - 261 |
Analytical design of antireflection coatings for silicon photovoltaic devices Nubile P |
262 - 265 |
Study of single and double Si delta-doped GaAs layers by spectral photoconductivity measurements Oswald J, Pastrnak J, Karel F, Petricek O, Salokatve A |
266 - 269 |
Copper-oxide thin films prepared from Langmuir-Blodgett films Schurr M, Seidl M, Brugger A, Voit H |
270 - 276 |
Study of mixed system in monolayers and multilayers transferred by Langmuir-Blodgett technique Shembekar VR, Dhanabalan A, Talwar SS, Contractor AQ |
277 - 281 |
Monolayers and Langmuir-Blodgett films of a palladium(II)-tetraazaporphyrin Ricceri R, Ricciardi G, Lelj F, Martini G, Gabrielli G |
282 - 290 |
Aluminium oxide tunnel junctions: influence of preparation technique, sample geometry and oxide thickness Diesing D, Hassel AW, Lohrengel MM |
291 - 296 |
Structure and microtribological behavior of Teflon and Teflon/Si3N4 micro-assembling film Wang JH, Lu XC, Wen SZ, Li HD, Wang LD |
297 - 306 |
Morphology changes of thin Pd films grown on SiO2: influence of adsorbates and temperature Eriksson M, Olsson L, Helmersson U, Erlandsson R, Ekedahl LG |
307 - 311 |
Low-energy electron diffraction, Scanning tunneling microscopy and X-ray photoemission spectroscopy investigations of DMe-DCNQI on Cu(110) Kopf H, Seidel C, Fuchs H |
312 - 316 |
Photoconductivity of Si/Ge buffers, superlattices, and multiple quantum wells Menzel D, Koschinski W, Dettmer K, Schoenes J |
317 - 317 |
New gamma-In2Se3/TCO (SnO2 or ZnO) thin films rectifying heterojunction (vol 315, pg 5, 1998) Marsillac S, Bernede JC, Emziane M, Conan A |
318 - 318 |
Valence band splitting in Cd(1-x)ZnxTe epilayers (vol 336, pg 205, 1998) Cohen K, Beserman R, Stolyarova S, Weil R, Nemirovsky Y |