Thin Solid Films

Thin Solid Films, Vol.347, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (47 articles)

1 - 13	Selection of dielectrics for alternating-current thin-film electroluminescent device Krasnov AN
14 - 24	Process-kinetics in facing targets sputtering of multi-component oxide thin films Nathan SS, Rao GM, Mohan S
25 - 30	Combustion chemical vapor deposition of CeO2 film Carter WB, Book GW, Polley TA, Stollberg DW, Hampikian JM
31 - 38	Plasma substrate interaction effects on composition and chemical structure of reactively r.f. magnetron sputtered carbon nitride films Kaltofen R, Sebald T, Schulte J, Weise G
39 - 45	Investigation of Sb-doped CdTe films using XPS, PIXE and XRD Nair JP, Jayakrishnan R, Chaure NB, Lobo A, Kulkarni SK, Pandey RK
46 - 55	Correlation between hardness and embedded argon content of magnetron sputtered chromium films Paturaud C, Farges G, Saint Catherine MC, Machet J
56 - 59	X-ray photoelectron spectroscopy of highly conducting and amorphous osmium dioxide thin films Hayakawa Y, Fukuzaki K, Kohiki S, Shibata Y, Matsuo T, Wagatsuma K, Oku M
60 - 71	Sizes and distances of metal clusters in Au-, Pt-, W- and Fe-containing diamond-like carbon hard coatings: a comparative study by small angle X-ray scattering, wide angle X-ray diffraction, transmission electron microscopy and scanning tunnelling microscopy Schiffmann KI, Fryda M, Goerigk G, Lauer R, Hinze P, Bulack A
72 - 77	Study of C-N binding states in carbon nitride films deposited by reactive XeCl laser ablation D'Anna E, De Giorgi ML, Luches A, Martino M, Perrone A, Zocco A
78 - 84	Influence of oxygen flow rate on the structural and mechanical properties of reactively magnetron sputter-deposited Zr-B-O coatings Pierson JF, Billard A, Belmonte T, Michel H, Frantz C
85 - 90	Growth structure and properties of Fe rich Fe-Ni alloy films deposited on MgO(001) by d.c.-biased plasma-sputtering Yang JP, Barna A, Makihara K, Hashimoto M, Barna PB
91 - 98	Characterization of electroless plated palladium-silver alloy membranes Keuler JN, Lorenzen L, Sanderson RD, Prozesky V, Przybylowicz WJ
99 - 105	Deposition kinetics of silicon dioxide from hexamethyldisilazane and oxygen by PECVD Kim MT
106 - 111	Effect of substrate material on the crystallinity and epitaxy of Pb(Zr,Ti)O-3 thin films Hwang KS, Manabe T, Nagahama T, Yamaguchi I, Kumagai T, Mizuta S
112 - 116	Calculation of apparent activation energy for the deposition of TEOS-SiO2 films by PECVD Kim MT
117 - 120	Crystalline and nearly stoichiometric vanadium nitride thin film by PLD Dai ZN, Miyashita A, Yamamoto S, Narumi K, Naramoto H
121 - 126	Effects of Cu seeding layer on Si grown by partially ionized beam in plasma enhanced chemical vapor deposition Koh SK, Choi SC, Kim KH, Jung HJ, Choi GJ, Yang HS, Cho YS
127 - 132	Study of Ca1-xPrxF2+x solid solution thin films grown on silicon substrates Tardy P, Deshayes Y, Hirsch L, Barriere AS, Desbat B, El Fajri A
133 - 145	Columnar growth structure and evolution of wavy interface morphology in amorphous and polycrystalline multilayered thin films Czigany Z, Radnoczi G
146 - 150	Exceptional anisotropy in conductivity and mechanical properties of poly-3-octylthiophene films Gao ZQ, Zhou L, Huang H
151 - 154	In-situ observation of CuInSe2 formation process using high-temperature X-ray diffraction analysis Katsui A, Iwata T
155 - 160	Transparent conductive ITO thin films through the sol-gel process using metal salts Kim SS, Choi SY, Park CG, Jin HW
161 - 166	Chemical vapor deposition and structural study of La0.8MnO3-delta thin films Pignard S, Vincent H, Senateur JP, Giauque PH
167 - 177	Thickness and quality of spin-coated polymer films by two-angle ellipsometry Walsh CB, Franses EI
178 - 183	An X-ray absorption study of the local structure of cerium in electrochemically deposited thin films Balasubramanian M, Melendres CA, Mansour AN
184 - 194	Aerosol-gel deposition and low temperature heat-treatment of SiO2 layers Vautey C, Burgos M, Langlet M
195 - 200	Study of the chemistry of NH3 on aluminum nitride and oxynitride under steady-state conditions using external-reflection infrared spectroscopy Bermudez VM
201 - 207	A study of the NiSi to NiSi2 transition in the Ni-Si binary system Julies BA, Knoesen D, Pretorius R, Adams D
208 - 213	Photochemically induced oxidation and silver deposition on amorphous germanium sulfide films studied using atomic force microscopy and ion beam methods Chen GL, Horton JH
214 - 219	Barrier properties of TiN/TiSi2 bilayers formed by two-step rapid thermal conversion process for Cu diffusion barrier Kim YT, Jun CH, Kim DY
220 - 225	Microstructural effects on the friction and wear of zirconia films in unlubricated sliding contact Moulzolf SC, Lad RJ, Blau PJ
226 - 228	Influence of illumination on the microhardness and elastic properties of thin GexSb40-xS60 films Pamukchieva V, Savova E
229 - 232	Effect of substrate preconditioning on charge transport at the phthalocyanine-conducting polymer film interface Radhakrishnan S, Unde S
233 - 237	Effect of thermal stresses on temperature dependence of refractive index for Ta2O5 dielectric films Cheng WH, Chi SF, Chu AK
238 - 240	Epitaxial growth of ZnO thin films on LiNbO3 substrates Matsubara K, Fons P, Yamada A, Watanabe M, Niki S
241 - 247	Thin films of polyaniline-polyacrylic acid composite by chemical bath deposition Hu HL, Saniger JM, Banuelos JG
248 - 252	A ULSI shallow trench isolation process through the integration of multilayered dielectric process and chemical-mechanical planarization Lin CF, Tseng WT, Feng MS, Wang YL
253 - 257	High-coercivity CoPt alloy films prepared at ultra-high Ar pressure Xun K, Li M, Zhou J, Shen DF
258 - 262	Particulate multilayers prepared from surfactant-stabilized SnO2 nanoparticles Cao LX, Huo LH, Ping GC, Wang DM, Zeng GF, Xi SQ
263 - 271	Direct observation of 2-D phase transitions of Chiral liquid crystals at the air water interface Xue QB, Yang KZ, Xiao C, Zhang QZ
272 - 277	Monolayer studies of perfluorostearic acid at air water interface Ha KR, Kim JM, Rabolt JF
278 - 283	Silicidation reactions with Co-Ni bilayers for low thermal budget microelectronic applications Saha SK, Howell RS, Hatalis MK
284 - 288	The effect of growth parameters on the electrical, optical and structural properties of copper phthalocyanine thin films Ambily S, Menon CS
289 - 294	The effects of chloride ions and benzotriazole on photoresponses of copper electrodes Hao YZ, Yang MZ, Yu C, Cai SM, Zhou GD
295 - 298	Some physical properties of F-doped CdO thin films deposited by spray pyrolysis Ferro R, Rodriguez JA
299 - 301	Highly ordered vacuum-deposited thin films of copper phthalocyanine induced by electric field Hu WP, Liu YQ, Zhou SQ, Tao J, Xu DF, Zhu DB
302 - 306	Study of thin chemical vapour deposited tungsten oxide films by positron annihilation spectroscopy Djourelov N, Gogova D, Misheva M