Thin Solid Films

Thin Solid Films, Vol.353, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (46 articles)

1 - 7	Current induced effects in aluminum thin films Oliva AI, Quintana P, Ceh O, Corona JE, Aguilar M
8 - 11	Interfacial reactions in the thin film Y2O3 on chemically oxidized Si(100) substrate systems Kang SK, Ko DH, Kim EH, Cho MH, Whang CN
12 - 15	Highly oriented ZnO thin films deposited on Ru/Si substrates Lim WT, Lee CH
16 - 19	Microstructure and crystallographic texture of reactively sputtered FeTaN films Klemmer TJ, Inturi V, Minor K, Barnard J, Thomas J, Blachere J
20 - 24	Silicon dots/clusters in silicon nitride: photoluminescence and electron spin resonance Gritsenko VA, Zhuravlev KS, Milov AD, Wong H, Kwok RWM, Xu JB
25 - 28	A study on abnormal electric properties of lead lanthanum titanate thin films caused by excess PbO Song ZT, Ren W, Zhang LY, Yao X, Lin CL
29 - 32	Non-aqueous chemical bath deposition of Sb2S3 thin films Mane RS, Sankapal BR, Lokhande CD
33 - 39	Thermally driven shape instabilities of Nb/Cu multilayer structures: instability of Nb/Cu multilayers Troche P, Hoffmann J, Heinemann K, Hartung F, Schmitz G, Freyhardt HC, Rudolph D, Thieme J, Guttmann P
40 - 44	Surface analysis and phase transition of gel-derived VO2 thin films Lu SW, Hou LS, Gan FX
45 - 51	Growth and characterization of defective diamond films Lee S, Han SY, Oh SG
52 - 55	Epitaxy of (106)-oriented SrBi2Ta2O9 and SrBi2Nb2O9 thin films Nagahama T, Manabe T, Yamaguchi I, Kumagai T, Tsuchiya T, Mizuta S
56 - 61	Direct structure depth profiling of polycrystalline thin films by X-ray diffraction and its application Li B, Tao K, Liu XT, Liao W, Luo J
62 - 66	Structural characterization of epitaxial Cu2Mo6S8 thin films grown on R-cut sapphire by pulsed laser deposition Lemee N, Guilloux-Viry M, Perrin A, Kugler M, Fischer O, Li ZZ, Raffy H
67 - 71	Effect of ligands on crystal structures and optical properties of TiO2 prepared by sol-gel processes Nishide T, Mizukami F
72 - 78	The initial oxidation of epsilon-Fe2N1-x: growth kinetics Graat PCJ, Somers MAJ, Mittemeijer EJ
79 - 84	Excited helium-induced CVD of a-Si1-xCx : H films from trimethylchlorosilane Smirnova TP, Yakovkina LV, Ayupov BM, Dolgpvesova IP, Nadolinny VA, Kitchay VN
85 - 92	Characterization of the interfacial region of epitaxial TlBiSe2 thin films by infrared spectroscopy and transmission electron microscopy Mitsas CL, Polychroniadis EK, Siapkas DI
93 - 99	Simultaneous determination of the optical properties and of the structure of r.f.-sputtered ZnO thin films Dumont E, Dugnoille B, Bienfait S
100 - 107	Chemical bath deposition of indium hydroxy sulphide thin films: process and XPS characterization Bayon R, Mafftiotte C, Herrero J
108 - 112	The effect of catalyzing additives on sol-gel process of formation and on the properties of modified polysiloxane layers Dultsev FN, Vasilyeva LL
113 - 123	SnO2 thin films prepared by ion beam induced CVD: preparation and characterization by X-ray absorption spectroscopy Jimenez VM, Espinos JP, Caballero A, Contreras L, Fernandez A, Justo A, Gonzalez-Elipe AR
124 - 128	New method for making porous SiO2 thin films Liu Y, Ren W, Zhang LY, Yao X
129 - 136	Characterisation of ZnS : Mn thin films by Rietveld refinement of Bragg-Brentano X-ray diffraction patterns Tagliente MA, Penza M, Gusso M, Quirini A
137 - 143	Elastic properties of thin h-BN films investigated by Brillouin light scattering Wittkowski T, Jorzick J, Jung K, Hillebrands B
144 - 148	Fabrication of barium titanate thin films with a high dielectric constant by a sol-gel technique Kumazawa H, Masuda K
149 - 156	Effects of annealing on X-ray-amorphous CVD W-Si-N barrier layer materials Gokce OH, Amin S, Ravindra NM, Szostak DJ, Paff RJ, Fleming JG, Galewski CJ, Shallenberger J, Eby R
157 - 165	Improvement of the thermal stability of amorphous carbon films by incorporation of nitrogen Bai HL, Jiang EY
166 - 173	Structure evolution in Ag/Ni multilayers grown by ultra high vacuum DC magnetron sputtering Sandstrom P, Svedberg EB, Johansson MP, Birch J, Sundgren JE
174 - 181	Effect of diatomic islands on step morphological stability of a terrace edge in molecular beam epitaxy Lin SP, Hwang CC, Chu HS
182 - 188	TEM investigation of wear mechanisms during metal machining Ruppi S, Halvarsson M
189 - 193	Indium doping of amorphous SiC : H films prepared by reactive magnetron co-sputtering Saito N, Inui Y, Yamaguchi T, Nakaaki I
194 - 200	Atomic force microscopy of in situ deformed nickel thin films Coupeau C, Naud JF, Cleymand F, Goudeau P, Grilhe J
201 - 207	Mechanical behaviour of submicron multilayers submitted to microtensile experiments Ignat M, Marieb T, Fujimoto H, Flinn PA
208 - 213	Elastic properties of hydrogen-free amorphous carbon thin films and their relation with carbon-carbon bonding Logothetidis S, Charitidis C
214 - 217	Langmuir-Blodgett films of a new hemicyanine dye Ricceri R, Gabrielli G
218 - 222	Organic light emitting devices containing a highly substituted isoindole or polyisoindole Gauvin S, Santerre F, Dodelet JP, Ding Y, Hlil AR, Hay AS, Anderson J, Armstrong NR, Gorjanc TC, D'Iorio M
223 - 226	Luminescence behavior of Eu(TTFA)(3) doped sol-gel films Hao XP, Fan XP, Wang MQ
227 - 232	Properties of Bi2+xSr2-xCuO6+delta thin films obtained by MBE Salvato M, Salluzzo M, Di Luccio T, Attanasio C, Prischepa SL, Maritato L
233 - 238	Atomic force microscopy study of cytochrome f (Cyt f) and mixed monogalactosyldiacylglycerol (MGDG)/Cyt f Langmuir-Blodgett films Tazi A, Boussaad S, Leblanc RM
239 - 243	Porous freestanding diamond membranes with reduced pore diameter Mammana VP, Silva S, Mansano RD, Verdonck P, Pavani A, Salvadori MC, Brown IG
244 - 248	Dielectric properties of sol-gel derived PZT(40/60)/PZT(60/40) heterolayered thin films Lee SG, Lee YH
249 - 253	Conduction mechanism in plasma polymerized lemongrass oil films Kumar DS, Pillai MGK
254 - 258	Effect of annealing rate on the crystallization process in Ge5Bi18Se77 films Rajagopalan T, Reddy GB
259 - 263	Strong substrate effect in local poling of ultrathin ferroelectric polymer films Chen XQ, Yamada H, Terai Y, Horiuchi T, Matsushige K, Weiss PS
264 - 273	Phase formation behavior and diffusion barrier property of reactively sputtered tantalum-based thin films used in semiconductor metallization Chen GS, Lee PY, Chen ST
274 - 282	Solid phase epitaxy for low pressure chemical vapor deposition Si films induced by ion implantation Chen PS, Hsieh TE, Chu CH