1 - 6 |
Ferroelectric and dielectric properties of 0.6SrBi(2)Nb(2)O(9)-0.4BiFeO(3) thin films Xue JM, Sim MH, Ezhilvalavan S, Zhou ZH, Wang J, Zhu H, Miao JM |
7 - 16 |
Massive stress changes in plasma-enhanced chemical vapor deposited silicon nitride films on thermal cycling Hughey MP, Cook RF |
17 - 24 |
Investigation of thermal stability, phase formation, electrical, and microstructural properties of sputter-deposited titanium aluminide thin films Kim HC, Theodore ND, Gadre KS, Mayer JW, Alford TL |
25 - 29 |
Improved fatigue properties of lead zirconate titanate films made on oxygen-implanted platinum electrodes Chen YC, Sun YM, Gan JY |
30 - 35 |
A study of thin films Of V2O5 containing molybdenum from an evaporation boat Ai-Kuhaili MF, Khawaja EE, Ingram DC, Durrani SMA |
36 - 40 |
Growth of Cu thin films by the successive ionic layer adsorption and reaction (SILAR) method Lindroos S, Ruuskanen T, Ritala M, Leskela M |
41 - 47 |
Structural and electrochemical properties of vanadium oxide thin films grown by d.c. and r.f. reactive sputtering at room temperature Yoon YS, Kim JS, Choi SH |
48 - 52 |
Long lasting phosphorescence of Sr4Al14O25 : EU2+,Dy3+ thin films by magnetron sputtering Chang CK, Mao DL |
53 - 57 |
Determination of the refractive index of n(+)- and p-type porous Si samples Setzu S, Romestain R, Chamard V |
58 - 61 |
Formation of copper oxide films on fiberglass by adsorption and reaction of cuprous ions Medina-Valtierra J, Calixto S, Ruiz F |
62 - 71 |
Characterization of PdAg/Al2O3 composite membrane by electroless codeposition Chen HI, Chu CY, Huang TC |
72 - 77 |
Growth and properties of silicon nitride films prepared by low pressure chemical vapor deposition using trichlorosilane and ammonia Liu XJ, Zhang JJ, Sun XW, Pan YB, Huang LP, Jin CY |
78 - 82 |
Simple method for preparation of cubic Ag nanoparticles and their self-assembled films Li DG, Chen SH, Zhao SY, Hou XM, Ma HY, Yang XG |
83 - 86 |
Aqueous solution-based synthesis of rare earth-doped metal oxide thin films Deki S, Kuratani K, Uemura M, Akamatsu K, Mizuhata M, Kajinami A |
87 - 93 |
Electric stability of spatiotemporal stripe patterns formed by silver and antimony co-electrodeposition under the constant current mode Nagamine Y, Kurono N, Hara M |
94 - 100 |
Influence of ion bombardment on the properties and microstructure of unbalanced magnetron deposited niobium coatings Savisalo T, Lewis DB, Hovsepian PE, Munz WD |
101 - 115 |
Plasma spraying of nanostructured partially yttria stabilized zirconia powders Li JF, Liao H, Wang XY, Coddet C, Chen H, Ding CX |
116 - 124 |
A study of semiconducting properties of hydrogen containing passive films Zeng YM, Luo JL, Norton PR |
125 - 132 |
Characterization of tribo-layers on self-lubricating PACVD TiN coatings Badisch E, Mitterer C, Mayrhofer PH, Mori G, Bakker RJ, Brenner J, Stori H |
133 - 142 |
Corrosion behavior of nanolayered TiN/NbN multilayer coatings prepared by reactive direct current magnetron sputtering process Barshilia HC, Prakash MS, Poojari A, Rajam KS |
143 - 149 |
Anodic oxide growth on aluminium surfaces modified by cathodic deposition of Ni and Co Munoz AG, Bessone JB |
150 - 155 |
TEM study of the indentation behaviour of thin Au film on GaAs Patriarche G, Le Bourhis E, Faurie D, Renault PO |
156 - 166 |
Mechanical integrity of transparent conductive oxide films for flexible polymer-based displays Leterrier Y, Medico L, Demarco F, Manson JAE, Betz U, Escola MF, Olsson MK, Atamny F |
167 - 174 |
Mechanical property analyses of porous low-dielectric-constant films for stability evaluation of multilevel-interconnect structures Chang SY, Chang HL, Lu YC, Jang SM, Lin SJ, Liang MS |
175 - 180 |
Measurement of Young's modulus and residual stress of copper film electroplated on silicon wafer Zhou Y, Yang CS, Chen JA, Ding GF, Ding W, Wang L, Wang MJ, Zhang YM, Zhang TH |
181 - 189 |
Thin hard coatings fracture propagation during the impact test Bouzakis KD, Siganos A, Leyendecker T, Erkens G |
190 - 200 |
Synthesis and characterization of silica aerogel films for inter-metal dielectrics via ambient drying Kim GS, Hyun SH |
201 - 205 |
Effects of surface treatment of field emitter arrays on electrical characteristics of active matrix cathode Chung CH, Song YH, Hwang CS, Ahn SD, Kim BC, Cho YR, Lee JH, Cho KI |
206 - 210 |
Towards a more accurate refractive index profile of ion-exchanged waveguides Horowitz F, Pereira MB, Pelli S, Righini GC |
211 - 216 |
A comparative study of low dielectric constant barrier layer, etch stop and hardmask films of hydrogenated amorphous Si-(C, O, N) Wang YH, Moitreyee MR, Kumar R, Shen L, Zeng KY, Chai JW, Pan JS |
217 - 221 |
Sol-gel preparation of photosensitive fluorinated inorganic-organic thin films for printing plates Satoh K, Nakazumi H |
222 - 226 |
Microstructure of amorphous tantalum nitride thin films Tsukimoto S, Moriyama M, Murakami M |
227 - 231 |
Structural, dielectric and optical properties of Ba(Ti, Zr)O-3 thin films prepared by chemical solution deposition Tang XG, Chan HLW, Ding AL |
232 - 236 |
Enhanced photoluminescence from polycrystalline ZnO films resulting from oxygen processing Wang G, Zhang G, Ketterson JB, Gatt R |
237 - 241 |
Pure red organic electroluminescent devices using a novel europium(III) complex as emitting layer Bian ZQ, Gao DQ, Wang KZ, Jin LP, Huang CH |
242 - 246 |
Low temperature UV/ozone oxidation formation of HfSiON gate dielectric Pant G, Punchaipetch P, Kim MJ, Wallace RM, Gnade BE |
247 - 255 |
Determination of the optical properties of non-uniformly thick non-hydrogenated sputtered silicon thin films on glass Richards BS, Lambertz A, Sproul AB |
256 - 263 |
Changes in the real structure and magnetoresistance of Co90Fe10/Cu and Co90Fe10/CU(85)Ag(10)AU(5) multilayers after annealing Rafaja D, Ebert J, Miehe G, Martz N, Knapp M, Stahl B, Ghafari M, Hahn H, Fuess H, Schmollngruber P, Farber P, Siegle H |
264 - 268 |
Interaction between calix[4]arene derivative bearing adenino units and complementary nucleosides at the air-water interface Guo X, Lu GY, Li Y |
269 - 273 |
Optical properties of double-layer structure phthalocyanine-tetracyanoquinodimethane Bortchagovsky EG, Kazantseva ZI, Koshets IA, Nespurek S, Jastrabik L |
274 - 278 |
Transition from split streamlines to dip-coating during Langmuir-Blodgett film deposition Diaz ME, Cerro RL |
279 - 285 |
Langmuir-Blodgett films of substituted bis(naphthalocyaninato) rare earth complexes: structure and interaction with nitrogen dioxide Chen YL, Liu HG, Pan N, Jiang JZ |
286 - 290 |
Co-patterning chitosan and bovine serum albumin on an aldehyde-enriched glass substrate by microcontact printing Feng J, Gao CY, Wang B, Shen JC |
291 - 294 |
Room temperature indium tin oxide by XeCl excimer laser annealing for flexible display Chung W, Thompson MO, Wickboldt P, Toet D, Carey PG |
295 - 299 |
Reactive sputtering of magnesium oxide thin film for plasma display panel applications Choi YW, Kim J |
300 - 305 |
Enhancing the performance of an electrochromic device by template synthesis of the active layers Neves S, Santos RF, Gazotti WA, Fonseca CP |
306 - 314 |
Novel compensation chemical metal polishing for low dishing and high global planarity for ultra-planar die applications in micro-optics and micro-electro-mechanical systems Ganguly U, Krusius JP |
315 - 323 |
The influence of film structure on In2O3 gas response Korotcenkov G, Brinzari V, Cerneavschi A, Ivanov M, Golovanov V, Cornet A, Morante J, Cabot A, Arbiol J |
324 - 326 |
A novel transparent pn(+) junction based on indium tin oxides Ji ZG, He ZJ, Song YL, Liu K, Xiang Y |
327 - 334 |
Characterization and properties of r.f.-sputtered thin films of the alumina-titania system Kuo DH, Tzeng KH |