Thin Solid Films

Thin Solid Films, Vol.482, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (57 articles)

1 - 1	Proceedings of Symposium J on Synthesis, Characterization and Advanced Applications of Amorphous Carbon Films, EMRS 2004 Conference, Strasbourg, France, 24-28 May, 2004 - Preface Patsalas P, Abadias G, Erdem A, Oskomov K
2 - 8	Pulsed-laser deposition of carbon: from DLC to cluster-assembled films Ossi PM, Bottani CE, Miotello A
9 - 18	Surface and interface properties of amorphous carbon layers on rigid and flexible substrates Logothetidis S
19 - 23	Structuring of carbon layers in Si-C-O systems studied on atomic scale Hahnel A, Woltersdorf J
24 - 33	Optical and electronic properties of plasma-deposited hydrogenated amorphous carbon nitride and carbon oxide films Godet C, Adamopoulos G, Kumar S, Katsuno T
34 - 40	Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing McCann R, Roy SS, Papakonstantinou P, Bain MF, Gamble HS, McLaughlin JA
41 - 44	Microstructure and electronic investigations of carbon nitride films deposited by RF magnetron sputtering Lagrini A, Charvet S, Benlahsen M, Debiemme-Chouvy C, Deslouis C, Cachet H
45 - 49	Effect of substrate bias voltage and substrate on the structural properties of amorphous carbon films deposited by unbalanced magnetron sputtering Ahmad I, Roy SS, Maguire PD, Papakonstantinou P, McLaughlin JA
50 - 55	Effects of substrate temperature on nanocrystalline diamond growth: an in-situ optical study using pyrometric interferometry Bruno P, Benedic F, Mohasseb F, Silva F, Hassouni K
56 - 62	Structure, stability, and stress properties of amorphous and nanostructured carbon films Fyta MG, Mathioudakis C, Kopidakis G, Kehres PC
63 - 68	Characterisation of the interface region in stepwise bias-graded layers of DLC films by a high-resolution depth profiling method Ziebert C, Bauer C, Stuber M, Ulrich S, Holleck H
69 - 73	A model for stress generation and stress relief mechanisms applied to as-deposited filtered cathodic vacuum arc amorphous carbon films Bilek MMM, Verdon M, Ryves L, Oates TWH, Ha CT, McKenzie DR
74 - 78	Relaxation kinetics in amorphous carbon films: An insight from atomic scale simulation Belov AY, Jager HU
79 - 85	Electron field emission from carbon-based materials Silva SRP, Carey JD, Guo X, Tsang WM, Poa CHP
86 - 89	Effect of rf power on the photovoltaic properties of boron-doped amorphous carbon/n-type silicon junction fabricated by plasma enhanced chemical vapor deposition Soga T, Kokubu T, Hayashi Y, Jimbo T
90 - 93	Microstructural relaxation of hydrogenated amorphous carbon thin films Bouzerar R, Benlahsen M, Picot JC
94 - 98	Transport properties of low-dimensional amorphous carbon films Bhattacharyya S, Silva SRP
99 - 108	Achieving superlow friction with hydrogenated amorphous carbon: some key requirements Fontaine J, Le Mogne T, Loubet JL, Belin M
109 - 114	Structural, mechanical, and nanoscale tribological properties of nitrogen-incorporated fluorine-carbon films da Costa MEHM, Sanchez CMT, Jacobsohn LG, Freire FL
115 - 119	Sealing performance of thin amorphous carbon films formed by ion beam assisted deposition at low temperature for protection of aluminium against aggressive media: the influence of the ion energy von Ringleben J, Sundermann C, Matsutani I, Kiuchi M, Ensinger W
120 - 125	Nanomechanical and nanotribological properties of carbon based films Charitidis C, Logothetidis S
126 - 132	Haemocompatibility studies on carbon-based thin films by ellipsometry Logothetidis S, Gioti M, Lousinian S, Fotiadou S
133 - 137	Synthesis and in-situ ellipsometric monitoring of Ti/C nanostructured multilayers using a high-current, dual source pulsed cathodic arc Ryves L, Bilek MMM, Oates TW, Tarrant RN, McKenzie DR, Burgmann FA, McCulloch DG
138 - 144	Towards high adherent and tough a-C coatings Zhang S, Bui XL, Zeng XT, Li XM
145 - 150	The structure of amorphous carbon nitride films using a combined study of NEXAFS, XPS and Raman spectroscopies Roy SS, McCann R, Papakonstantinou P, Maguire P, McLaughlin JA
151 - 155	Electronic and optical properties of a-C from tight-binding molecular dynamics simulations Mathioudakis C, Kopidakis G, Kelires PC, Patsalas P, Gioti M, Logothetidis S
156 - 166	Comparative study of the structure of a-CNx and a-CNx : H films using NEXAFS, XPS and FT-IR analysis Bouchet-Fabre B, Zellama K, Godet C, Ballutaud D, Minea T
167 - 171	Spectroscopic study using FTIR, Raman, XPS and NEXAFS of carbon nitride thin films deposited by RF magnetron sputtering Bouchet-Fabre B, Marino E, Lazar G, Zellama K, Clin M, Ballutaud D, Abel F, Godet C
172 - 176	Time-resolved electrical measurements of a pulsed-dc methane discharge used in diamond-like carbon films production Corbella C, Polo MC, Oncins G, Pascual E, Andujar JL, Bertran E
177 - 182	Effects of energetic species during the growth of nitrogenated amorphous carbon thin films on their nanomechanical properties Charitidis C, Patsalas P, Logothetidis S
183 - 187	Chemical structure of silicon-, oxygen- and nitrogen-containing a-C : H films prepared by RF plasma beam CVD Toth A, Mohai M, Ujvari T, Bertoti I
188 - 191	Nanomechanical properties of silicon-, oxygen- and nitrogen-containing a-C : H films prepared by RF plasma beam CVD Toth A, Mohai M, Ujvari T, Bertoti I
192 - 196	Characterizations of CNx thin films made by ionized physical vapor deposition Tetard F, Djemia P, Besland MP, Tessier PY, Angleraud B
197 - 200	Dual FCVA-PECVD deposition for DLC films Meunier C, Munnik F, Stauffer J, Germann E, Mikhailov S
201 - 206	The improvement in gas barrier performance and optical transparency of DLC-coated polymer by silicon incorporation Abbas GA, Papakonstantinou P, Okpalugo TIT, McLaughlin JA, Filik J, Harkin-Jones E
207 - 210	Influence of amorphous carbon nano-clusters on the capacity of carbon black electrodes Toth S, Fule M, Veres M, Selman JR, Arcon D, Pocsik I, Koos M
211 - 215	Raman scattering of ultra-high molecular weight polyethylene treated by plasma-based ion implantation Veres M, Fule M, Toth S, Pocsik I, Koos M, Toth A, Mohai M, Bertoti I
216 - 220	Aging of plasma-deposited carbon layers: effect of their thickness and material structure Clergereaux R, Escaich D, Martin S, Gaillard F, Raynaud P
221 - 225	Silicon-incorporated diamond-like coatings for Si3N4 mechanical seals Camargo SS, Gomes JR, Carrapichano JM, Silva RF, Achete CA
226 - 231	Characterization of hydrogenated amorphous carbon nitride particles and coatings obtained in a CH4/N-2 radiofrequency discharge Pereira J, Geraud-Grenier I, Massereau-Guilbaud V, Plain A
232 - 236	Nanocrystalline diamond coating of silicon nitride ceramics by microwave plasma-assisted CVD Amaral M, Mohasseb F, Oliveira FJ, Benedic F, Silva RF, Gicquel A
237 - 241	Application of aluminum oxide and ta-C thin films deposited at room temperature by PLD in RF-MEMS fabrication Orlianges JC, Pothier A, Mercier D, Blondy P, Champeaux C, Catherinot A, De Barros MI, Pavant S
242 - 247	Electronic structure and hardening mechanism of Si-doped/undoped diamond-like carbon films Ray SC, Okpalugo TIT, Papakonstantinou P, Bao CW, Tsai HM, Chiou JW, Jan JC, Pong WF, McLaughlin JA, Wang WJ
248 - 252	Electron field emission and surface morphology of a-C and a-C : H thin films Anishchik V, Uglov V, Kuleshov AK, Filipp AR, Rusalsky DP, Astashynskaya MV, Samtsov M, Kuznetsova TA, Thiery F, Pauleau Y
253 - 257	CHx/PS/Si as structure for propane sensing Belhousse S, Gabouze N, Cheraga H, Henda K
258 - 263	Nitrogen effect on the electrical properties of CNx thin films deposited by reactive magnetron sputtering Derradji NE, Mahdjoubi ML, Belkhir H, Mumumbila N, Angleraud B, Tessier F
264 - 269	PECVD a-C : H films for STW resonant devices Cicala G, Bruno P, Dragone A, Losacco AM, Sadun C, Generosi A
270 - 274	An electrical, optical and electron paramagnetic resonance study of room temperature deposited CNx films on Si Konofaos N, Deligiannakis Y, Evangelou EK, Gioti M, Logothetidis S
275 - 279	The electrical and structural properties of the hydrogenated amorphous carbon films grown by close field unbalanced magnetron sputtering Park YS, Myung HS, Han JG, Hong B
280 - 286	Structural, bonding and physical characteristics of phosphorus-dopcd hydrogenated amorphous carbon films grown by plasma-enhanced chemical vapor deposition Rusop M, Soga T, Jimbo T
287 - 292	Nickel-incorporated amorphous carbon film deposited by femtosecond pulsed laser ablation Benchikh N, Garrelie F, Donnet C, Bouchet-Fabre B, Wolski K, Rogemond F, Loir AS, Subtil JL
293 - 298	Composition and morphology of metal-containing diamond-like carbon films obtained by reactive magnetron sputtering Corbella C, Pascual E, Oncins G, Canal C, Andujar JL, Bertran E
299 - 304	Effect of Si-incorporation on wear-corrosion properties of diamond-like carbon films Kim HG, Ahn SH, Kim JG, Park SJ, Lee KR
305 - 310	Surface characterisation of nano-structured carbon films deposited by Nd : YAG pulsed laser deposition Cappelli E, Scilletta C, Orlando S, Flammini R, Iacobucci S, Ascarelli P
311 - 317	Electrochemically induced surface modifications in boron-doped diamond films: a Raman spectroscopy study Ricci PC, Anedda A, Carbonaro CM, Clemente F, Corpino R
318 - 323	Evolution under annealing and nitrogen implantation of the mechanical properties of amorphous carbon films Charvet S, Le Bourhis E, Faurie D, Goudeau P, Lejeune M, Gergaud P
324 - 329	In situ tensile tests in SEM of sputtered CNx films deposited on Ti6Al4V substrate: effect of film thickness and plasma surface pretreatment Villechaise P, Milhet X, Angleraud B, Fouquet V, Pichon L, Straboni A, Tessier R