Thin Solid Films

Thin Solid Films, Vol.517, No.12 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (54 articles)

3413 - 3414	Fifth international conference on hot-wire CVD (Cat-CVD) process Preface Bouree JE, Mahan AH
3415 - 3419	Frontiers in HWCVD Schropp REI
3420 - 3423	New application of Cat-CVD technology and recent status of industrial implementation Matsumura H, Ohdaira K
3424 - 3426	Degradation and silicidation of Ta- and W-filaments for different filament temperatures Kniffler N, Pflueger A, Scheller D, Schroeder B
3427 - 3430	Hot wire chemical vapor deposition: limits and opportunities of protecting the tungsten catalyzer from silicide with a cavity Frigeri PA, Nos O, Bengoechea S, Frevert C, Asensi JM, Bertomeu J
3431 - 3434	Reversibility of silicidation of Ta filaments in HWCVD of thin film silicon van der Werf CHM, Li H, Verlaan V, Oliphant CJ, Bakker R, Houweling ZS, Schropp REI
3435 - 3438	Effect of ammonia on Ta filaments in the hot wire CVD process Verlaan V, van der Werf CHM, Oliphant CJ, Bakker R, Houweling ZS, Schropp REI
3439 - 3442	Low temperature decomposition of large molecules of TMA using catalyzers with resistance to oxidation in catalytic CVD Ogita YI, Kudoh T, Iwai R
3443 - 3445	Resistance characteristics to oxidation of the metal-catalyzer for Cat-CVD Kudoh T, Ogita YI
3446 - 3448	Detection of radical species produced by catalytic decomposition of H-2, O-2 and their mixtures on heated Ir surfaces Umemoto H, Kusanagi H, Nishimura K, Ushijima M
3449 - 3451	Estimation of hydrogen radical density generated from various kinds of catalysts Abe K, Ida M, Izumi A, Terashima S, Sudo T, Watanabe Y, Fukuda Y
3452 - 3455	N-2 decomposition by hot wire and N-2 post-deposition treatment on hydrogenated microcrystalline silicon thin films Mazaki K, Tabata A, Kitagawa A, Kondo A
3456 - 3460	Silicon surface passivation by hot-wire CVD Si thin films studied by in situ surface spectroscopy Gielis JJH, Hoex B, van den Oever PJ, de Sanden MCMV, Kessels WMM
3461 - 3465	A mechanistic study of gas-phase reactions with 1,1,3,3-tetramethyl-1,3-disilacyclobutane in the hot-wire chemical vapor deposition process Tong L, Shi YJ
3466 - 3471	Gas phase and surface kinetics in plasma and hot filament-enhanced catalytic chemical vapor deposition of carbon nanostructures Le Normand F, Gulas M, Veis P, Cojocaru CS, Bouree JE
3472 - 3475	Precursor Cat-CVD a-Si films for the formation of high-quality poly-Si films on glass substrates by flash lamp annealing Ohdaira K, Shiba K, Takemoto H, Fujiwara T, Endo Y, Nishizaki S, Jang YR, Matsumura H
3476 - 3480	Hot wire CVD deposition of nanocrystalline silicon solar cells on rough substrates Li HBBT, van der Werf KHM, Rath JK, Schropp REI
3481 - 3483	Hot-wire chemical vapor deposition of silicon nanoparticles on fused silica Salivati N, An YQ, Downer MC, Ekerdt JG
3484 - 3487	Composition and crystallinity of silicon nanoparticles synthesised by hot wire thermal catalytic pyrolysis at different pressures Scriba MR, Britton DT, Arendse C, van Staden MJ, Harting M
3488 - 3491	Post deposition annealing temperature effect on silicon quantum dots embedded in silicon nitride dielectric multilayer prepared by hot-wire chemical vapor deposition Panchal AK, Solanki CS
3492 - 3495	Silicon nanorods prepared by glancing angle catalytic chemical vapor deposition Liu FZ, Ma YH, Zhu MF, Yin PG
3496 - 3498	Doping of high-quality epitaxial silicon grown by hot-wire chemical vapor deposition near 700 degrees C Martin IT, Branz HM, Stradins P, Young DL, Reedy RC, Teplin CW
3499 - 3502	The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD Verlaan V, Verkerk AD, Arnoldbik WM, van der Werf CHM, Bakker R, Houweling ZS, Romijn IG, Borsa DM, Weeber AW, Luxembourg SL, Zeman M, Dekkers HFW, Schropp REI
3503 - 3506	Deposition of silicon nitride thin films by hot-wire CVD at 100 degrees C and 250 degrees C Alpuim P, Goncalves LM, Marins ES, Viseu TMR, Ferdov S, Bouree JE
3507 - 3512	Microcrystalline silicon carbide alloys prepared with HWCVD as highly transparent and conductive window layers for thin film solar cells Finger F, Astakhov O, Bronger T, Carius R, Chen T, Dasgupta A, Gordijn A, Houben L, Huang Y, Klein S, Luysberg M, Wang H, Xiao L
3513 - 3515	Microcrystalline silicon carbide thin films grown by HWCVD at different filament temperatures and their application in n-i-p microcrystalline silicon solar cells Chen T, Huang YL, Wang HY, Yang DR, Dasgupta A, Carius R, Finger F
3516 - 3519	Growth of silicon carbide thin films by hot-wire chemical vapor deposition from SiH4/CH4/H-2 Tabata A, Komura Y, Narita T, Kondo A
3520 - 3523	Importance of H-2 gas for growth of hot-wire CVD nanocrystalline 3C-SiC from SiH4/CH4/H-2 Hoshide Y, Komura Y, Tabata A, Kitagawa A, Kondo A
3524 - 3527	Preparation of n-type nanocrystalline 3C-SiC films by hot-wire CVD using N-2 as doping gas Hoshide Y, Tabata A, Kitagawa A, Kondo A
3528 - 3531	The growth of GaN films by alternate source gas supply hot-mesh CVD method Komae Y, Saitou T, Suemitsu M, Ito T, Endoh T, Nakazawa H, Narita Y, Takata M, Akahane T, Yasui K
3532 - 3535	A direct correlation between film structure and solar cell efficiency for HWCVD amorphous silicon germanium alloys Mahan AH, Xu Y, Gedvilas LM, Williamson DL
3536 - 3538	Initiated chemical vapor deposition of polymer films on nonplanar substrates Baxamusa SH, Gleason KK
3539 - 3542	iCVD growth of poly(N-vinylimidazole) and poly (N-vinylimidazole-co-N-vinylpyrrolidone) Chen GH, Lau KKS, Gleason KK
3543 - 3546	Crosslinking of copolymer thin films by initiated chemical vapor deposition for hydrogel applications Tenhaeff WE, Gleason KK
3547 - 3550	Surface modification of high aspect ratio structures with fluoropolymer coatings using chemical vapor deposition Gupta M, Gleason KK
3551 - 3554	HWCVD of polymers: Commercialization and scale-up Lewis HGP, Bansal NP, White AJ, Handy ES
3555 - 3558	Heat transfer model of an iCVD reactor Bakker R, Verlaan V, Verkerk AD, van der Werf CHM, van Dijk L, Rudolph H, Rath JK, Schropp REI
3559 - 3561	HFCVD of diamond and its application as electrode in aluminum electrolysis Wang SS, Chen GH, Yang FL
3562 - 3565	Combined model for growing mechanism of carbon nanotubes using HFCVD: effect of temperature and molecule gas diffusion Nguyen TH, Koh KH, Ngo TTT, Phan NM, Phan HK, Lee S
3566 - 3569	Formation of isolated carbon nanofibers with hot-wire CVD using nanosphere lithography as catalyst patterning technique Houweling ZS, Verlaan V, ten Grotenhuis GT, Schropp REI
3570 - 3574	Hot-wire CVD amorphous Si materials for solar cell application Wang Q
3575 - 3577	Amorphous silicon thin film solar cells deposited entirely by hot-wire chemical vapour deposition at low temperature (< 150 degrees C) Villar F, Antony A, Escarre J, Ibarz D, Roldan R, Stella M, Munoz D, Asensi JM, Bertomeu J
3578 - 3580	Optimization of KOH etching process to obtain textured substrates suitable for heterojunction solar cells fabricated by HWCVD Munoz D, Carreras P, Escarre J, Ibarz D, de Nicolas SM, Voz C, Asensi JM, Bertomeu J
3581 - 3583	Comparison of a-Si TFTs fabricated by Cat-CVD and PECVD methods Nishizaki S, Ohdaira K, Matsumura H
3584 - 3587	Trace detection of peroxides using a microcantilever detector Lock JP, Geraghty E, Kagumba LC, Mahmud KK
3588 - 3590	Continuous hot-wire chemical vapor deposition on moving glass substrates Bink A, Brinza M, Jongen JPH, Schropp REI
3591 - 3595	Metal oxide nanoparticles for advanced energy applications Lee SH, Deshpande R, Benhammou D, Parilla PA, Mahan AH, Dillon AC
3596 - 3599	Flexible electrochromic devices based on crystalline WO3 nanostructures produced with hot-wire chemical vapor deposition White CM, Gillaspie DT, Whitney E, Lee SH, Dillon AC
3600 - 3605	A hot-wire chemical vapor deposition (HWCVD) method for metal oxide and their alloy nanowire arrays Thangala J, Vaddiraju S, Malhotra S, Chakrapani V, Sunkara MK
3606 - 3611	A directly patternable click-active polymer film via initiated chemical vapor deposition (iCVD) Im SG, Kim BS, Tenhaeff WE, Hammond PT, Gleason KK
3612 - 3614	Initiated chemical vapor deposition of a siloxane coating for insulation of neural probes O'Shaughnessy WS, Edell DJ, Gleason KK
3615 - 3618	Grafted polymeric nanostructures patterned bottom-up by colloidal lithography and initiated chemical vapor deposition (iCVD) Trujillo NJ, Baxamusa S, Gleason KK
3619 - 3621	Nano-patterning of an iCVD polymer, followed by covalent attachment of QDs Lee CH, Tenhaeff W, Gleason KK
3622 - 3624	A novel patterning technique using super-hydrophobic PTFE thin films by Cat-CVD method Takachi M, Yasuoka H, Ohdaira K, Shimoda T, Matsumura H