Thin Solid Films

Thin Solid Films, Vol.516, No.13 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (18 articles)

4367 - 4367	Proceedings of the 19th symposium on plasma science for materials (SPSM-19) - Preface Takai O, Hori M, Tachibana K, Watanabe T
4368 - 4373	A practical simulation scheme for slot-excited microwave plasma reactor equipped with dual shower plate Tsuji A, Yasaka Y, Kang SY, Morimoto T, Sawada I
4374 - 4378	Formation of gas atom encapsulated silicon clusters using electron beam generated silicon plasmas Kaneko T, Takaya H, Hatakeyama R
4379 - 4383	Interaction between hydrogen plasma and hydrogenated amorphous carbon film, investigated by infrared spectroscopy Shinohara M, Cho K, Shibata H, Okamoto K, Nakatani T, Matsuda Y, Fujiyama H
4384 - 4390	Characteristics of polyimide-based composite membranes fabricated by low-temperature plasma polymerization Tran DT, Mori S, Suzuki M
4391 - 4396	Water plasma generation under atmospheric pressure for HFC destruction Watanabe T, Tsuru T
4397 - 4401	Characteristics of tungsten oxide thin films prepared on the flexible substrates using pulsed laser deposition Suda Y, Kawasaki H, Ohshima T, Yagyuu Y
4402 - 4406	Spherical submicron-size copper powders coagulated from a vapor phase in RF induction thermal plasma Kobayashi N, Kawakami Y, Kamada K, Li JG, Ye R, Watanabe T, Ishigaki T
4407 - 4414	Nonequilibrium situations in a pulse-modulated Ar-H-2 inductively coupled thermal plasma for hydrogen doping Ye R, Ishigaki T
4415 - 4422	Two-dimensional analysis of nanoparticle formation in induction thermal plasmas with counterflow cooling Shigeta M, Watanabe T
4423 - 4429	Decomposition of benzene in a corona discharge at atmospheric pressure Satoh K, Matsuzawa T, Itoh H
4430 - 4434	Large area VHF plasma production by a balanced power feeding method Nishimiya T, Takeuchi Y, Yamauchi Y, Takatsuka H, Shioya T, Muta H, Kawai Y
4435 - 4440	Microplasma discharge in ethanol solution: Characterization and its application to the synthesis of carbon microstructures Chen Q, Kitamura T, Saito K, Haruta K, Yamano Y, Ishikawa T, Shirai H
4441 - 4445	Sputter-assisted plasma CVD of wide or narrow optical bandgap amorphous CNx : H films usingi-C4H10/N-2 supermagnetron plasma Kinoshita H, Ikuta R, Yamaguchi T
4446 - 4451	Synthesis of ammonia using microwave discharge at atmospheric pressure Nakajima J, Sekiguchi H
4452 - 4455	Investigation of plasma parameters in 915 MHz ECR plasma with SiH4/H-2 mixtures Thang DH, Muta H, Kawai Y
4456 - 4461	Very-high-frequency thermal microplasma jet for the rapid crystallization of amorphous silicon Shirai H, Sakurai Y, Yeo M, Haruta K, Kobayashi T, Ishikawa T
4462 - 4467	Effect of bias application on c-BN synthesis by induction thermal plasmas under atmospheric pressure Watanabe T, Sataka R, Yamamoto K