137 - 139 |
Preparation and Properties of Sprayed Antimony Trisulfide Films Bhosale CH, Uplane MD, Patil PS, Lockhande CD |
140 - 144 |
Analysis of Si/Si(X)Ge(1-X)/Si Microstructures by Spectroscopic Ellipsometry Hulse JE, Heller LM, Rolfe SJ |
145 - 148 |
Deposition of Cobalt Disilicide Thin-Films by Laser-Ablation of Cast Targets Glebovsky VG, Oganyan RA, Ermolov SN, Kolosova EV |
149 - 155 |
Characterization of Boron-Doped Diamond Films Using (CH4-CO2) Gas-Mixtures with B(Och3)3 as a Dopant Source by Mpcvd Chen CF, Chen SH, Hong TM, Wang TC |
156 - 162 |
Variables Affecting Crystal-Structure, Composition and Orientation of RF-Sputtered Ba2Si2Tio8 Thin-Films Youdelis WV, Li Y, Chao BS, Yamauchi H |
165 - 165 |
Enhancement of Reactive Sputtering Rate of TiO2 Using a Planar and Dual Rotatable Cylindrical Magnetrons Belkind A, Wolfe J |
166 - 177 |
FTIR Characteristics of Halogenated Phthalocyanines Exhibiting Polymorphism Napier A, Collins RA |
178 - 183 |
The Columnar Microstructure of Amorphous Cadmium Arsenide Thin-Films Jurusik J |
184 - 192 |
Characterization of Tin(X)O(Y) Thin-Films on Architectural Glass by X-Ray Reflection and Spectrophotometry Polato P, Franz H, Rustichelli F, Montecchi M, Piegari A |
193 - 198 |
Quantitative-Analyses and Crystallographic Studies of Znsmn Thin-Films Prepared by RF Magnetron Reactive Sputtering Xian H, Benalloul P, Barthou C, Benoit J |
199 - 203 |
The Electrical-Properties of Sulfur-Passivated and Rapidly Thermally Annealed GaAs Metal-Oxide-Semiconductor Structures with the Oxide Layer Grown Anodically Eftekhari G |
204 - 211 |
Adhesion Studies of Sputtered Aluminum Films on Xc-70 Steel Substrates - Effects of the Application of a Bias Voltage on the Substrate During Deposition Lahmar A, Cailler M |
212 - 219 |
Mechanical-Stress Relaxation in Ion-Implanted SOS Structures Bolotov VV, Efremov MD, Volodin VA |
220 - 223 |
Optical-Properties of Sputter-Deposited Aluminum Nitride Films on Silicon Legrand PB, Wautelet M, Dugnoille B, Dauchot JP, Hecq M |
224 - 229 |
The Optical and Structural-Properties of Cugase2 Polycrystalline Thin-Films Elhady SA, Mansour BA, Elhagary MA |
230 - 233 |
Fluorescence of Perylene-4-Octadecanon in Langmuir-Blodgett-Films Sluch MI, Vitukhnovsky AG, Ande L |
234 - 239 |
Electrical and Optical-Properties of in-Situ Hydrogen-Reduced Titanium-Dioxide Thin-Films Deposited by Pulsed Excimer-Laser Ablation Ardakani HK |
240 - 246 |
Pulsed-Laser Deposition of MOS(X) Films in a Buffer Gas Atmosphere Fominsky VY, Markeev AM, Nevolin VN, Prokopenko VB, Vrublevski AR |
247 - 252 |
Electrical-Properties of Amorphous Barium-Titanate Films Prepared by Low-Power RF-Sputtering Chiou BS, Lin MC |
253 - 256 |
Effect of Some Spray-Pyrolysis Parameters on Electrical and Optical-Properties of ZnS Films Ashour A, Afifi HH, Mahmoud SA |
257 - 262 |
Crystallization of Solid-State Amorphized Al-Pt Thin-Films Blanpain B, Allen LH |
263 - 266 |
Derivation of the Current-Voltage Characteristics in Filamentary Conductors as a Function of the Distribution of Filament Cross-Sectional Areas Gravano S, Gould RD |