화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.248, No.2 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (22 articles)

137 - 139 Preparation and Properties of Sprayed Antimony Trisulfide Films
Bhosale CH, Uplane MD, Patil PS, Lockhande CD
140 - 144 Analysis of Si/Si(X)Ge(1-X)/Si Microstructures by Spectroscopic Ellipsometry
Hulse JE, Heller LM, Rolfe SJ
145 - 148 Deposition of Cobalt Disilicide Thin-Films by Laser-Ablation of Cast Targets
Glebovsky VG, Oganyan RA, Ermolov SN, Kolosova EV
149 - 155 Characterization of Boron-Doped Diamond Films Using (CH4-CO2) Gas-Mixtures with B(Och3)3 as a Dopant Source by Mpcvd
Chen CF, Chen SH, Hong TM, Wang TC
156 - 162 Variables Affecting Crystal-Structure, Composition and Orientation of RF-Sputtered Ba2Si2Tio8 Thin-Films
Youdelis WV, Li Y, Chao BS, Yamauchi H
165 - 165 Enhancement of Reactive Sputtering Rate of TiO2 Using a Planar and Dual Rotatable Cylindrical Magnetrons
Belkind A, Wolfe J
166 - 177 FTIR Characteristics of Halogenated Phthalocyanines Exhibiting Polymorphism
Napier A, Collins RA
178 - 183 The Columnar Microstructure of Amorphous Cadmium Arsenide Thin-Films
Jurusik J
184 - 192 Characterization of Tin(X)O(Y) Thin-Films on Architectural Glass by X-Ray Reflection and Spectrophotometry
Polato P, Franz H, Rustichelli F, Montecchi M, Piegari A
193 - 198 Quantitative-Analyses and Crystallographic Studies of Znsmn Thin-Films Prepared by RF Magnetron Reactive Sputtering
Xian H, Benalloul P, Barthou C, Benoit J
199 - 203 The Electrical-Properties of Sulfur-Passivated and Rapidly Thermally Annealed GaAs Metal-Oxide-Semiconductor Structures with the Oxide Layer Grown Anodically
Eftekhari G
204 - 211 Adhesion Studies of Sputtered Aluminum Films on Xc-70 Steel Substrates - Effects of the Application of a Bias Voltage on the Substrate During Deposition
Lahmar A, Cailler M
212 - 219 Mechanical-Stress Relaxation in Ion-Implanted SOS Structures
Bolotov VV, Efremov MD, Volodin VA
220 - 223 Optical-Properties of Sputter-Deposited Aluminum Nitride Films on Silicon
Legrand PB, Wautelet M, Dugnoille B, Dauchot JP, Hecq M
224 - 229 The Optical and Structural-Properties of Cugase2 Polycrystalline Thin-Films
Elhady SA, Mansour BA, Elhagary MA
230 - 233 Fluorescence of Perylene-4-Octadecanon in Langmuir-Blodgett-Films
Sluch MI, Vitukhnovsky AG, Ande L
234 - 239 Electrical and Optical-Properties of in-Situ Hydrogen-Reduced Titanium-Dioxide Thin-Films Deposited by Pulsed Excimer-Laser Ablation
Ardakani HK
240 - 246 Pulsed-Laser Deposition of MOS(X) Films in a Buffer Gas Atmosphere
Fominsky VY, Markeev AM, Nevolin VN, Prokopenko VB, Vrublevski AR
247 - 252 Electrical-Properties of Amorphous Barium-Titanate Films Prepared by Low-Power RF-Sputtering
Chiou BS, Lin MC
253 - 256 Effect of Some Spray-Pyrolysis Parameters on Electrical and Optical-Properties of ZnS Films
Ashour A, Afifi HH, Mahmoud SA
257 - 262 Crystallization of Solid-State Amorphized Al-Pt Thin-Films
Blanpain B, Allen LH
263 - 266 Derivation of the Current-Voltage Characteristics in Filamentary Conductors as a Function of the Distribution of Filament Cross-Sectional Areas
Gravano S, Gould RD