131 - 138 |
New Method of Ultra-Thin Film Characterization Applied to the Investigation of C/Ni/C Structures Under Heat Load Zheludeva SI, Kovalchuk MV, Novikova NN, Sosphenov AN, Malysheva NE, Salashenko NN, Akhsakhalyan AD, Platonov YY, Cernik RI, Collins SP |
139 - 145 |
Mechanisms of Polymer Film Deposition from RF Discharges of Acetylene, Nitrogen and Helium Mixtures Durrant SF, Marcal N, Castro SG, Vinhas RC, Demoraes MA, Nicola JH |
146 - 149 |
Single-Crystal Niobium Nitride Thin-Films Prepared with Radical Beam Assisted Deposition Hayashi N, Murzin IH, Sakamoto I, Ohkubo M |
150 - 153 |
Novel 2-Stage Selenization Process for the Preparation of ZnSe Films Lakshmikumar ST, Rastogi AC |
154 - 162 |
Low-Temperature Growth of RF Reactively Planar Magnetron-Sputtered AlN Films Penza M, Dericcardis MF, Mirenghi L, Tagliente MA, Verona E |
163 - 166 |
Interface Recombination and Photoluminescence Efficiency of Thick (Greater-Than-3 Mu-M) InGaAs Prepared by LPE with InAs-Enriched Composition Parry MK, Krier A |
167 - 173 |
Effect of Martensite Content on the Sliding Behavior of Boron-Ion-Implanted 304-Stainless-Steel Jain A, Shrivastava S |
174 - 180 |
Growth-Behavior of Chromium Carbide and Niobium Carbide Layers on Steel Substrate, Obtained by Salt Bath Immersion Coating Process Arai T, Moriyama S |
181 - 187 |
Deposition of Thick Doped Polysilicon Films with Low-Stress in an Epitaxial Reactor for Surface Micromachining Applications Kirsten M, Wenk B, Ericson F, Schweitz JA, Riethmuller W, Lange P |
188 - 193 |
Transparent and Conducting Coatings of Polyaniline Composites Wan MX, Li M, Li JC, Liu ZX |
194 - 202 |
Variation of Optical-Constants of Cadmium Telluride Thin-Films with Deposition Conditions Elkadry N, Ashour A, Ahmed MF, Abdelhady K |
203 - 211 |
Optical-Parameter Studies of as-Deposited and Annealed Se1-xTex Films Elzahed H, Elkorashy A, Dongol M |
212 - 217 |
Crystal-Structures and Optical-Properties of Tungsten-Oxide Films Prepared by a Complexing-Agent-Assisted Sol-Gel Process Nishide T, Mizukami F |
218 - 224 |
Fabrication and Characterization of Ba1-Xsr1-Xtio3 Tunable Thin-Film Capacitors Outzourhit A, Trefny JU, Kito T, Yarar B, Naziripour A, Hermann AM |
225 - 230 |
Room-Temperature, High-Deposition-Rate, Plasma-Enhanced Chemical-Vapor-Deposition of Silicon Oxynitride Thin-Films Producing Low Surface Damage on Lattice-Matched and Pseudomorphic III-V Quantum-Well Structures Sah RE, Ralston JD, Eichin G, Dischler B, Rothemund W, Wagner J, Larkins EC, Baumann H |
231 - 236 |
Correlation Between Grain Morphologies and Magnetic-Properties of Cocrpt/Cr Thin-Films Choe G, Chung SJ, Walser RM |
237 - 243 |
Sputtering of Dyfeco Layers with an Unbalanced Magnetron Mergel D, Bentin H, Raasch D |
244 - 247 |
Complexing Properties of Calix(4)Resorcinolarene lb Films Nabok AV, Lavrik NV, Kazantseva ZI, Nesterenko BA, Markovskiy LN, Kalchenko VI, Shivaniuk AN |
248 - 252 |
Transport-Properties of N-Cds0.5Se0.5/P-InP Heterojunction Cells Darwish S, Soliman HS, Riad AS |
253 - 258 |
Structural and Optical-Properties of a Strained CdTe/GaAs Heterostructure Grown by Temperature-Gradient Vapor Transport Deposition at Low-Temperature Kim TW, Park HL, Lee JY |
259 - 263 |
Ionic Penetration into Reoxidized Nitrided Oxides in Electrolyte-Oxide-Semiconductor Structures Topkar A, Lal R |
264 - 269 |
Low Leakage Current BaTiO3 Thin-Film Capacitors Using a Multilayer Construction Jia QX, Chang LH, Anderson WA |
270 - 274 |
Electrode-Limited Currents in Al-(Gesetl)-Al Thin-Films Petkov P, Vodenicharov C, Parvanov S |
275 - 280 |
Photoluminescence and Raman Studies of Porous Silicon Under Various Temperatures and Light Illuminations Chang CS, Lue JT |