185 - 187 |
Negative tone hybrid sol-gel material for electron-beam lithography Rantala JT, Penner RS, Honkanen S, Vahakangas J, Fallahi M, Peyghambarian N |
188 - 191 |
alpha-SiC layers grown on silicon via nano-sized silicon nitride precursor route Liu RC, Yang BF, Fu ZP, Chen Q, Hong L, Li M, Liu ZC, Ruan YZ |
192 - 196 |
Morphological differences in ZnO films deposited by the pyrosol technique: effect of HCl Smith A, Rodriguez-Clemente R |
197 - 199 |
Selective growth of high-quality 3C-SiC using a SiO2 sacrificial-layer technique Eickhoff M, Moller H, Rapp M, Kroetz G |
200 - 207 |
The effect of residual stress on adhesion of silicon-containing diamond-like carbon coatings Wu WJ, Hon MH |
208 - 211 |
Raman characteristics of hard carbon-nitride films deposited by reactive ionized cluster beam techniques Zou XR, Lu HW, Xie JQ, Feng JY |
212 - 216 |
Deposition and characterization of zinc oxide and tin oxide ultrafine particle bilayer thin films Wang W, Wang SY, Pan XR |
217 - 221 |
Pd-Ni thin films grown on porous AL(2)O(3) substrates by metalorganic chemical vapor deposition for hydrogen sensing Huang L, Gong H, Peng DK, Meng GY |
222 - 228 |
Thin microstructured polymer films by surface-directed film formation Braun HG, Meyer E |
229 - 235 |
W- and F-doped VO2 films studied by photoelectron spectrometry Burkhardt W, Christmann T, Meyer BK, Niessner W, Schalch D, Scharmann A |
236 - 239 |
The effects of the vacuum sublimation process on the composition of C-60/C-70 films Li JC, Yu T, Ye MS, Fan XJ |
240 - 243 |
Atmospheric-pressure chemical vapor deposition of fluorine-doped tin oxide thin films Suh SG, Zhang ZH, Chu WK, Hoffman DM |
244 - 254 |
Spin-on-glass thin films prepared from a novel polysilsesquioxane by thermal and ultraviolet-irradiation methods Pan Q, Gonzalez GB, Composto RJ, Wallace WE, Arkles B, Figge LK, Berry DH |
255 - 262 |
Platinum substitutes and two-phase-glass overlayers as a low cost alternatives to platinum aluminide coatings Prasad BD, Sankaran SN, Wiedemann KE, Glass DE |
263 - 269 |
(Ti,Cr)N and Ti TiN PVD coatings on 304 stainless steel substrates: Texture and residual stress Leoni M, Scardi P, Rossi S, Fedrizzi L, Massiani Y |
270 - 272 |
A new InGaP GaAs double delta-doped heterojunction bipolar transistor ((DHBT)-H-3) Cheng SY, Wang WC, Chang WL, Chen JY, Pan HJ, Liu WC |
273 - 277 |
Dependence of the sheet resistance of indium-tin-oxide thin films on grain size and grain orientation determined from X-ray diffraction techniques Kulkarni AK, Schulz KH, Lim TS, Khan M |
278 - 283 |
Effects of carrier film physical properties on WCMP Wang D, Zutshi A, Bibby T, Beaudoin SP, Cale TS |
284 - 291 |
YBCO films on nickel substrates prepared by spraying a suspension Yoshimura T, Ban E, Matsuoka Y |
292 - 299 |
Monolayer and epi-fluorescence microscopy studies of amino acid derivatized diacetylene lipids Cheng Q, Fu JA, Burkard R, Wang W, Yamamoto M, Yang J, Stevens RC |
300 - 306 |
Growth of (111)-oriented PZT on RuO2(100)/Pt(111) electrodes by in-situ sputtering Maeder T, Muralt P, Sagalowicz L |
307 - 311 |
Effect of heat treatment on nickel manganite thin film thermistors deposited by electron beam evaporation Parlak M, Hashemi T, Hogan MJ, Brinkman AW |
312 - 318 |
Electrochromic coatings-applications and manufacturing issues O'Brien NA, Gordon J, Mathew H, Hichwa BP |
319 - 329 |
Solid state amorphization in the Co-Ti system Benedictus R, Traeholt C, Bottger A, Mittemeijer EJ |
330 - 337 |
Characterization of ceria yttria stabilized zirconia grown on silicon substrate Hartmanova M, Gmucova K, Jergel M, Thurzo I, Kundracik F, Brunel M |