Thin Solid Films

Thin Solid Films, Vol.359, No.2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (30 articles)

125 - 126	Electrophotographic layers of trigonal Se in the binder obtained by reduction of SeO2 by hydrazine Ibragimov NI, Abutalibova ZM, Agaev VG
127 - 135	Electrical explosion of cold thin metal films Marakhtanov MK, Marakhtanov AM
136 - 140	A chemical method for the deposition of Bi2S3 thin films from a non-aqueous bath Mane RS, Sankapal BR, Lokhande CD
141 - 145	Structure and in-depth concentrations in excimer laser irradiated Pb-Co codeposited films Luby S, Majkova E, Jergel M, Senderak R, D'Anna E, Leggieri G, Luches A, Martino M
146 - 149	Preparation of single phase tungsten carbide by annealing of sputtered tungsten-carbon layers Romanus H, Cimalla V, Schaefer JA, Spiess L, Ecke G, Pezoldt J
150 - 153	Thermally stimulated exoelectronic emission of CVD diamond films Briand D, Iacconi P, Benabdesselam M, Lapraz D, Bindi R, May PW, Rego CA, Afzal A
154 - 159	Comparative study of CdS thin films deposited by single, continuous, and multiple dip chemical processes Oladeji IO, Chow L, Liu JR, Chu WK, Bustamante ANP, Fredricksen C, Schulte AF
160 - 164	Microstructure and properties of the CdS thin films prepared by electrostatic spray assisted vapour deposition (ESAVD) method Su B, Choy KL
165 - 170	Annealing effects on the structure and mechanical properties of r.f.-sputtered Cr-B hard thin films Zhou M, Nose M, Makino Y, Nogi K
171 - 176	Relations between the optical properties and the microstructure of TiO2 thin films prepared by ion-assisted deposition Leprince-Wang Y, Souche D, Yu-Zhang K, Fisson S, Vuye G, Rivory J
177 - 183	Optical and mechanical properties of TiO2/SiO2/organically modified silane composite films prepared by sol-gel processing Que WX, Sun Z, Zhou Y, Lam YL, Chan YC, Kam CH
184 - 187	Visible luminescence from photo-chemically etched silicon Yamamoto N, Takai H
188 - 196	A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor Aumaille K, Vallee C, Granier A, Goullet A, Gaboriau F, Turban G
197 - 202	Characterization of silicon oxynitride films by grazing-emission X-ray fluorescence spectrometry Monaghan ML, Nigam T, Houssa M, De Gendt S, Urbach HP, de Bokx PK
203 - 209	Surface roughness of pyrolytic tin dioxide films evaluated by different methods Niklasson GA, Ronnow D, Mattsson MS, Kullman L, Nilsson H, Roos A
210 - 214	Cracking and residual stress in hybrid coatings on float glass Malzbender J, de With G
215 - 220	Control of microstructure coarsening of a Ti substrate during diamond film deposition using Ar/H-2/CH4 gas mixture Fu YQ, Loh NL, Yan BB, Sun CQ, Hing P
221 - 227	Stress, porosity measurements and corrosion behaviour of AlN films deposited on steel substrates Vacandio F, Massiani Y, Gergaud P, Thomas O
228 - 235	Hardness measurements of Ti and TiC multilayers: a model Chicot D, Benarioua Y, Lesage J
236 - 238	A study of Si1-xGex/Si quantum-well intermixing by photocurrent spectroscopy Li C, Yang QQ, Chen YH, Wang HJ, Wang JZ, Yu JZ, Wang QM
239 - 243	Preparation of conducting layers of substituted polyacetylenes by solid-phase polymerization of Langmuir-Blodgett layers Dultsev FN, Repinsky SM, Sveshnikova LL
244 - 250	Investigation of annealing effects on indium tin oxide thin films by electron energy loss spectroscopy Zhu FR, Huan CHA, Zhang KR, Wee ATS
251 - 254	Fine trimming of SmS film resistance by XeCl laser ablation Miodushevsky P, Protopapa ML, De Tomasi F, Perrone MR, Tundo S, Vasanelli L
255 - 260	Material characterization of Cu(Ti)-polyimide thin film stacks Kondoh E
261 - 267	Oxidation, grain growth and reflow characteristics of copper thin films prepared by chemical vapor deposition Lee SY, Choi SH, Park CO
268 - 274	Solid-phase crystallization of hydrogenated amorphous silicon/hydrogenated microcrystalline silicon bilayers deposited by plasma-enhanced chemical vapor deposition Park CD, Kim HY, Cho MH, Jan KJ, Lee JY
275 - 282	Plasma deposition of amorphous carbon films on copper Chiu S, Turgeon S, Terreaul B, Sarkissian A
283 - 287	The structure of thin Cr film prepared by the vacuum evaporation method Kaito C, Nakamura H, Kimura S, Kimura Y, Nakada T, Saito Y
288 - 292	The atomic displacements on surface generated by low-energy projectile Ma ZQ, Kido Y
294 - 294	Effect of diatomic islands on step morphological stability of a terrace edge in molecular beam epitaxy (vol 353, pg 174, 1999) Lin SP, Hwang CC, Chu HS