Thin Solid Films

Thin Solid Films, Vol.386, No.2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (36 articles)

133 - 136	Preparation of large uniform amorphous silicon films by VHF-PECVD using a ladder-shaped antenna Takeuchi Y, Nawata Y, Ogawa K, Serizawa A, Yamauchi Y, Murata M
137 - 141	In situ spectroscopic ellipsometry of carbon nucleation and growth on Si in a deposition process by DC glow discharge of methane Moritani A, Kitahara K, Kitamura T, Katayama H, Kanayama N, Suzuki M
142 - 146	Electron-beam excited plasma etching reactor with polyimide interface film Morita S, Phatak GJ, Mori Y
147 - 151	Role of perovskite-type metal oxides on atmospheric pressure non-equilibrium plasma generation Kiyokawa K, Sugiyama K, Tomimatsu M, Kurokawa H, Miura H
152 - 159	Investigation of ECR plasma uniformity from the point of view of production and confinement Itagaki N, Yoshizawa T, Ueda Y, Kawai Y
160 - 164	Inductively coupled plasma application to the resist ashing Takagi K, Ikeda A, Fujimura T, Kuroki Y
165 - 172	Properties predictions of different mixed-gas induction plasmas by pulse modulated approach Paul KC, Sakuta T
173 - 176	Applications of TiO2 film for environmental purification deposited by controlled electron beam-excited plasma Ikezawa S, Homyara H, Kubota T, Suzuki R, Koh S, Mutuga F, Yoshioka T, Nishiwaki A, Ninomiya Y, Takahashi M, Baba K, Kida K, Hara T, Famakinwa T
177 - 182	Dependence of sintering temperatures of the BaTiO3 pellets on N2O generation characteristics in a packed-bed plasma reactor Kawasaki T, Kanazawa S, Ohkubo T, Mizeraczyk J, Nomoto Y
183 - 188	Melting municipal solid waste incineration residue by plasma melting furnace with a graphite electrode Katou K, Asou T, Kurauchi Y, Sameshima R
189 - 194	Application of radio-frequency thermal plasmas to treatment of fly ash Sakano M, Tanaka M, Watanabe T
195 - 199	An investigation on pulse discharge effect on the surface chemical transformation of fly ash Zhou YX, Nifuku M, Hajos G, Asada S, Katoh H
200 - 203	Ozone, ammonia and NOx destruction in corona discharge tubes coated with ozone catalyst Kogoma M, Okazaki S, Tanaka K, Inomata T
204 - 207	Plasma-induced degradation of aniline in aqueous solution Tezuka M, Iwasaki M
208 - 212	Development of powder antifoamer by atmospheric pressure glow plasma Nakajima T, Tanaka K, Inomata T, Kogoma M
213 - 216	Zirconia coating on amorphous magnetic powder by atmospheric pressure glow plasma Ogawa S, Takeda A, Oguchi M, Tanaka K, Inomata T, Kogoma M
217 - 221	Improvement in adhesive strength of fluorinated polymer films by atmospheric pressure glow plasma Tanaka K, Inomata T, Kogoma M
222 - 226	Apatite/titanium composite coatings on titanium or titanium alloy by RF plasma-spraying process Inagaki M, Yokogawa Y, Kameyama T
227 - 232	Coating of superplastic Ti-alloy substrates with Ti and Ti-O films by magnetron DC sputtering Sonoda T, Watazu A, Zhu J, Kamiya A, Nonami T, Kameyama T, Naganuma K, Kato M
233 - 238	Production of ultrafine titanium dioxide by DC plasma jet Oh SM, Park DW
239 - 242	Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling Hou K, Nakagarni S, Makabe T
243 - 247	Development of a compact nitrogen radical source by helicon-wave discharge employing a permanent magnet Sasaki K, Kokubu H, Hayashi D, Kadota K
248 - 251	Electron temperature and ion energy control in modified magnetron-typed RF discharge Shimizu T, Kato K, Li Y, Iizuka S, Sato N
252 - 255	In situ surface analysis by infrared reflection absorption spectroscopy in PECVD of silicon-oxide films Inoue Y, Sugimura H, Takai O
256 - 260	Optical emission spectroscopy study toward high rate growth of microcrystalline silicon Fukuda Y, Sakuma Y, Fukai C, Fujimura Y, Azuma K, Shirai H
261 - 266	Low temperature formation of microcrystalline silicon films using high-density SiH4 microwave plasma Sakuma Y, Liu HP, Shirai H, Moriya Y, Ueyama H
267 - 270	Effect of insertion of thin ZnO layer in transparent conductive ZnO : Al film Tominaga K, Murayama T, Mori I, Ushiro T, Moriga T, Nakabayashi I
271 - 275	Characterization of(Ti,Al)N films deposited by pulsed d.c. plasma-enhanced chemical vapor deposition Kawata K, Sugimura H, Takai O
276 - 280	Effect of substrate bias on AlN thin film preparation in shielded reactive vacuum are deposition Takikawa H, Kimura K, Miyano R, Sakakibara T, Bendavid A, Martin PJ, Matsumuro A, Tsutsumi K
281 - 285	Properties of V2O5 thin films deposited by means of plasma MOCVD Watanabe H, Itoh K, Matsumoto O
286 - 290	Production of fluorinated fullerene film by a CF4 RF plasma Yang SC, Mieno T
291 - 294	Production of Nb thin film by ECR sheet plasma Shibata K, Ito H, Yugami N, Miyazaki T, Nishida Y
295 - 299	Pulsed plasma processing of organic compounds in aqueous solution Sugiarto AT, Sato M
300 - 304	Application of microscale plasma to material processing Ito T, Izaki T, Terashima K
305 - 309	Plasma surface treatment of Nb-doped SrTiO3(100) studied by scanning tunneling microscopy Kawasaki H, Yamaguchi N, Terashima K
VII - VII	Proceedings of the 12th Symposium on Plasma Science for Materials (SPSM-12) Tokyo, Japan, 16-17 June 1999 - Preface Teii S, Oda T, Yoshida Y, Terashima K