Thin Solid Films

Thin Solid Films, Vol.409, No.2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (14 articles)

165 - 171	Effect of oxygen on the making of AlCuFe quasicrystalline coatings Bonasso N, Pigeat R, Rouxel D, Weber B
172 - 177	Thin amorphous platinum films photochemically obtained, and their potential use as modified electrodes Tejos M, Schrebler R, Diaz FR, del Valle MA
178 - 184	The effect of pressure control on a thermally stable a-C : N thin film with low dielectric constant by electron cyclotron resonance-plasma Liu XW, Lin JH, Jong WJ, Shih HC
185 - 193	In-situ thin film diagnostics using waveguide mode spectroscopy Jacobsen V, Menges B, Forch R, Mittler S, Knoll W
194 - 197	Room-temperature 1.54-mu m electroluminescence from Er-doped Si-rich SiO2 films deposited on p-Si by magnetron sputtering Yuan FC, Ran GZ, Chen Y, Dai L, Qiao YP, Ma ZC, Zong WH, Qin GG
198 - 205	Effects of impurities on the optical properties of poly-3-hexylthiophene thin films Erwin MM, McBride J, Kadavanich AV, Rosenthal SJ
206 - 210	In situ observation of coronene epitaxial adlayers on Au(111) surfaces prepared by the transfer of Langmuir films Uemura S, Sakata M, Taniguchi I, Hirayama C, Kunitake M
211 - 219	Dielectric properties of molybdenum-containing diamond-like carbon films deposited using electron cyclotron resonance chemical vapor deposition Huang QF, Yoon SF, Rusli, Zhang Q, Ahn J
220 - 226	Fabrication and characterization of aluminum oxide/chromium oxide superlattice for attenuated phase-shifting mask working at 193 nm wavelength Lai FD, Wang LA
227 - 232	Layer-by-layer assembly of DNA-dye complex films Chen XD, Lang J, Liu MH
233 - 242	Influence of gate metal film growth parameters on the properties of gas sensitive field-effect devices Abom AE, Persson P, Hultman L, Eriksson M
243 - 247	Reversible resistivity change of thin silver films in the spatial afterglow of a nitrogen discharge Diesing D, Berndt J, Douai D, Winter J
248 - 253	Stabilization of perovskite Pb(Mg1/3Nb2/3)O-3 thin film by a thin BaTiO3 buffer layer on Pt/Ti/SiO2/Si Wakiya N, Shinozaki K, Mizutani N
254 - 264	Nature of substoichiometry in reactively DC-sputtered tungsten oxide thin films and its effect on the maximum obtainable colouration by gases Stolze M, Camin B, Galbert F, Reinholz U, Thomas LK