Thin Solid Films

Thin Solid Films, Vol.411, No.2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (19 articles)

177 - 184	Surface reaction probabilities of radicals correlated from film thickness contours in silane chemical vapor deposition Tsai DS, Chang TC, Hsin WC, Hamamura H, Shimogaki Y
185 - 191	Titanium(IV) oxide thin films obtained by a two-step soft-solution method Peiro AM, Vigil E, Peral J, Domingo C, Domenech X, Ayllon JA
192 - 197	Sol-gel deposition and characterization of In6WO12 thin films Dabney WS, Antolino NE, Luisi BS, Richard AP, Edwards DD
198 - 202	Characteristics of transparent and conductive undoped ZnO thin films obtained by chemical spray using zinc pentanedionate Olvera AD, Maldonado A, Asomoza R, Tirado-Guerra S
203 - 210	Influence of oxygen plasma treatment on the microstructure of SnOx thin films Jiang JC, Lian K, Meletis EI
211 - 218	Spontaneous desorption time of flight mass spectrometry for the analysis of chemical reactions in thin solid films of a few monolayers and up to the micrometer regime Kramer S, Wohlfart P, Sterthaus R, Einsiedel H, Vydra J, Mittler S
219 - 224	Patterning of nanometer-scale silicide structures on silicon by'direct writing focus ion-beam implantation' Mitan MM, Pivin DP, Alford TL, Mayer JW
225 - 228	Microstructural characterization of Fe-N thin films Zhan Q, Yu R, He LL, Li DX
229 - 233	Thermal evolution of alpha- and beta-phases in the thin GaN on (001) GaAs Park YJ, Koh EK, Park CS, Park IW, Kim EK
234 - 239	X-ray diffraction investigations of structural changes in Co/Cu multilayers at elevated temperatures Hecker M, Pitschke W, Tietjen D, Schneider CM
240 - 246	SIMS characterization of GaAs MIS devices at the interface Chakraborty BR, Dilawar N, Pal S, Bose DN
247 - 255	Evaluation of interfacial toughness and bond strength of sandwiched silicon structures Latella BA, Nicholls TW, Cassidy DJ, Barbe CJ, Triani G
256 - 261	Ion irradiation effects on hardness and elastic modulus in AZ 1350Jphotoresist film Foerster CE, Garcia ITS, Zawislak FC, Serbena FC, Lepienski CM, Schreiner WH, Abbate M
262 - 267	Optical constants of indium tin oxide films as determined by a surface plasmon phase method Vaicikauskas V, Bremer J, Hunderi O, Antanavicius R, Januskevicius R
268 - 273	RF-magnetron-sputtered heteroepitaxial YSZ and CeO2/YSZ/Si(001) thin films with improved capacitance-voltage characteristics Wakiya N, Yoshida M, Kiguchi T, Shinozaki K, Mizutani N
274 - 279	Sensitivity of SrBi2Ta2O9 capacitors to materials and annealing processes in upper electrode formation Ohfuji S, Itsumi M, Ogawa S, Shinojima H
280 - 288	Interfacial polymerization of a 3,4-ethylenedioxythiophene derivative using Langmuir-Blodgett technique. Spectroscopic and electrochemical characterizations Fichet O, Tran-Van F, Teyssie D, Chevrot C
289 - 297	Nano structure analysis of sputtered thin films consisting of cobalt oxide and soda-lime glass composite Yamamoto H, Naito T, Terao M, Shintani T
298 - 302	Crystallization process of amorphous silicon-carbon alloys Calcagno L, Musumeci P, Roccaforte F, Bongiorno C, Foti G