Thin Solid Films

Thin Solid Films, Vol.445, No.2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (40 articles)

IX - IX	Proceedings of the Third International Symposium on Transparent Oxide Thin Films for Electronics and Optics (TOEO-3) - April 10-11, 2003, Tokyo BIG SIGHT, Tokyo, Japan - Preface Hosono H, Ginley D, Ichinose N, Shigesato Y
155 - 160	Doping and hydrogen in wide gap oxides Robertson J, Peacock PW
161 - 167	Hopping and optical absorption of electrons in nano-porous crystal 12CaO center dot 7Al(2)O(3) Sushko PV, Shluger AL, Hayashi K, Hirano M, Hosono H
168 - 174	The electronic structures of the thin films of InVO4 and TiO2 by first principles calculations Oshikiri M, Boero M, Ye J, Aryasetiawan F, Kido G
175 - 181	Changes in atomic and electronic structures of amorphous WO3 films due to electrochemical ion insertion Nanba T, Ishikawa M, Sakai Y, Miura Y
182 - 185	Observation of carrier dynamics in CdO thin films by excitation with femtosecond laser pulse Kawamura K, Maekawa K, Yanagi H, Hirano M, Hosono H
186 - 192	Key structural and defect chemical aspects of Cd-In-Sn-O transparent conducting oxides Mason TO, Kammler DR, Ingram BJ, Gonzalez GB, Young DL, Coutts TJ
193 - 198	Non-vacuum and PLD growth of next generation TCO materials Ginley D, Roy B, Ode A, Warmsingh C, Yoshida Y, Parilla P, Teplin C, Kaydanova T, Miedaner A, Curtis C, Martinson A, Coutts T, Readey D, Hosono H, Perkins J
199 - 206	Indium tin oxide films made from nanoparticles: models for the optical and electrical properties Ederth J, Heszler P, Hultaker A, Niklasson GA, Granqvist CG
207 - 212	Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films Ohno S, Sato D, Kon M, Song PK, Yoshikawa M, Suzuki K, Frach P, Shigesato Y
213 - 218	Study on MgO buffer in ZnO layers grown by plasma-assisted molecular beam epitaxy on Al2O3 (0001) Setiawan A, Ko HJ, Hong SK, Chen YF, Yao TF
219 - 223	Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering Sasabayashi T, Ito N, Nishimura E, Kon M, Song PK, Utsumi K, Kaijo A, Shigesato Y
224 - 228	Fabrication of thin films of ITO by aerosol CVD Maki K, Komiya N, Suzuki A
229 - 234	Study on In2O3-SnO2 transparent and conductive films prepared by d.c. sputtering using high density ceramic targets Utsumi K, Iigusa H, Tokumaru R, Song PK, Shigesato Y
235 - 240	Microstructures of ITO films deposited by d.c. magnetron sputtering with H2O introduction Nishimura E, Ohkawa H, Song PK, Shigesato Y
241 - 244	New transparent conductive films: FTO coated ITO Kawashima T, Matsui H, Tanabe N
245 - 250	Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering Hoshi Y, Kato H, Funatsu K
251 - 258	High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications Frach P, Gloss D, Goedicke K, Fahland M, Gnehr WM
259 - 262	Improved crystallinity of ZnO thin films grown by the'Aurora PLD method' Yata S, Nakashima Y, Kobayashi T
263 - 267	Low resistivity transparent conducting Al-doped ZnO films prepared by pulsed laser deposition Agura H, Suzuki A, Matsushita T, Aoki T, Okuda M
268 - 273	Transparent conducting ZnO thin films deposited by vacuum arc plasma evaporation Minami T, Ida S, Miyata T, Minamino Y
274 - 277	Growth and electrical properties of ZnO thin films deposited by novel ion plating method Iwata K, Sakemi T, Yamada A, Fons P, Awai K, Yamamoto T, Matsubara M, Tampo H, Niki S
278 - 283	Optical and electrical properties of ZnO films prepared by URT-IP method Shirakata S, Sakemi T, Awai K, Yamamoto T
284 - 287	Photoinduced hydroxylation at ZnO surface Asakuma N, Fukui T, Toki M, Awazu K, Imai H
288 - 293	Gap modulation in MCu[Q(1-x)Q'(x)]F (M = Ba, Sr; Q, Q' = S, Se, Re) and related materials Park CH, Keszler DA, Yanagi H, Tate J
294 - 298	Properties of copper-scandium oxide thin films prepared by pulsed laser deposition Kakehi Y, Nakao S, Satoh K, Yotsuya T
299 - 303	Effects of aluminum on the properties of p-type Cu-Al-O transparent oxide semiconductor prepared by reactive co-sputtering Ong CH, Gong H
304 - 308	Wide gap p-type degenerate semiconductor: Mg-doped LaCuOSe Hiramatsu H, Ueda K, Ohta H, Hirano M, Kamiya T, Hosono H
309 - 312	Thin film fabrication of nano-porous 12CaO center dot 7Al(2)O(3) crystal and its conversion into transparent conductive films by light illumination Toda Y, Miyakawa M, Hayashi K, Kamiya T, Hirano M, Hosono H
313 - 316	In situ observation of absorption spectra and adsorbed species of methylene blue on indium-tin-oxide electrode by slab optical waveguide spectroscopy Matsuda N, Santos JH, Takatsu A, Kato K
317 - 321	UV-detector based on pn-heteroj unction diode composed of transparent oxide semiconductors, p-NiO/n-ZnO Ohta H, Kamiya M, Kamaiya T, Hirano M, Hosono H
322 - 326	Electron transport in InGaO3(ZnO)(m) (m = integer) studied using single-crystalline thin films and transparent MISFETs Nomura K, Ohta H, Ueda K, Kamiya T, Hirano M, Hosono H
327 - 331	Photovoltaic effect observed in transparent p-n heterojunctions based on oxide semiconductors Tonooka K, Bando H, Aiura Y
332 - 341	Surface modification of polymers by ion-assisted reaction Cho JS, Han S, Kim KH, Beag YW, Koh SK
342 - 352	Interface modification of ITO thin films: organic photovoltaic cells Armstrong NR, Carter C, Donley C, Simmonds A, Lee P, Brumbach M, Kippelen B, Domercq B, Yoo SY
353 - 357	Improvement of emission efficiency in polymer light-emitting devices based on phosphorescent polymers Tokito S, Suzuki M, Sato F
358 - 366	Surface conditioning of indium-tin oxide anodes for organic light-emitting diodes Kim JS, Cacialli F, Friend R
367 - 376	Oxide phosphor and dielectric thin films for electroluminescent devices Kitai AH
377 - 381	PL and EL properties of Tm-activated vanadium oxide-based phosphor thin films Minami T, Utsubo T, Miyata T, Suzuki Y
382 - 386	Spectroscopic properties of Er3+ in sol-gel derived ZrO2 films Maeda N, Wada N, Onoda H, Maegawa A, Kojima K