XI - XI |
Proceedings of the 33rd International Conference on Metallurgical Coatings and Thin Films - San Diego, California, May 1-5, 2006 - Preface Stewart A, Erdemir A, Patscheider J, Pauleau Y |
847 - 853 |
Determining indices of refraction for ThO2 thin films sputtered under different bias voltages from 1.2 to 6.5 eV by spectroscopic ellipsometry Evans WR, Allred DD |
854 - 858 |
Fabrication of optical elements with better than lambda/1000 thickness uniformity by thin-film deposition through a multi-aperture mask Arkwright JW |
859 - 865 |
Chemomechanical effects in optical coating systems Belde KJ, Bull SJ |
866 - 871 |
Property change in multifunctional TiCxOy thin films: Effect of the O/Ti ratio Fernandes AC, Carvalho P, Vaz F, Lanceros-Mendez S, Machado AV, Parreira NMG, Pierson JF, Martin N |
872 - 875 |
Effect of alumina doping on structural, electrical, and optical properties of sputtered ZnO thin films Bai SN, Tseng TY |
876 - 879 |
High quality transparent conductive ZnO/Ag/ZnO multilayer films deposited at room temperature Sahu DR, Huang JL |
880 - 884 |
Effect of deposition conditions on the characteristics of ZnO-SnO2 thin films deposited by filtered vacuum arc Cetinorgu E, Goldsmith S, Boxman RL |
885 - 890 |
Filtered vacuum arc deposition of transparent conducting Al-doped ZnO films Zhitomirsky VN, Cetinorgu E, Adler E, Rosenberg Y, Boxman RL, Goldsmith S |
891 - 895 |
White organic light-emitting diodes from three emitter layers Kim MS, Lim JT, Jeong CH, Lee JH, Yeom GY |
896 - 901 |
LCD-based color filter films fabricated by a pigment-based colorant photo resist inks and printing technology Koo HS, Chen M, Pan PC |
902 - 906 |
Organic light emitting diodes based on dipyridamole drug Legnani C, Louro SR, Quirino WG, Tabak M, Cremona M |
907 - 910 |
Calculation of film thickness for dip coated antireflective films Crawford LJ, Edmonds NR |
911 - 916 |
Ellipsometer measurements using focused and masked beams Barton D, Urban FK |
917 - 921 |
Characteristics of SiOxNy films deposited by inductively coupled plasma enhanced chemical vapor deposition using HMDS/NH3/O-2/Ar for water vapor diffusion barrier Lee JH, Jeong CH, Kim HB, Lim JT, Kyung SJ, Yeom GY |
922 - 926 |
Influence of annealing temperature on domain shape of periodically poled LiNbO3 for Ti : LN waveguides Kwon SW, Song YS, Yang WS, Lee HM, Kim WK, Lee HY, Kim BY, Lee MH, Lee DY |
927 - 931 |
Electroluminescence of a device based on europium beta-diketonate with phosphine oxide complex Quirino WG, Adati RD, Lima SAM, Legnani C, Jafelicci M, Davolos MR, Cremona M |
932 - 935 |
Effect of substrate temperature and annealing treatment on the electrical and optical properties of silver-based multilayer coating electrodes Sahu DR, Chen CY, Lin SY, Huang JL |
936 - 941 |
The effects of the doping elements on the optical properties of silver-based alloy layers for storage media usage Su CY, Yang CS, Lin HC, Lin W |
942 - 946 |
Hard UV-curable organo-mineral coatings for optical applications Blanc D, Last A, Franc J, Pavan S, Loubet JL |
947 - 951 |
In-situ ellipsometric monitor with layer-by-layer analysis for precise thickness control of EUV multilayer optics Tsuru T, Yamamoto M |
952 - 956 |
Optical, electrical and mechanical properties of the tantalum oxynitride thin films deposited by pulsing reactive gas sputtering Le Dreo H, Banakh O, Keppner H, Steinmann PA, Briand D, de Rooij NF |
957 - 960 |
Effect of metal (Al, Ga, and In)-dopants and/or Ag-nanoparticles on the optical and electrical properties of ZnO thin films Hong CS, Park HH, Moon J, Park HH |
961 - 966 |
Near-infrared photoluminescence of vertically aligned InN nanorods grown on Si(111) by plasma-assisted molecular-beam epitaxy Chen HY, Shen CH, Lin HW, Chen CH, Wu CY, Gwo S, Davydov VY, Klochikhin AA |
967 - 972 |
Thick c-BN coatings - Preparation, properties and application tests Keunecke M, Wiemann E, Weigel K, Park ST, Bewilogua K |
973 - 978 |
Structural evolution of boron nitride films grown on diamond buffer-layers Huang PC, Yang TS, Chu SS, Wong MS |
979 - 983 |
Water adsorption on lubricated fullerene-like CNx films Broitman E, Pushkarev VV, Gellman AJ, Neidhardt J, Furlan A, Hultman L |
984 - 989 |
GaN nanowires: CVD synthesis and properties Cai XM, Djurisic AB, Me MH |
990 - 995 |
A heating and diffusion barrier based on TaSiNx for miniaturized IC devices Cheng HY, Chen YC, Lee CM, Wang SH, Chin TS |
996 - 999 |
Quantifying clustering in disordered carbon thin films Carey JD |
1000 - 1004 |
Nanoindentation-induced deformation behaviour of diamond-like carbon coatings on silicon substrates Haq AJ, Munroe PR, Hoffman M, Martin PJ, Bendavid A |
1005 - 1010 |
Nanocrystalline diamond growth on different substrates Kulisch W, Popov C, Vorlicek V, Gibson PN, Favaro G |
1011 - 1016 |
Raman spectroscopy characterization of diamond films on steel substrates with titanium carbide are-plated interlayer Polini R, Mattei G, Valle R, Casadei F |
1017 - 1024 |
The versatility of hot-filament activated chemical vapor deposition Schafer L, Hofer M, Kroger R |
1025 - 1027 |
Field emission characteristics of chromium carbide capped carbon nanotips Hsu CH, Chen CF, Lo HC |
1028 - 1032 |
Fullerene-like CPx: A first-principles study of the relative stability of precursors and defect energetics during synthetic growth Furlan A, Gueorguiev GK, Hogberg H, Stafstrom S, Hultman L |
1033 - 1037 |
Immobilization of TiO2 nanoparticles on Fe-filled carbon nanocapsules for photocatalytic applications Huang HC, Huang GL, Chen HL, Lee YD |
1038 - 1042 |
Electrochemical corrosion behavior of carbon-based thin films in chloride ions containing electrolytes Reisel G, Irmer G, Wielage B, Dorner-Reisel A |
1043 - 1046 |
Reactively sputtered GaAsxN1-x thin films Yadav BS, Major SS, Srinivasa RS |
1047 - 1052 |
Influence of metal plasma ion implantation on photo-sensitivity of anatase TiO2 thin films Wang DY, Lin HC, Yen CC |
1053 - 1057 |
Metal-doped diamond-like carbon films synthesized by filter-arc deposition Weng KW, Chen YC, Lin TN, Wang DY |
1058 - 1062 |
New approach in depositing thick, layered cubic boron nitride coatings by oxygen addition - structural and compositional analysis Lattemann M, Ulrich S, Ye J |
1063 - 1068 |
Characterization of magnetron co-sputtered W-doped C-based films Silva CWE, Branco JRT, Cavaleiro A |
1069 - 1073 |
Effects of deposition and post-annealing conditions on electrical properties and thermal stability of TiAlN films by ion beam sputter deposition Lee SY, Wang SC, Chen JS, Huang JL |
1074 - 1079 |
Wear behavior of aluminum-coated glass compared to uncoated glass investigated by cyclic wear tests in the micrometer scale Linss V, Chudoba T, Kupfer H |
1080 - 1086 |
Comprehensive analysis of thin film nanoindentation data via internetportal - A principal feasibility study Schwarzer N, Fuchs M |
1087 - 1092 |
SIMS studies of low-K materials Lin XF, Smith SP |
1093 - 1096 |
Corrosion resistance of the layers formed on the surface of plasma-nitrided AISI 304L steel Gontijo LC, Machado R, Kuri SE, Casteletti LC, Nascente PAP |
1097 - 1101 |
Comparison of microstructure and phase transformation for nanolayered CrN/AlN and TiN/AlN coatings at elevated temperatures in air environment Tien SK, Duh JG |
1102 - 1106 |
Structural characterization of sputter-deposited Ba0.48Sr0.52TiO3/LaNiO3 artificial superlattice structure by X-ray reflectivity and diffraction Lee HY, Wu KF, Liu HJ, Lee CH, Liang YC |
1107 - 1111 |
Characterization of Pd-free electroless Co-based cap selectively deposited on Cu surface via borane-based reducing agent Chang SY, Wan CC, Wang YY, Shih CH, Tsai MH, Shue SL, Yu CH, Liang MS |
1112 - 1116 |
High-performance polycrystalline silicon thin-film transistors with oxidenitride-oxide gate dielectric and multiple nanowire channels Chen SC, Chang TC, Liu PT, Wu YC, Tsai CC, Chang TS, Lien CH |
1117 - 1120 |
Application of the low dielectric methyl-silsesquiazane (MSZ) as a passivation layer on TFT-LCD Chang TS, Chang TC, Liu PT, Chiang CY, Chen SC, Yeh FS |
1121 - 1125 |
Characterization of activated non-evaporable porous Ti and Ti-Zr-V getter films by synchrotron radiation photoemission spectroscopy Li CC, Huang JL, Lin RJ, Chen CH, Lii DF |
1126 - 1131 |
Synthesis and characteristics of polyimide/titania nano hybrid films Tsai MH, Liu SJ, Chiang PC |
1132 - 1137 |
Raman spectra and structural analysis in ZrOxNy thin films Moura C, Carvalho P, Vaz F, Cunha L, Alves E |
1138 - 1141 |
Measurements and modeling of the DC temperature dependence of electrical conductivity in thin films of lead phthalocyanine Shafai TS, Gould RD |
1142 - 1146 |
Room-temperature deposition of carbon nanomaterials by excimer laser ablation Radhakrishnan G, Adams PM, Bernstein LS |
1147 - 1151 |
Analysis of nanostructured coatings synthesized by ballistic impaction of nanoparticles Hafiz J, Mukherjee R, Wang X, Heberlein JVR, McMurry PH, Girshick SL |
1152 - 1156 |
The thermal stability of nanocrystalline Au-Cu alloys Jankowski AF, Saw CK, Hayes JP |
1157 - 1160 |
Spray pyrolysis deposition of zinc oxide nanostructured layers Krunks M, Dedova T, Acik IO |
1161 - 1165 |
Nanoparticle dispersion-strengthened coatings and electrode materials for electrospark deposition Levashov EA, Vakaev PV, Zamulaeva EI, Kudryashov AE, Pogozhev YS, Shtansky DV, Voevodin AA, Sanz A |
1166 - 1170 |
Growth of epitaxial Cu on MgO(001) by magnetron sputter deposition Purswani JM, Spila T, Gall D |
1171 - 1175 |
Multifunctional thin film sensors based on amorphous diamond-like carbon for use in tribological applications Biehl S, Luthje H, Bandorf R, Sick JH |
1176 - 1181 |
Fabricating highly active mixed phase TiO2 photocatalysts by reactive DC magnetron sputter deposition Chen L, Graham ME, Li GH, Gray KA |
1182 - 1186 |
Titanium oxide thin films deposited by high-power impulse magnetron sputtering Konstantinidis S, Dauchot JP, Hecq A |
1187 - 1191 |
Effect of combined shot-peening and PEO treatment on fatigue life of 2024 Al alloy Asquith DT, Yerokhin AL, Yates JR, Matthews A |
1192 - 1196 |
Silicon-metal clusters: Nano-templates for cluster assembled materials Gueorguiev GK, Pacheco JM, Stafstrom S, Hultman L |
1197 - 1202 |
Analysis of the growth of concomitant nitride layers produced by a post-discharge assisted process Oseguera J, Castillo F, Gomez A, Fraguela A |
1203 - 1205 |
Extraction of effective dielectric constants and the effect of process damage of low-k dielectrics for advanced interconnects Cheng YL, Wang YL, Chen HC |
1206 - 1209 |
Study on electrical degradation of p-type low-temperature polycrystalline silicon thin film transistors with C-V measurement analysis Huang SC, Kao YH, Tai YH |
1210 - 1213 |
Statistical study on the states in the low-temperature poly-silicon films with thin film transistors Huang SC, Chou YP, Tai YH |
1214 - 1218 |
Improved stability of plasma-sprayed dicalcium silicate/zirconia composite coating Xie YT, Liu XY, Zheng XB, Ding CX, Chu PK |
1219 - 1222 |
Hemocompatibility of lanthanum oxide films fabricated by dual plasma deposition Jing FJ, Wang L, Liu YW, Fu RKY, Zhao XB, Shen R, Huang N, Chu PK |
1223 - 1227 |
The structure of Ta nanopillars grown by glancing angle deposition Zhou CM, Gall D |