2829 - 2832 |
Thermal oxidation properties of titanium nitride and titanium-aluminum nitride materials - A perspective for high temperature air-stable solar selective absorber applications Yin Y, Hang L, Zhang S, Bui XL |
2833 - 2841 |
Surface modification of indium tin oxide anodes by self-assembly monolayers: Effects on interfacial morphology and charge injection in organic light-emitting diodes Chong LW, Lee YL, Wen TC |
2842 - 2846 |
Synthesis of heteropoly oxometalate/amphiphilic block copolymer composite thin films with self-ordered mesostructures Yun HS, Kuwabara M, Zhou HS, Honma I |
2847 - 2853 |
Structural evolution of La-Cr-O thin film: Part II. Elasto-plastic properties by nanoindentation Lugovy M, Coratolo A, Orlovskaya N, Johnson C, Gemmen R |
2854 - 2859 |
Influence of alcohol on grain growth of tin oxide in chemical vapor deposition Matsui Y, Mitsuhashi M, Yamamoto Y, Higashi S |
2860 - 2863 |
Influence of incidence angle and distance on the structure of aluminium nitride films prepared by reactive magnetron sputtering You YZ, Kim D |
2864 - 2871 |
Characterizations of ferromagnetic Zn1-xCoxO thin films grown on Al2O3 (0001) by reactive radio-frequency magnetron sputtering coupled with post-growth annealing Choi CH, Kim SH |
2872 - 2878 |
Agglomeration of amorphous silicon film with high energy density excimer laser irradiation He M, Ishihara R, Metselaar W, Beenakker K |
2879 - 2884 |
Self-compensation in ZnO thin films: An insight from X-ray photoelectron spectroscopy, Raman spectroscopy and time-of-flight secondary ion mass spectroscopy analyses Saw KG, Ibrahim K, Lim YT, Chai MK |
2885 - 2890 |
Optical properties of erbium oxide thin films deposited by electron beam evaporation Al-Kuhaili MF, Durrani SMA |
2891 - 2896 |
Low-temperature crystallization of sol-gel-derived lead zirconate titanate thin films using 2.45 GHz microwaves Bhaskar A, Chang TH, Chang HY, Cheng SY |
2897 - 2902 |
Fabrication of TiO2 nanotube film by well-aligned ZnO nanorod array film and sol-gel process Qui JJ, Jin ZG, Liu ZF, Liu XX, Liu GQ, Wu WB, Zhang X, Gao XD |
2903 - 2920 |
Topographical evolution of sputtered chromium nitride thin films Gerbig YB, Spassov V, Savan A, Chetwynd DG |
2921 - 2925 |
Transparent conducting indium oxide thin films grown by low-temperature metal organic chemical vapor deposition Wang CY, Cimalla V, Cherkashinin G, Romanus H, Ali M, Ambacher O |
2926 - 2934 |
Deposition of nano-crystalline graphite films by cathodic plasma electrolysis Paulmier T, Bell JM, Fredericks PM |
2935 - 2942 |
Synthesis of type-II textured tungsten disulfide thin films with bismuth interfacial layer as a texture promoter Sadale SB, Barman SR, Patil PS |
2943 - 2948 |
Structural properties of cobalt ferrite thin films deposited by pulsed laser deposition: Effect of the reactive atmosphere Hassan RS, Viart N, Ulhaq-Bouillet C, Loison JL, Versini G, Vola JP, Cregut O, Pourroy G, Muller D, Chateigner D |
2949 - 2953 |
Fabrication of nanocrystalline silicon carbide thin film by helicon wave plasma enhanced chemical vapour deposition Yu W, Lu WB, Yang YB, Wang CS, Zhang L, Fu GS |
2954 - 2957 |
Development of low temperature approaches to device quality CdS: A modified geometry for solution growth of thin films and their characterisation Archbold MD, Halliday DP, Durose K, Hase TPA, Boyle DS, Mazzamuto S, Romeo N, Bosio A |
2958 - 2964 |
Synthesis of carbon nanofiber films and nanofiber composite coatings by laser-assisted catalytic chemical vapor deposition Longtin R, Fauteux C, Goduguchinta R, Pegna J |
2965 - 2973 |
Phase separation and surface morphology of spin-coated films of polyetherimide/polycaprolactone immiscible polymer blends Liu T, Ozisik R, Siegel RW |
2974 - 2983 |
Morphological evolution of edge-hillocks on single-crystal films having anisotropic drift-diffusion under the capillary and electromigration forces Ogurtani TO, Celik A, Oren EE |
2984 - 2989 |
Characteristics of atomic layer deposition grown HfO2 films after exposure to plasma treatments Kim YW, Roh Y, Yoo JB, Kim H |
2990 - 2997 |
Experimental investigation of the reversible collapse of a capped amphiphile Langmuir monolayer Haycraft JJ, DeVries CA, Flores HG, Lech A, Hagen JP, Eckhardt CJ |
2998 - 3004 |
Formation and surface modification of self-assembled films with acrylated hyperbranched poly(ester-amine) as the outmost layer Tang LM, You H, Feng J |
3005 - 3010 |
Initiation of interface crack at free edge between thin films with weak stress singularity Kitamura T, Hirakata H, Van Truong D |
3011 - 3018 |
Effects of ion implantation on the mechanical behavior of GaN films Kavouras P, Konminou P, Karakostas T |
3019 - 3023 |
Utilization of copper phthalocyanine and bathocuproine as an electron transport layer in photovoltaic cells with copper phthalocyanine/buckminsterfullerene heterojunctions: Thickness effects on photovoltaic perfonnances Hong ZR, Huang ZH, Zeng XT |
3024 - 3029 |
Properties of transparent conducting oxides formed from CdO alloyed with In2O3 Ali HM, Mohamed HA, Wakkad MM, Hasaneen MF |
3030 - 3039 |
Effect of film thickness and the presence of surface fluorine on the structure of a thin barrier film deposited from tetrakis-(dimethylamino)-titanium onto a Si(100)-2 x 1 substrate Ni CY, Zhang ZP, Wells M, Beebe TP, Pirolli L, De Leo LPM, Teplyakov AV |
3040 - 3045 |
Nickel pulse reversal plating for image reversal of ultrathin electron beam resist Awad Y, Lavallee E, Beauvais J, Drouin D, Mun LK, Yang P, Cloutier M, Turcotte D |
3046 - 3051 |
On the band diagram of Mg2Si/Si heterojunction as deduced from optical constants dispersions Atanassov A, Baleva M |
3052 - 3056 |
Composition, structural and electrical properties of thin films prepared by laser ablation of neodymium-doped potassium gadolinium tungstate Atanasov PA, Dikovska AO, Perriere J, Defourneau RM |
3057 - 3060 |
Al-doped ZnO thin films deposited by reactive frequency magnetron sputtering: H-2-induced property changes Liu WF, Du GT, Sun YF, Xu YB, Yang TP, Wang XS, Chang YC, Qiu FB |
3061 - 3064 |
Molecularly ordered aluminum tris-(8-hydroxyquinoline) thin films grown by hot-wall deposition Tapponnier A, Khan RUA, Marcolli C, Gunther P |
3065 - 3072 |
The effects of diffusion coefficient on the etching process of sacrificial oxide layers Jin ZH, Wu CJ, Ma HL, Xu NN, Wang YL |
3073 - 3078 |
Post-annealing temperature dependence of infrared absorption enhancement of polymer on evaporated silver films Suzuki Y, Ojima Y, Fukui Y, Fazyia H, Sagisaka K |
3079 - 3084 |
Effects of substrate temperature and post-deposition anneal on properties of evaporated cadmium telluride films Bacaksiz E, Basol BM, Altunbas M, Novruzov V, Yanmaz E, Nezir S |
3085 - 3089 |
Enhanced electroluminescence in emissive polymer/CdSe double-layer films Park JH, Park SI, Kim TH, Park OO |
3090 - 3095 |
Electrodeposited copper oxide films: Effect of bath pH on grain orientation and orientation-dependent interfacial behavior Wang LC, de Tacconi NR, Chenthamarakshan CR, Rajeshwar K, Tao M |
3096 - 3101 |
Preparation of strain-included rutile titanium oxide thin films and influence of the strain upon optical properties Nambara T, Yoshida K, Miao L, Tanemura S, Tanaka N |
3102 - 3106 |
Control of liquid crystal alignment by deposition of silicon oxide thin film Son PK, Park JH, Kim JC, Yoon TH |
3107 - 3111 |
Nano-structure of polyimide and poly(isobutyl methacrylate) monolayer films studied by interlayer electron transfer between porphyrin and pyromellitic diimide moieties Ogi T, Benten H, Ito S |
3112 - 3119 |
Fluorescence behaviors of 5-dimethylamino-1-naphthalene-sulfonyl-functionalized self-assembled monolayer on glass wafer surface and its sensing properties for nitrobenzene Ding LP, Kang JP, Lu FT, Gao LN, Yin X, Fang Y |
3120 - 3125 |
Stress development in plasma-deposited silicon dioxide thin-films due to hydrogen evolution Mani S, Saif T |
3126 - 3131 |
Improvements of fill factor in solar cells based on blends of polyfluorene copolymers as electron donors Gadisa A, Zhang FL, Sharma D, Svensson M, Andersson MR, Inganas O |
3132 - 3137 |
Pentacene thin-film transistors and inverters with plasma-enhanced atomic-layer-deposited Al2O3 gate dielectric Koo JB, Lim JW, Kim SH, Yun SJ, Ku CH, Lim SC, Lee JH |
3138 - 3145 |
Enhanced adhesion of atomic layer deposited titania on polycarbonate substrates Latella BA, Triani G, Zhang Z, Short KT, Bartlett JR, Ignat M |
3146 - 3150 |
Effects of Ti transition layer on stability of silver/titanium dioxide multilayered structure Wang ZG, Cai X, Chen QL, Chu PK |