화학공학소재연구정보센터

Materials Chemistry and Physics

Materials Chemistry and Physics, Vol.63, No.3 Entire volume, number list
ISSN: 0254-0584 (Print) 

In this Issue (15 articles)

183 - 187 Growth, and physical properties of potassium lithium niobate (KLN) single crystal with high Nb2O5 content
Kang GY, Yoon JK
188 - 195 A multi-component molecular material design study on the correlation of electronic properties and proton transfer in N-salicylideneaniline derivatives
Zhang Y, Lu ZH
196 - 201 Low pressure chemical vapor deposition of silicon carbide from dichlorosilane and acetylene
Wang CF, Tsai DS
202 - 207 Formation of epitaxial cobalt silicide films on (100) Si using Co/Ti, Co/Nb, and Co/Hf bilayers
Kwon Y, Lee C
208 - 212 Thin films of FeVO4 obtained by annealing under room atmosphere of Fe and V layers sequentially deposited
Ali EB, Bernede JC, Barreau A
213 - 217 Macroporous silicon with a photonic band gap at 3 mu m
Moussa R, Zaoui A, Certier M, Aourag H
218 - 225 Preparation of manganite perovskites by a wet-chemical method involving a redox reaction and their characterisation
Philip J, Kutty TRN
226 - 229 A new chemical method for the preparation of Ag2S thin films
Sankapal BR, Mane RS, Lokhande CD
230 - 234 Preparation and characterization of Bi2Se3 thin films deposited by successive ionic layer adsorption and reaction (SILAR) method
Sankapal BR, Mane RS, Lokhande CD
235 - 239 Study of wetters in nickel electroforming of 3D microstructures
Wei ZJ, Wang YY, Wan CC, Huang CH
240 - 250 EPR spectra and electrical conductivity of perovskite-like BaBi(1-x)Ln(x)O(3-delta) (Ln = La, Pr)
Yaremchenko AA, Kharton VV, Kovalevsky AV, Lapchuk NM, Naumovich EN
251 - 255 Surface tension of silane treated natural zeolite
Lee JY, Lee SH, Kim SW
256 - 262 Mechanism of electrolytic ZrO2 coating on commercial pure titanium
Yen SK
263 - 269 (Photo)electrochemical investigations on spray deposited n-Sb2S3 thin film/polyiodide/C photoelectrochemical solar cells
Rajpure KY, Bhosale CH
270 - 273 Drift behavior of ISFETs with a-Si : H-SiO2 gate insulator
Chou JC, Hsiao CN