VII - VII |
Proceedings of the 6th International Workshop on Bulk Nitride Semiconductors Galindia, Iznota, Poland 23-28 August 2009 Preface Freitas JA, Grzegory I, Ehrentraut D |
2499 - 2502 |
Recent achievements in AMMONO-bulk method Dwilinski R, Doradzinski R, Garczynski J, Sierzputowski L, Kucharski R, Zajac M, Rudzinski M, Kudrawiec R, Serafinczuk J, Strupinski W |
2503 - 2506 |
Improvement of crystal quality in ammonothermal growth of bulk GaN Hashimoto T, Letts E, Ikari M, Nojima Y |
2507 - 2513 |
Inversion domains and parallel growth in ammonothermally grown GaN crystals Wang B, Suscavage M, Bliss DF, Jimenez J |
2514 - 2518 |
Ammonothermal crystal growth of gallium nitride - A brief discussion of critical issues Ehrentraut D, Fukuda T |
2519 - 2521 |
Growth of AlN single crystalline boules Herro ZG, Zhuang D, Schlesser R, Sitar Z |
2522 - 2526 |
Crystal growth of mixed AlN-SiC bulk crystals Filip O, Bickermann M, Epelbaum BM, Heimann P, Winnacker A |
2527 - 2529 |
Characterization of AlN single crystal fabricated by a novel growth technique, "pyrolytic transportation method" Hironaka K, Nagashima T, Ikeda S, Azuma M, Takada K, Fukuyama H |
2530 - 2536 |
Investigation of void formation beneath thin AlN layers by decomposition of sapphire substrates for self-separation of thick AlN layers grown by HVPE Kumagai Y, Enatsu Y, Ishizuki M, Kubota Y, Tajima J, Nagashima T, Murakami H, Takada K, Koukitu A |
2537 - 2541 |
Hydride vapor phase epitaxy of GaN boules using high growth rates Richter E, Zeimer U, Hagedorn S, Wagner M, Brunner F, Weyers M, Trankle G |
2542 - 2550 |
Enhanced growth rates and reduced parasitic deposition by the substitution of Cl-2 for HCl in GaN HVPE Bohnen T, Ashraf H, van Dreumel GWG, Verhagen S, Weyher JL, Hageman PR, Vlieg E |
2551 - 2557 |
GaN single crystals of different habit grown from solution at near atmospheric pressure Feigelson BN, Hite JK, Garces NY, Freitas JA, Tischler JG, Klein PB |
2558 - 2563 |
Characterization of bulk GaN crystals grown from solution at near atmospheric pressure Garces NY, Feigelson BN, Freitas JA, Kim J, Myers-Ward R, Glaser ER |
2564 - 2568 |
Optical probing of low-pressure solution grown GaN crystal properties Freitas JA, Tischler JG, Garces NY, Feigelson BN |
2569 - 2573 |
Possibility of AlN growth using Li-Al-N solvent Kangawa Y, Kakimoto K |
2574 - 2578 |
Ca3N2 as a flux for crystallization of GaN Bockowski M, Grzegory I, Kchahapuridze A, Gierlotka S, Porowski S |
2579 - 2584 |
Thermodynamics of the Al-Ga-N-2 system Belousov A, Karpinski J, Batlogg B |
2585 - 2592 |
AlxGa1-xN bulk crystal growth: Crystallographic properties and p-T phase diagram Belousov A, Katrych S, Hametner K, Gunther D, Karpinski J, Batlogg B |
2593 - 2598 |
The influence of indium on the growth of GaN from solution under high pressure Grzegory I, Bockowski M, Strak P, Krukowski S, Porowski S |
2599 - 2606 |
Extended defects in bulk GaN and III-nitrides grown on this substrate Liliental-Weber Z |
2607 - 2610 |
The K2S2O8-KOH photoetching system for GaN Weyher JL, Tichelaar FD, van Dorp DH, Kelly JJ, Khachapuridze A |
2611 - 2615 |
Revealing extended defects in HVPE-grown GaN Weyher JL, Lucznik B, Grzegory I, Smalc-Koziorowska J, Paskova T |
2616 - 2619 |
Thick homoepitaxial GaN with low carrier concentration for high blocking voltage Freitas JA, Mastro MA, Imhoff EA, Tadjer MJ, Eddy CR, Kub FJ |
2620 - 2623 |
Vacancy defects in bulk ammonothermal GaN crystals Tuomisto F, Maki JM, Zajac M |