Journal of Crystal Growth
Journal of Crystal Growth, Vol.305, No.2 Entire volume, number list
ISSN: 0022-0248 (Print)
In this Issue (19 articles)
303 - 303 |
Proceedings of the 4th International Workshop on Bulk Nitride Semiconductors IV, October 17-22, 2006, Makino, Shiga, Japan - Preface Freitas JA, Hanser D, Koukitu A |
304 - 310 |
Prospects for the ammonothermal growth of large GaN crystal Fukuda T, Ehrentraut D |
311 - 316 |
Seeded growth of GaN by the basic ammonothermal method Hashimoto T, Saito M, Fujito K, Wu F, Speck JS, Nakamura S |
317 - 325 |
Similarities and differences in sublimation growth of SiC and AlN Epelbaum BM, Bickermann M, Nagata S, Heimann P, Filip O, Winnacker A |
326 - 334 |
Study on the kinetics of the formation reaction of GaN from Ga-solutions under ammonia atmosphere Sun G, Meissner E, Berwian P, Muller G, Friedrich J |
335 - 339 |
HVPE growth of AlxGa1-xN ternary alloy using AlCl3 and GaCl Koukitu A, Satoh F, Yamane T, Murakami H, Kumagai Y |
340 - 345 |
Microwave performance and structural characterization of MBE-grown AlGaN/GaN HEMTs on low dislocation density GaN substrates Storm DF, Katzer DS, Roussos JA, Mittereder JA, Bass R, Binari SC, Zhou L, Smith DJ, Hanser D, Preble EA, Evans KR |
346 - 354 |
Role of dislocation-free GaN substrates in the growth of indium containing optoelectronic structures by plasma-assisted MBE Skierbiszewski C, Siekacz M, Perlin P, Feduniewicz-Zmuda A, Cywinski G, Grzegory I, Leszczyniski M, Wasilewski ZR, Porowski S |
355 - 359 |
Improvement of AlN crystalline quality with high epitaxial growth rates by hydride vapor phase epitaxy Nagashima T, Harada M, Yanagi H, Fukuyama H, Kumagai Y, Koukito A, Takada K |
360 - 365 |
Al- and N-polar AlN layers grown on c-plane sapphire substrates by modified flow-modulation MOCVD Takeuchi M, Shimizu H, Kajitani R, Kawasaki K, Kinoshita T, Takada K, Murakami H, Kumagai Y, Koukitu A, Koyama T, Chichibu SF, Aoyagi Y |
366 - 371 |
Polarity dependence of AlN {0001} decomposition in flowing H-2 Kumagai Y, Akiyama K, Togashi R, Murakami H, Takeuchi M, Kinoshita T, Takada K, Aoyagi Y, Koukitu A |
372 - 376 |
Surface preparation of substrates from bulk GaN crystals Hanser D, Tutor M, Preble E, Williams M, Xu XP, Tsvetkov D, Liu LH |
377 - 383 |
Dislocation reduction in GaN crystal by advanced-DEEP Motoki K, Okahisa T, Hirota R, Nakahata S, Uematsu K, Matsumoto N |
384 - 392 |
Orthodox etching of HVPE-grown GaN Weyher JL, Lazar S, Macht L, Liliental-Weber Z, Molnar RJ, Muller S, Sivel VGM, Nowak G, Grzegory I |
393 - 398 |
Residual impurities in GaN substrates and epitaxial layers grown by various techniques Murthy M, Freitas JA, Kim J, Glaser ER, Storm D |
399 - 402 |
III-nitride crystal growth from nitride-salt solution Feigelson BN, Frazier RM, Twigg M |
403 - 407 |
Properties of Fe-doped semi-insulating GaN substrates for high-frequency device fabrication Freitas JA, Tischler JG, Kim JH, Kumagai Y, Koukitu A |
408 - 413 |
Linear optical response of zinc-blende and wurtzite III-N (III = B, Al, Ga, and In) Persson C, da Silva AF |
414 - 420 |
Platelets and needles: Two habits of pressure-grown GaN crystals Bockowski M, Grzegory I, Kamler G, Lucznik B, Krukowski S, Wroblewski M, Kwiatkowski P, Jasik K, Porowski S |