4709 - 4709 |
The 14th International conference on Metalorganic Vapor Phase Epitax ICMOVPE-XIV introduction Mullin B, Irvine S, Scholz F, Ougazzaden A |
4710 - 4711 |
Contributing people to ICMOVPE XIV [Anonymous] |
4712 - 4714 |
Development and characterisation of improved ruthenium dopant sources Rushworth S, Odedra R, Viswanathan P, Dosanjh S, Lealman I |
4715 - 4719 |
Tailor-made precursors for the deposition of Sb-containing materials by the MOCVD process Schuchmann D, Schwartz M, Schulz S, Seemayer A, Wandelt K |
4720 - 4723 |
Vapor pressure of germanium precursors Pangrac J, Fulem M, Hulicius E, Melichar K, Simecek T, Ruzicka K, Moravek P, Ruzicka V, Rushworth SA |
4724 - 4726 |
Novel technique for monitoring of MOVPE processes Volkov PV, Goryunov AV, Daniltsev VM, Luk'yanov AY, Pryakhin DA, Tertyshnik AD, Khrykin OI, Shashkin VI |
4727 - 4730 |
In-situ monitoring of the p- and n-type doping in AlGaInP Krahmer C, Behres A, Schubert M, Streubel K |
4731 - 4735 |
Non-linear surface reaction kinetics in GaAs selective area MOVPE Song HZ, Wang YP, Sugiyama M, Nakano Y, Shimogaki Y |
4736 - 4740 |
Kinetic analysis of surface adsorption layer for InGaAsP-related binary materials using in situ RAS Deura M, Shimogaki Y, Nakano Y, Sugiyama M |
4741 - 4746 |
Micro-Raman for compositions characterization of selective area growth of AlxGayIn1-x-yAs materials by metal-organic vapor-phase epitaxy Hamady SOS, Dupuis N, Decobert J, Ougazzaden A |
4747 - 4750 |
Influence of growth parameters on the sub-bandgap absorption of MOVPE-grown GaN measured using photothermal deflection spectroscopy Lobo N, Kadir A, Laskar MR, Shah AP, Gokhale MR, Rahman AA, Arora BM, Narasimhan KL, Bhattacharya A |
4751 - 4753 |
Ripening of InAs quantum dots on GaAs (001) investigated with in situ scanning tunneling microscopy in metal-organic vapor phase epitaxy Kremzow R, Pristovsek M, Kneissl M |
4754 - 4756 |
In-situ etching of GaAs/AlxGa1-xAs by CBr4 Maassdorf A, Weyers M |
4757 - 4762 |
III-V epitaxy on Si for photonics applications Yonezu H, Furukawa Y, Wakahara A |
4763 - 4767 |
Ways to quantitatively detect antiphase disorder in GaP films grown on Si(001) by transmission electron microscopy Nemeth I, Kunert B, Stolz W, Volz K |
4768 - 4771 |
Effect of Ga content on crystal shape in micro-channel selective-area MOVPE of InGaAs on Si Deura M, Hoshii T, Takenaka M, Takagi S, Nakano Y, Sugiyama M |
4772 - 4775 |
Growth of InAs on Si substrates at low temperatures using metalorganic vapor phase epitaxy Jha S, Song XY, Babcock SE, Kuech TF, Wheeler D, Wu B, Fay P, Seabaugh A |
4776 - 4779 |
Monolithic integration of Ga(NAsP)/(BGa)P multi-quantum well structures on (001) silicon substrate by MOVPE Kunert B, Zinnkann S, Volz K, Stolz W |
4780 - 4785 |
Characterization of high-purity arsine and gallium arsenide epilayers grown by MOCVD Feng J, Clement R, Raynor M |
4786 - 4789 |
Ambience effects in annealing on improvements of optical properties of GaInNAs/GaAs single quantum wells Ishizuka T, Doi H, Shimazu M, Takagishi S, Yaginuma R, Nakayama M |
4790 - 4794 |
Isoelectronic nitrogen delta-doping in GaP and single-photon emission from individual nitrogen pairs Sakuma Y, Ikezawa M, Watanabe M, Masumoto Y |
4795 - 4798 |
Demonstration of planar thick InP layers by selective MOVPE Dupuis N, Decobert J, Lagree PY, Lagay N, Carpentier D, Alexandre F |
4799 - 4802 |
Memory effect of Ge in III-V semiconductors Welser E, Guter W, Wekkeli A, Dimroth F |
4803 - 4807 |
Analysis of germanium epiready wafers for III-V heteroepitaxy Rey-Stolle I, Barrigon E, Galiana B, Algora C |
4808 - 4812 |
In situ passivation of GaAs surface with aluminum oxide with MOVPE Terada Y, Deura M, Shimogaki Y, Sugiyama M, Nakano Y |
4813 - 4817 |
Optically in-situ monitored growth of carbon doped InAlAs by LP-MOVPE using CBr4 Decobert J, Lagay N, Thevenard B |
4818 - 4820 |
Increased single-photon emission from InP/AlGaInP quantum dots grown on AlGaAs distributed Bragg reflectors Rossbach R, Schulz WM, Reischle M, Beirne GJ, Jetter M, Michler R |
4821 - 4825 |
InxGa1-xAs/InP selective area metal-organic vapor phase epitaxy for non-magnetic semiconductor spintronics Akabori M, Guzenko VA, Schapers T, Hardtdegen H |
4826 - 4830 |
MOVPE growth of antimonide-containing alloy materials for long wavelength applications Kuech TF, Khandekar AA, Rathi M, Mawst LJ, Huang JYT, Song XY, Babcock SE, Meyer JR, Vurgaftman I |
4831 - 4834 |
Characterization of GaSb thin films from tailor-made single-source precursors Seemayer A, Hommes A, Humann S, Schulz S, Wandelt K |
4835 - 4838 |
Growth of various antimony-containing alloys by MOVPE Grasse C, Meyer R, Breuer U, Bohm G, Amann MC |
4839 - 4842 |
MOVPE growth of Ga(As)SbN on GaSb substrates Huang JYT, Mawst LJ, Jha S, Kuech TF, Wang D, Shterengas L, Belenky G, Meyer JR, Vurgaftman I |
4843 - 4845 |
Dislocation reduction of GaSb on GaAs by metalorganic chemical vapor deposition with epitaxial lateral overgrowth Zaima K, Hashimoto R, Ezaki M, Nishioka M, Arakawa Y |
4846 - 4849 |
Type II GaAsxSb1-x/InAs (x < 0.35) heterojunction grown by MOVPE near a miscibility gap of the ternary solid solution Moiseev KD, Romanov VV, Voronina TI, Lagunova TS, Mikhailova MP, Yakovlev YP |
4850 - 4853 |
Temperature effect on the growth of strained GaAs1-ySby/GaAs (y > 0.4) quantum wells by MOVPE Su YK, Wan CT, Chuang RW, Huang CY, Chen WC, Wang YS, Yu HC |
4854 - 4857 |
Improving photoluminescence of highly strained 1.32 mu m GaAsSb/GaAs multiple quantum wells grown on misorientation substrate Wan CT, Su YK, Chuang RW, Huang CY, Wang YS, Chen WC, Yu HC |
4858 - 4861 |
Growth of InAsSb/InPSb heterojunctions for mid-IR detector applications Pitts OJ, Lackner D, Cherng YT, Watkins SP |
4862 - 4866 |
Hydrogen effects in III-nitride MOVPE Yakovlev EV, Talalaev RA, Segal AS, Lobanova A, Lundin WV, Zavarin EE, Sinitsyn MA, Tsatsulnikov AF, Nikolaev AE |
4867 - 4870 |
Process optimization for the effective reduction of threading dislocations in MOVPE grown GaN using in situ deposited SiNx masks Hertkorn J, Lipski F, Bruckner R, Wunderer T, Thapa SB, Scholz F, Chuvilin A, Kaiser U, Beer M, Zweck J |
4871 - 4875 |
High-reflectivity ultraviolet AlN/AlGaN distributed Bragg reflectors grown by metalorganic chemical vapor deposition Chen JR, Ling SC, Hung CT, Ko TS, Lu TC, Kuo HC, Wang SC |
4876 - 4879 |
The influence of substrate surface preparation on LP MOVPE GaN epitaxy on differently oriented 4H-SiC substrates Caban P, Kosciewicz K, Strupinski W, Wojcik M, Gaca J, Szmidt J, Ozturk M, Ozbay E |
4880 - 4884 |
Modulated precursor flow epitaxial growth of ternary AlGaN by metalorganic chemical vapor deposition Kim HJ, Choi S, Yoo D, Ryou JH, Dupuis RD |
4885 - 4887 |
Growth of crack-free AlGaN on selective-area-growth GaN Miyake H, Masuda N, Ogawahara Y, Narukawa M, Hiramatsu K, Ezaki T, Kuwano N |
4888 - 4890 |
Growth and characterization of unintentionally doped GaN grown on silicon(111) substrates Leys M, Cheng K, Derluyn J, Degroote S, Germain M, Borghs G, Taylor CA, Dawson P |
4891 - 4895 |
Properties of MOVPE GaN grown on ZnO deposited on Si(001) and Si(111) substrates Paszkiewicz R, Paszkiewicz B, Wosko M, Szyszka A, Marciniak L, Prazmowska J, Macherzynski W, Serafinczuk J, Kozlowski J, Tlaczala M, Kovac J, Novotny I, Skriniarova J, Hasko D |
4896 - 4899 |
Comparison of electrical properties in GaN grown on Si(111) and c-sapphire substrate by MOVPE Ito T, Nomura Y, Selvaraj SL, Egawa T |
4900 - 4903 |
MOCVD growth of GaN on porous silicon substrates Ishikawa H, Shimanaka K, Tokura F, Hayashi Y, Hara Y, Nakanishi M |
4904 - 4907 |
MOVPE growth of AlGaN/GaN superlattices on ZnO substrates for green emitter applications Yu HB, Wang SJ, Li NL, Fenwick W, Melton A, Klein B, Ferguson I |
4908 - 4912 |
Effect of an Al2O3 transition layer on InGaN on ZnO substrates by organometallic vapor-phase epitaxy Li NL, Wang SJ, Huang CL, Feng ZC, Valencia A, Nause J, Summers C, Ferguson I |
4913 - 4915 |
The critical thickness of InGaN on (0001)GaN Leyer M, Stellmach J, Meissner C, Pristovsek M, Kneissl M |
4916 - 4919 |
Emission and microstructural behaviors in the InGaN/GaN MQWs with the p-GaN layers grown at different growth temperatures Kong BH, Han WS, Cho HK, Kim MY, Choi RJ, Kim BK |
4920 - 4922 |
Control of stress and crystalline quality in GaInN films used for green emitters Iwaya M, Miura A, Senda R, Nagai T, Kawashima T, Iida D, Kamiyama S, Amano H, Akasaki I |
4923 - 4926 |
Strain compensated AlGaN/GaN-Bragg-reflectors with high Al content grown by MOVPE Dartsch H, Figge S, Aschenbrenner T, Pretorius A, Rosenauer A, Hommel D |
4927 - 4931 |
AlGaN/AlN multiple quantum wells grown by MOVPE on AlN templates using nitrogen as a carrier gas Gautier S, Aggerstam T, Pinos A, Marcinkevicius S, Liu K, Shur M, O'Malley SM, Sirenko AA, Djebbour Z, Migan-Dubois A, Moudakir T, OLIgazzaden A |
4932 - 4934 |
Effect of the AIN nucleation layer growth on AlN material quality Reentila O, Brunner F, Knauer A, Mogilatenko A, Neumann W, Protzmann H, Heuken M, Kneissl M, Weyers M, Traaenkle G |
4935 - 4938 |
Growth conditions and surface morphology of AlN MOVPE Lobanova AV, Yakovlev EV, Talalaev RA, Thapa SB, Scholz F |
4939 - 4941 |
Growth and studies of Si-doped AlN layers Thapa SB, Hertkorn J, Scholz F, Prinz GM, Leute RAR, Feneberg M, Thonke K, Sauer R, Klein O, Biskupek J, Kaiser U |
4942 - 4946 |
Microstructure of InN epilayers deposited in a close-coupled showerhead reactor Ganguli T, Kadir A, Gokhale M, Kumar R, Shah AP, Arora BM, Bhattacharya A |
4947 - 4953 |
Influence of growth temperature and V/III ratio on the optical characteristics of narrow band gap (0.77 eV) InN grown on GaN/sapphire using pulsed MOVPE Jamil M, Zhao HP, Higgins JB, Tansu N |
4954 - 4958 |
Improvements in the crystalline quality of MOVPE-InN layers by facet controlling with hydrogen partial pressure Murakami H, Cho HC, Kumagai Y, Koukitu A |
4959 - 4962 |
Indium nitride quantum dot growth modes in metalorganic vapour phase epitaxy Meissner C, Ploch S, Leyer M, Pristovsek M, Kneissl M |
4963 - 4967 |
Metal-organic molecular beam epitaxy growth of InN films on highly orientated TCO/Si(100) substrates Kuo SY, Chen WC, Hsiao CN, Lai FI |
4968 - 4971 |
Effects of off-axis GaN substrates on optical properties of m-plane InGaN/GaN light-emitting diodes Yamada H, Iso K, Masui H, Saito M, Fujito K, DenBaars SP, Nakamura S |
4972 - 4975 |
Characteristics of a-plane GaN with the SiNx insertion layer grown by metal-organic chemical vapor deposition Ko TS, Wang TC, Huang HM, Chen JR, Chen HG, Chu CP, Lu TC, Kuo HC, Wang SC |
4976 - 4978 |
Growth and investigation of m-plane (In)GaN buffer layers on LiAlO2 substrates Mauder C, Khoshroo LR, Behmenburg H, Wen TC, Dikme Y, Rzheutskii MV, Yablonskii GP, Woitok J, Chou MMC, Heuken M, Kalisch H, Jansen RH |
4979 - 4982 |
Reactor-pressure dependence of growth of a-plane GaN on r-plane sapphire by MOVPE Miyagawa R, Narukawa M, Ma B, Miyake H, Hiramatsu K |
4983 - 4986 |
Properties of non-polar a-plane GaN/AlGaN quantum wells Kappers MJ, Hollander JL, Johnston CF, McAleese C, Rao DVS, Sanchez AM, Humphreys CJ, Badcock TJ, Dawson P |
4987 - 4991 |
Growth of InxGa1-xN/GaN QW structures with high indium concentration on c-plane and m-plane surfaces by MOVPE Jonen H, Rossow U, Langer T, Drager A, Hoffmann L, Bremers H, Hangleiter A, Bertram F, Metzner S, Christen J |
4992 - 4995 |
Photoluminescence and structural analysis of a-plane InGaN layers Aschenbrenner T, Figge S, Schowalter M, Rosenauer A, Hommel D |
4996 - 4998 |
Control of p-type conduction in a-plane Ga1-xInxN (0 < x < 0.10) grown on r-plane sapphire substrate by metalorganic vapor-phase epitaxy Iida D, Iwaya M, Kamiyama S, Amano H, Akasaki I |
4999 - 5002 |
Growth of non-polar (1 1 (2)over-bar 0)GaN on a patterned (110)Si substrate by selective MOVPE Tanikawa T, Rudolph D, Hikosaka T, Honda Y, Yamaguchi M, Sawaki N |
5003 - 5006 |
Growth of Ga-doped ZnO by MOVPE using diisopropylzinc and tertiary butanol Nishimoto N, Yamamae T, Kaku T, Matsuo Y, Senthilkumar K, Senthilkumar O, Okamoto J, Yamada Y, Kubo S, Fujita Y |
5007 - 5010 |
Step-flow growth of homoepitaxial ZnO thin films by ultrasonic spray-assisted MOVPE Nishinaka H, Fujita S |
5011 - 5015 |
Effects of N doping on ZnO thin films grown by MOVPE Zaidi T, Fenwick WE, Melton A, Li N, Gupta S, Yu HB, Ougazzaden A, Ferguson I |
5016 - 5019 |
Enhancement of electron mobility in ZnO layers with applying ultrasonic spray-assisted MOVPE and buffer layers Kamada Y, Nishinaka H, Kameyama N, Fujita S |
5020 - 5024 |
Structural and optical properties of polar and non-polar ZnO films grown by MOVPE Zhu JJ, Aaltonen T, Venkatachalapathy V, Galeckas A, Kuznetsov AY |
5025 - 5027 |
Growth and characterization of GaN:Mn layers by MOVPE Sofer Z, Sedmidubsky D, Stejskal J, Hejtmanek J, Marygsko M, Jurek K, Vaclavu M, Havranek V, Mackova A |
5028 - 5031 |
Growth and characterization of manganese-doped InAsP Pristovsek M, Meissner C, Kneissl M, Jakomin R, Vantaggio S, Tarricone L |
5032 - 5038 |
MOVPE growth of transition-metal-doped GaN and ZnO for spintronic applications Gupta S, Fenwick WE, Melton A, Zaidi T, Yu H, Rengarajan V, Nause J, Ougazzaden A, Ferguson IT |
5039 - 5043 |
Highly spin-polarized electron photocathode based on GaAs-GaAsP superlattice grown on mosaic-structured buffer layer Jin XG, Maeda Y, Saka T, Tanioku M, Fuchi S, Ujihara T, Takeda Y, Yamamoto N, Nakagawa Y, Mano A, Umi S, Yamamoto M, Nakanishi T, Horinaka H, Kato T, Yasue T, Koshikawa T |
5044 - 5047 |
Hexagonal BN epitaxial growth on (0001) sapphire substrate by MOVPE Kobayashi Y, Akasaka T |
5048 - 5052 |
Hexagonal boron nitride grown by MOVPE Kobayashi Y, Akasaka T, Makimoto T |
5053 - 5057 |
Growth study of GexSbyTez deposited by MOCVD under nitrogen for non-volatile memory applications Longo M, Salicio O, Wiemer C, Fallica R, Molle A, Fanciulli M, Giesen C, Seitzinger B, Baumann PK, Heuken M, Rushworth S |
5058 - 5062 |
Effect of boron incorporation on growth behavior of BGaN/GaN by MOVPE Orsal G, Maloufi N, Gautier S, Alnot M, Sirenko AA, Bouchaour M, Ougazzaden A |
5063 - 5065 |
Computational intelligence applied to the growth of quantum dots Singulani AP, Vilela OP, Pacheco MCA, Vellasco MBR, Pires MR, Souza PL |
5066 - 5068 |
Suppression of the wavelength blue shift during overgrowth of InGaAs-based quantum dots Strittmatter A, Germann TD, Kettler T, Posilovic K, Pohl J, Pohl UW, Bimberg D |
5069 - 5072 |
InAs/InP QDs with GaxIn1-xAs cap layer by a double-cap procedure using MOVPE selective area growth Akaishi M, Okawa T, Saito Y, Shimomura K |
5073 - 5076 |
Wideband wavelength electroluminescence from InAs/InP QDs using double-cap procedure by MOVPE selective area growth Saito Y, Okawa T, Akaishi M, Shimomura K |
5077 - 5080 |
InAs island-to-ring transformation by a partial capping layer Aierken A, Hakkarainen T, Riikonen J, Sopanen M |
5081 - 5084 |
Influence of capping layer on the properties of MOVPE-grown InAs/GaAs quantum dots Hospodkova A, Pangrac J, Oswald J, Hulicius E, Kuldova K, Vyskocil J, Melichar K, Simecek T |
5085 - 5088 |
High-density InAs quantum dots on GaNAs buffer layer Suzuki R, Miyamoto T, Sengoku T, Koyama F |
5089 - 5092 |
Growth of red InP/GaInP quantum dots on a low density InAs/GaAs island seed layer by MOVPE Rossbach R, Schulz WM, Reischle M, Beirne GJ, Hermannstadter C, Jetter M, Michler R |
5093 - 5097 |
Selective-area growth of GaAs and InAs nanowires-homo- and heteroepitaxy using SiNx templates Paetzelt H, Gottschalch V, Bauer J, Benndorf G, Wagner G |
5098 - 5101 |
Red to orange electroluminescence from InP/AlGaInP quantum dots at room temperature Rossbach R, Schulz WM, Eichfelder M, Reischle M, Beirne GJ, Jetter M, Michler P |
5102 - 5105 |
Effects of growth conditions on the crystal structure of gold-seeded GaP nanowires Johansson J, Karlsson LS, Dick KA, Bolinsson J, Wacaser BA, Deppert K, Samuelson L |
5106 - 5110 |
VLS growth of GaAs/(InGa)As/GaAs axial double-heterostructure nanowires by MOVPE Bauer J, Gottschalch V, Paetzelt H, Wagner G |
5111 - 5113 |
SA-MOVPE of InGaAs nanowires and their compositions studied by micro-PL measurement Sato T, Kobayashi Y, Motohisa J, Hara S, Fukui T |
5114 - 5118 |
Luminescence of GaAs/AlGaAs core-shell nanowires grown by MOVPE using tertiarybutylarsine Prete P, Marzo F, Paiano P, Lovergine N, Salviati G, Lazzarini L, Sekiguchi T |
5119 - 5122 |
Characterization of GaSb nanowires grown by MOVPE Jeppsson M, Dick KA, Nilsson HA, Skold N, Wagner JB, Caroff P, Wernersson LE |
5123 - 5128 |
VLS growth of GaN nanowires on various substrates Gottschalch V, Wagner G, Bauer J, Paetzelt H, Shirnow M |
5129 - 5133 |
Catalyst-free growth and characterization of gallium nitride nanorods Kuo SY, Lai FI, Chen WC, Hsiao CN |
5134 - 5138 |
Growth and characterization of ZnO nanostructures on sapphire substrates Mergenthaler K, Gottschalch V, Bauer J, Paetzelt H, Wagner G |
5139 - 5142 |
MOVPE growth of GaN around ZnO nanopillars Thapa SB, Hertkorn J, Wunderer T, Lipski F, Scholz F, Reiser A, Xie Y, Feneberg M, Thonke K, Sauer R, Durrschnabel M, Yao LD, Gerthsen D, Hochmuth H, Lorenz M, Grundmann M |
5143 - 5146 |
Temperature and current dependences of electroluminescence from InGaN/GaN multiple quantum wells Lee JC, Wu YF, Wang YP, Nee TE |
5147 - 5150 |
Doping control and evaluation of pn-junction LED in GaPN grown by OMVPE Hatakenaka S, Nakanishi Y, Wakahara A, Furukawa Y, Kada H |
5151 - 5153 |
Formation of textured sapphire substrates by self-arrangement process and wet etching for InGaAlN LEDs Sakharov AV, Lundin WV, Zavarin EE, Sinitsyn MA, Nikolaev AE, Lundina EY, Tsatsulnikov AF |
5154 - 5157 |
Enhanced electroluminescence in 405 nm InGaN/GaN LEDs by optimized electron blocking layer Svensk O, Torma PT, Suihkonen S, Ali M, Lipsanen H, Sopanen M, Odnoblyudov MA, Bougrov VE |
5158 - 5161 |
Carrier injection efficiency in nitride LEDs Lee DS, Byrnes D, Parekh A, Ting S, Quinn W |
5162 - 5165 |
Effect of InGaN underneath layer on MOVPE-grown InGaN/GaN blue LEDs Torma PT, Svensk O, Ali M, Suihkonen S, Sopanen M, Odnoblyudov MA, Bougrov VE |
5166 - 5169 |
Surface morphology control of green LEDs with p-InGaN layers grown by metalorganic chemical vapor deposition Liu JP, Ryou JH, Lochner Z, Limb J, Yoo DW, Dupuis RD, Wu ZH, Fischer AM, Ponce FA |
5170 - 5174 |
Efficiency enhancement of UV/blue light emitting diodes via nanoscaled epitaxial lateral overgrowth of GaN on a SiO2 nanorod-array patterned sapphire substrate Chiu CH, Li ZY, Chao CL, Lo MH, Kuo HC, Yu PC, Lu TC, Wang SC, Lau KM, Cheng SJ |
5175 - 5177 |
Growth parameter optimization of the GaInP/AlGaInP active zone of 635 nm red laser diodes Kaspari C, Zorn M, Weyers M, Erbert G |
5178 - 5181 |
1150-nm wavelength InGaAs/GaAs VCSELs incorporating regrown tunnel junctions Mereuta A, Iakovlev V, Caliman A, Mutter L, Sirbu A, Kapon E |
5182 - 5186 |
Quantum-dot semiconductor disk lasers Germann TD, Strittmatter A, Pohl UW, Bimberg D, Rautiainen J, Guina M, Okhotnikov OG |
5187 - 5190 |
Semiconductor components for femtosecond semiconductor disk lasers grown by MOVPE Zorn M, Klopp R, Saas F, Ginolas A, Kruger O, Griebner U, Weyers M |
5191 - 5197 |
OMVPE growth of highly strain-balanced GaInAs/AlInAs/InP for quantum cascade lasers Wang CA, Huang RK, Goyal A, Donnelly JR, Calawa DR, Cann SG, O'Donnell F, Plant JJ, Missaggia LJ, Turner GW, Sanchez-Rubio A |
5198 - 5203 |
MOCVD of thin film photovoltaic solar cells-Next-generation production technology? Irvine SJC, Barrioz V, Lamb D, Jones EW, Rowlands-Jones RL |
5204 - 5208 |
Very high efficiency triple junction solar cells grown by MOVPE Stan M, Aiken D, Cho B, Cornfeld A, Diaz J, Ley V, Korostyshevsky A, Patel P, Sharps P, Varghese T |
5209 - 5213 |
Influence of GaInP ordering on the electronic quality of concentrator solar cells Garcia I, Rey-Stolle I, Algora C, Stolz W, Volz K |
5214 - 5216 |
Excitonic absorption in GaN layers of GaN-based UV Schottky-type light-emitting diodes grown by metal-organic vapor phase epitaxy Komiyama S, Noguchi K, Suzuki S, Honda T |
5217 - 5222 |
Growth and fabrication of high-performance GaN-based ultraviolet avalanche photodiodes Dupuis RD, Ryou JH, Shen SC, Yoder PD, Zhang Y, Kim HJ, Choi S, Lochner Z |
5223 - 5226 |
Hydrogen-related defects in InGaP/GaAs heterojunction bipolar transistors Yamada H, Fukuhara N, Hata M, Akimoto K |
5227 - 5231 |
AlGaAs/GaAs heterojunction phototransistor with a double delta-doped base grown by AP MOVPE Sciana B, Zborowska-Lindert I, Radziewicz D, Boratynski B, Tlaczala M, Kovac J, Srnanek R, Skriniarova J, Florovic M |
5232 - 5236 |
GaAlN/GaN HEMT heterostructures grown on SiCopSiC composite substrates for HEMT application Poisson MADF, Magis M, Tordjman M, Di Persio J, Langer R, Toth L, Pecz B, Guziewicz M, Thorpe J, Aubry R, Morvan E, Sarazin N, Gaquiere C, Meneghesso G, Hoel V, Jacquet JC, Delage S |