1 - 6 |
Comparative study of different wavelengths from IR to UV applied to clean sandstone Klein S, Stratoudaki T, Marakis Y, Zafiropulos V, Dickmann K |
7 - 13 |
Surface analytical study of the corrosion behaviour of chromate passivated Al 2014 A T-6 during salt fog exposure Treacy GM, Wilcox GD |
14 - 22 |
X-ray photoelectron spectroscopy study on the composition and structure of BaTiO3 thin films deposited on silicon Nasser SA |
23 - 28 |
Effect of sputtering gas on the surface composition of an Al-Pd-Mn quasicrystal Jenks CJ, Burnett JW, Delaney DW, Lograsso TA, Thiel PA |
29 - 34 |
Resistivity and thermal stability of nickel mono-silicide Poon MC, Deng F, Chan M, Chan WY, Lau SS |
35 - 38 |
Synchrotron radiation photoelectron spectroscopy study of ITO surface Lai B, Ding XM, Yuan ZL, Zhou X, Liao LS, Zhang SK, Yuan S, Hou XY, Lu ED, Xu PS, Zhang XY |
39 - 46 |
A comparison of preparation methods of copper surfaces for in situ scanning force microscopy investigations Wadsak M, Schreiner M, Aastrup T, Leygraf C |
47 - 51 |
Influence of oxygen partial pressure on transparency and conductivity of RF sputtered Al-doped ZnO thin films Tsuji T, Hirohashi M |
52 - 60 |
Structural and chemical investigation of surface and interface of multilayer optical coatings deposited by DIBS Alvisi M, Mirenghi L, Tapfer L, Rizzo A, Ferrara MC, Scaglione S, Vasanelli L |
61 - 66 |
Distribution of luminescent centers in electroluminescent SrS : Ce films prepared by post-annealing in H2S Morishita T, Matsuyama H, Matsui M, Tonomura S, Wakihara M |
67 - 73 |
Influence of beam incidence angle on dry laser cleaning of surface particles Vereecke G, Rohr E, Heyns MM |
74 - 80 |
The effects of multiple KrF laser irradiations on the electroluminescence and photoluminescence of rf-sputtered ZnS : Mn-based electroluminescent thin film devices Mastio EA, Thomas CB, Cranton WM, Fogarassy E |
81 - 84 |
Influence of pH on structure and photochromic behavior of nanocrystalline WO3 films Xu N, Sun M, Cao YW, Yao JN, Wang EG |
85 - 91 |
Modifications of polypropylene surface properties by alpha ionizing radiation Brun C, Chambaudet A, Mavon C, Berger F, Fromm M, Jaffiol F |
92 - 100 |
Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H-2 process III. Reaction barriers Martensson P, Larsson K, Carlsson JO |