1 - 10 |
Effect of composition on the electrical and structural properties of As-Te-Ga thin films Dongol M, Hafiz MM, Abou-Zied M, Elhady AF |
11 - 26 |
Determination of lattice site locations of erbium ions implanted into LiNbO3 single crystals after annealing at moderate and high temperature Mignotte C |
27 - 33 |
Dry etch chemistries for TiO2 thin films Norasetthekul S, Park PY, Baik KH, Lee KP, Shin JH, Jeong BS, Shishodia V, Lambers ES, Norton DP, Pearton SJ |
34 - 43 |
Characterization and tribological investigation of SiO2 and La2O3 sol-gel films Zhang WG, Liu WM, Wang CT |
44 - 46 |
Reply from authors to the comments raised by Rosei and Fontana on the paper "Surface morphology and electronic structure of Ge/Si (111) 7 x 7 system" [Appl. Surf. Sci. 173 (2001) 270] Lobo A, Gokhale S, Kulkarni SK |
47 - 51 |
In situ RHEED monitor of the growth of epitaxial anatase TiO2 thin films Ong CK, Wang SJ |
52 - 59 |
Wet and dry etching of Sc2O3 Park PY, Norasetthekul S, Lee KP, Baik KH, Gila BP, Shin JH, Abernathy CR, Ren F, Lambers ES, Pearton SJ |
60 - 65 |
Evolution of Fe-rich precipitates in Fe implanted Ge(110) surfaces as observed by scanning Auger microscopy Venugopal R, Sundaravel B, Wilson IH |
66 - 71 |
Adsorption kinetics of the Cs-O activation layer on GaAs (100) Kamaratos M |
72 - 78 |
Characterization of K2CO3/Co-MoS2 catalyst by XRD, XPS, SEM, and EDS Iranmahboob J, Hill DO, Toghiani H |
79 - 83 |
Scaling behavior of polished (110) single-crystal nickel surfaces Saitou M, Hokama M, Oshikawa W |
84 - 91 |
Effects of surface roughness on surface analysis via soft and ultrasoft X-ray fluorescence spectroscopy Kuhn WK, Andermann G |
92 - 98 |
Spatial alignment evolution of self-assembled In0.4Ga0.6As island arrays grown on GaAs (311)B surface by atomic hydrogen-assisted molecular beam epitaxy Xu HZ, Akahane K, Song HZ, Okada Y, Kawabe M |
99 - 107 |
Fractal geometry and mercury porosimetry - Comparison and application of proposed models on building stones Bernal JLP, Bello MA |
108 - 113 |
Method of porous diamond deposition on porous silicon Baranauskas V, Peterlevitz AC, Chang DC, Durrant SF |
114 - 122 |
In situ diagnosis of pulsed UV laser surface ablation of tungsten carbide hardmetal by using laser-induced optical emission spectroscopy Li TJ, Lou QH, Wei YR, Huang F, Dong JX, Liu JR |
123 - 133 |
Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique Martin N, Banakh O, Santo AME, Springer S, Sanjines R, Takadoum J, Levy F |
134 - 139 |
Stress and morphological development of US and ZnS thin films during the SILAR growth on (100)GaAs Laukaitis G, Lindroos S, Tamulevicius S, Leskela M |
140 - 146 |
Annihilation kinetics of defects induced by phosphorus ion implantation in silicon Hadjersi T |