Applied Surface Science

Applied Surface Science, Vol.178, No.1-4 Entire volume, number list

ISSN: 0169-4332 (Print)

In this Issue (23 articles)

1 - 6	Vibrational spectroscopy of cinnamaldehyde on graphite and supported Pd islands Grimaud CM, Radosavkic D, Ustaze S, Palmer RE
7 - 26	Anisotropic wet chemical etching of crystalline silicon: atomistic Monte-Carlo simulations and experiments Gosalvez MA, Nieminen RM, Kilpinen P, Haimi E, Lindroos V
27 - 36	Investigation of fine atmospheric particle surfaces and lung lining fluid interactions using XPS Kendall M, Hutton BM, Tetley TD, Nieuwenhuijsen MJ, Wigzell E, Jones FH
37 - 43	Angular distributions of C-2 and CN formed by laser ablation of graphite in a nitrogen atmosphere Park SM, Lee KH
44 - 49	The dependence of the etching property of CoSi2 films in diluted HF solutions on the formation conditions Zhu SY, Ru GP, Detavernier C, Van Meirhaeghe RL, Cardon E, Li BZ
50 - 55	Hydrogen adsorption in bundles of well-aligned carbon nano tubes at room temperature Zhu HW, Cao AY, Li XS, Xu CL, Mao ZQ, Ruan DB, Liang J, Wu DH
56 - 62	Mechanical properties of thin films measured by nanoindenters Ishikawa H, Fudetani S, Hirohashi M
63 - 74	Surface reaction kinetics of Ga1-xInxP growth during pulsed chemical beam epitaxy Dietz N, Beeler SC, Schmidt JW, Tran HT
75 - 82	Study of inter-diffusion and defect evolution in thin film Al/Ge bilayers using SIMS and positron beam Raghavan G, Rao GV, Amarendra G, Tyagi AK, Viswanathan B
83 - 92	Optical spectroscopy of Mg by Kr+ ion sputtering in presence of O-2 Karmakar P, Agarwal P, Ghose D
93 - 97	Laser-assisted selective deposition of nickel patterns on porous silicon substrates Kordas K, Remes J, Leppavuori S, Nanai L
98 - 104	An oxygen free 6061 aluminum alloy surface produced by ammonia dc plasma and sputtering processes Wang PW, Sui SX, Durrer WG
105 - 115	Chemical mapping of elemental sulfur on pyrite and arsenopyrite surfaces using near-infrared Raman imaging microscopy McGuire MM, Jallad KN, Ben-Amotz D, Hamers RJ
116 - 126	Effects of additives and chelating agents on electroless copper plating Lin YM, Yen SC
127 - 133	Silicon cluster formation by molecular ion irradiation - Relationship between irradiated ion species and cluster yield Yamamato H, Saito T, Asaoka H
134 - 139	Twist-bonded compliant substrates for III-V semiconductors heteroepitaxy Patriarche G, Le Bourhis E
140 - 148	XPS characterization of the interface between low dielectric constant amorphous fluoropolymer film and evaporation-deposited aluminum Ding SJ, Zhang QQ, Zhang DW, Wang JT, Zhou YD, Lee WW
149 - 155	Nanosized metal catalysts in electrodes for solid polymeric electrolyte fuel cells: an XPS and XRD study Giorgi R, Ascarelli P, Turtu S, Contini V
156 - 164	Chemical state of segregants at Al2O3/alloy interfaces studied using mu XPS Hou PY, Ackerman GD
165 - 177	Electroless deposition of copper and nickel on poly(tetrafluoroethylene) films modified by single and double surface graft copolymerization Yang GH, Kang ET, Neoh KG
178 - 189	Modeling of electrocrystallization for pulse current electroforming of nickel Wong KP, Chan KC, Yue TM
190 - 193	Manufacturing of porous silicon; porosity and thickness dependence on electrolyte composition Kordas K, Remes J, Beke S, Hu T, Leppavuori S
194 - 200	High temperature chemical vapor deposition of silicon on Fe(100) Rebhan M, Meier R, Plagge A, Rohwerder M, Stratmann M