Applied Surface Science

Applied Surface Science, Vol.192, No.1-4 Entire volume, number list

ISSN: 0169-4332 (Print)

In this Issue (18 articles)

1 - 25	Kinetic phenomena in electron transport in radio-frequency fields Petrovic ZL, Raspopovic ZM, Dujko S, Makabe T
26 - 49	Development of swarm transport theory in radio-frequency electric and crossed electric and magnetic fields White RD, Ness KF, Robson RE
50 - 71	Temporal and spatial relaxation of electrons in low temperature plasmas Winkler R, Loffhagen D, Sigeneger F
72 - 87	Surface chemistry associated with plasma etching processes Graves DB, Humbird D
88 - 114	Development of optical computerized tomography in capacitively coupled plasmas and inductively coupled plasmas for plasma etching Makabe T, Petrovic ZL
IX - IX	This special issue resulted from the International Workshop on Basis of Low Temperature Plasma Applications which was held at Hakone in Japan on July 24-25, 2001 - Preface Makabe T
115 - 134	Negative ions in processing plasmas and their effect on the plasma structure Kono A
135 - 160	Measurement techniques of radicals, their gas phase and surface reactions in reactive plasma processing Hori M, Goto T
161 - 175	Spatially resolved CF, CF2, SiF and SiF2 densities in fluorocarbon containing inductively driven discharges Hebner GA
176 - 200	Vertically integrated computer-aided design for device processing Makabe T, Maeshige K
201 - 215	Application and simulation of low temperature plasma processes in semiconductor manufacturing Ventzek PLG, Rauf S, Stout PJ, Zhang D, Dauksher W, Hall E
216 - 243	Development of high-density plasma reactor for high-performance processing and future prospects Samukawa S
244 - 257	Recent progress in the understanding of electron kinetics in low-pressure inductive plasmas Kortshagen U, Maresca A, Orlov K, Heil B
258 - 269	Modeling of magnetron sputtering plasmas Shon CH, Lee JK
270 - 298	Dielectric film etching in semiconductor device manufacturing -Development of SiO2 etching and the next generation plasma reactor Sekine M
299 - 308	Efficiency of AC plasma display panels from diagnostics and models Ganter R, Callegari T, Pitchford LC, Boeuf JP
309 - 326	Electron interactions with plasma processing gases: present status and future needs Christophorou LG, Olthoff JK
327 - 338	Database in low temperature plasma modeling Sakai Y