153 - 157 |
Formation of high quality gallium nitride thin films on Ga-diffused Si(111) substrate Xue CS, Yang L, Wang CM, Zhuang HZ, Wei QQ |
158 - 164 |
Local surface cleaning and cluster assembly using contact mode atomic force microscopy Yang DQ, Sacher E |
165 - 170 |
Temperature effect on the Cu2O oxide morphology created by oxidation of Cu(001) as investigated by in situ UHV TEM Zhou GW, Yang JC |
171 - 176 |
Enhancement of organic nanoparticle preparation by laser ablation in aqueous solution using surfactants Li B, Kawakami T, Hiramatsu M |
177 - 182 |
Formation of p-type ZnO film on InP substrate by phosphor doping Bang KH, Hwang DK, Park MC, Ko YD, Yun I, Myoung JM |
183 - 189 |
Comparison of the electroluminescence and its related properties of two cyclopentadiene derivatives Gao XC, Cao H, Huang L, Huang YY, Zhang BW, Huang CH |
190 - 205 |
Localized corrosion effects and modifications of acidic and alkaline slurries on copper chemical mechanical polishing Tsai TH, Yen SC |
206 - 221 |
Surface chemistry and microstructural analysis of CexZr1-xO2-y model catalyst surfaces Nelson AE, Schulz KH |
222 - 230 |
XPS, FTIR and TPR characterization of Ru/Al2O3 catalysts Mazzieri V, Coloma-Pascual F, Arcoya A, L'Argentiere P, Figoli NS |
231 - 239 |
Properties including step coverage of TiN thin films prepared by atomic layer deposition Kim J, Hong H, Oh K, Lee C |
240 - 248 |
Formation of luminescent (NH4)(2)SiF6 phase from vapour etching-based porous silicon Saadoun M, Bessais B, Mliki N, Ferid M, Ezzaouia H, Bennaceur R |
249 - 254 |
Electrical characterization of low temperature deposited TiO2 films on strained-SiGe layers Dalapati GK, Chatterjee S, Samanta SK, Maiti CK |
255 - 261 |
Increased surface roughness by oxygen plasma treatment of graphite/polymer composite Cvelbar U, Pejovnik S, Mozetie M, Zalar A |
262 - 273 |
Comparison of nanosecond laser ablation at 1064 and 308 nm wavelength Torrisi L, Gammino S, Ando L, Nassisi V, Doria D, Pedone A |
274 - 285 |
Surface modification and oxidation kinetics of hot-pressed AlN-SiC-MOSi2 electroconductive ceramic composite Krnel K, Sciti D, Landi E, Bellosi A |
286 - 292 |
Study of adsorption of oxygen on beta-Al2O3+Au and beta-Al2O3+Pt - Work function measurements - proposition of a model Guillet N, Rives A, Lalauze R, Pijolat C |
293 - 300 |
The investigation of carbon nitride films annealed at different temperatures Zhou ZM, Xia LF, Sun MR |
301 - 306 |
Crystalline silicon films sputtered on molybdenum - A study of the silicon-molybdenum interface Reinig P, Fenske F, Fuhs W, Schopke A, Selle B |
307 - 317 |
Picosecond and femtosecond pulsed laser ablation and deposition of quasicrystals Teghil R, D'Alessio L, Santagata A, Zaccagnino M, Ferro D, Sordelet DJ |
318 - 328 |
Comparative study of morphology and surface composition of Al-Cr-Fe alloy powders produced by water and gas atomisation technologies Krajnikov A, Likutin VV, Thompson GE |
329 - 337 |
Formation of tubular silicon carbide from a carbon-silica material by using a reactive replica technique: infra-red characterisation Vix-Guterl C, Alix I, Gibot P, Ehrburger P |
338 - 345 |
The effect of the proton on electropolymerization of the thiophene Can M, Sevin F, Yildiz A |
346 - 352 |
The thermal spreading of antimony oxides onto Fe2O3 Huang Y, Wang GJ, Valenzuela RX, Corberan VC |
353 - 358 |
Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors Zhao YN, Wang YJ, Gong H, Shao JD, Fan ZX |
359 - 367 |
Cuprite, paramelaconite and tenorite films deposited by reactive magnetron sputtering Pierson JF, Thobor-Keck A, Billard A |