화학공학소재연구정보센터

Electrochemical and Solid State Letters

Electrochemical and Solid State Letters, Vol.3, No.2 Entire volume, number list
ISSN: 1099-0062 (Print) 

In this Issue (15 articles)

63 - 65 A novel flame-retardant additive for lithium batteries
Lee CW, Venkatachalapathy R, Prakash J
66 - 68 Thermal stability of LiFePO4-based cathodes
Andersson AS, Thomas JO, Kalska B, Haggstrom L
69 - 72 Electrochemical deposition of a single phase of pure Cu2O films by current modulation methods
Lee J, Tak Y
73 - 76 Texturization of semiconductor surfaces: ZnTe
Zenia F, Levy-Clement C, Triboulet R, Konenkamp R
77 - 79 Preparation of peroxodisulfuric acid using boron-doped diamond thin film electrodes
Michaud PA, Mahe E, Haenni W, Perret A, Comninellis C
80 - 83 Properties and gap-fill capability of HPD-CVD phosphosilicate glass films for subquarter-micrometer ULSI device technology
Vassiliev VY, Lin C, Fung D, Hsieh J, Sudijono JL
84 - 86 Ultrathin 600 degrees C wet thermal silicon dioxide
Appenzeller J, del Alamo JA, Martel R, Chan K, Solomon P
87 - 89 Ultrasmooth GaN etched surfaces using photoelectrochemical wet etching and an ultrasonic treatment
Shelton BS, Zhu TG, Wong MM, Kwon HK, Eiting CJ, Lambert DJH, Turini SP, Dupuis RD
90 - 92 A New Approach for the study of chemical mechanical polishing
Devecchio D, Schmutz P, Frankel GS
93 - 94 Oxidation-induced stacking faults introduced by using a cavitating jet for gettering in silicon
Soyama H, Kumano H
95 - 98 Chemical mechanical polishing of Ta
Hariharaputhiran M, Li Y, Ramarajan S, Babu SV
99 - 102 C2F6/O-2 and C3F8/O-2 plasmas SiO2 etch rates, impedance analysis, and discharge emissions
Entley WR, Hennessy WJ, Langan JG
103 - 105 Effects of polysilicon gate doping concentration on plasma charging damage in ultrathin gate oxides
Chen CC, Lin HC, Chang CY, Huang TY, Chien CH, Liang MS
106 - 109 Ambient temperature oxygen sensors: Morphological effects of PbSnF4 incorporated in the sensing electrode on response
Suda S, Eguchi T, Kuwano J
110 - 112 Observation of energy transfer between Al3+ and Pr3+ in SrTiO3 phosphor
Park JK, Ryu H, Kim KH, Park HD