Electrochemical and Solid State Letters

Electrochemical and Solid State Letters, Vol.14, No.6 Entire volume, number list

ISSN: 1099-0062 (Print)

In this Issue (28 articles)

C9 - C11	A High-Throughput Test Methodology for Atmospheric Corrosion Studies Azmat NS, Ralston KD, Muster TH, Muddle BC, Cole IS
A83 - A85	Nanoparticle Facilitated Charge Transfer and Voltage of a High Capacity VB2 Anode Licht S, Ghosh S, Wang BH, Jiang DL, Asercion J, Bergmann H
A86 - A89	Synthesis and Characterization of Li(Co0.5Ni0.5)PO4 Cathode for Li-Ion Aqueous Battery Applications Minakshi M, Sharma N, Ralph D, Appadoo D, Nallathamby K
A90 - A92	DMSO-Assisted Liquid-Phase Synthesis of LiFePO4/C Nanocomposites with High-Rate Cycling as Cathode Materials for Lithium Ion Batteries Chang ZR, Liu Y, Tang HW, Yuan XZ, Wang HJ
A93 - A96	Electrodeposited Manganese Oxide on Nickel Foam-Supported Carbon Nanotubes for Electrode of Supercapacitors Zhao DD, Yang Z, Zhang LY, Feng XL, Zhang YF
A97 - A99	Lisicon Glass-Ceramics Mediated Catalysis of Oxygen Reduction Kumar B, Kichambare P, Rodrigues S, Kumar J, Keil RG
B51 - B54	Through-Plane Water Transport Visualization in a PEMFC by Visible and Infrared Imaging Daino MM, Lu Z, LaManna JM, Owejan JP, Trabold TA, Kandlikar SG
B55 - B58	Nitrogen Precursor Effects in Iron-Nitrogen-Carbon Oxygen Reduction Catalysts Nallathambi V, Leonard N, Kothandaraman R, Barton SC
B59 - B62	Thermally Stable Organic Solar Cells Using Small Molecule Exciton Blocking Layer Yook KS, Jeon SO, Kim OY, Lee JY
D63 - D67	Highly Selective Cu Electrodeposition for Filling Through Silicon Holes Dow WP, Lu CW, Lin JY, Hsu FC
D68 - D71	Electroless Deposition of Cobalt Nanowires in an Aqueous Solution under External Magnetic Field Balela MDL, Yagi S, Matsubara E
D72 - D75	Electrodeposition of Ni-Rich Alloys from an Acidic Deposition Solution by a Normal Codeposition Mechanism Verdin AAO, Borges RO, Cordova GT, Vong YM
E21 - E24	Synthesis of Step-Shaped Bismuth Nanowires-An Approach Towards the Fabrication of Self-Homojunction Panda SK, Han D, Yoo H, Shin H, Park H, Xu J
G31 - G34	Structure and Electrical Properties of (Pr, Mn)-Codoped BiFeO3/B-Doped Diamond Layered Structure Kawae T, Hori Y, Nakajima T, Kawasaki H, Tokuda N, Okamura S, Takano Y, Morimoto A
G35 - G37	Direct Observation of Hole Current in Amorphous Oxide Semiconductors under Illumination Chung YJ, Kim JH, Kim UK, Cho DY, Jung HS, Jeong JK, Hwang CS
G38 - G41	Electrical Properties of Bi2Ti2O7 Thin Films Grown at Low Temperature by the Pulsed Laser Deposition Kang LS, Kim JS, Sun JW, Kweon SH, Song ME, Paik DS, Sung TH, Nahm S
G42 - G44	Rapid Growth of Oxide Films on SiC by Photo-Assisted Mechanism Constant A, Camara N, Montserrat J, Camassel J, Godignon P
J23 - J25	Compact YSZ-Rod-Based Hydrocarbon Sensor Utilizing Metal-Oxide Sensing-Electrode and Mn-Based Reference-Electrode Combination Jin H, Plashnitsa VV, Breedon M, Miura N
J26 - J29	Analysis of the Hall Effect in Micro Poly-Si Hall Devices and Origin of Offset Voltages Yamaguchi Y, Hashimoto H, Segawa T, Kimura M
K33 - K35	Ultraviolet Photoresponse of TiO2 Nanotube Arrays Fabricated by Atomic Layer Deposition Liu CM, Chen C, Cheng HE
A100 - A103	Synthesis and Electrochemical Properties of Ca-Substituted Li0.44MnO2 Fukabori A, Hayakawa H, Kijima N, Akimoto J
H229 - H231	Enhancement-Mode AlGaN/GaN HEMTs Fabricated by Standard Fluorine Ion Implantation with a Si3N4 Energy-Absorbing Layer Chen HW, Wang MJ, Chen KJ
H232 - H234	Au-Induced Low-Temperature (similar to 250 degrees C) Crystallization of Si on Insulator Through Layer-Exchange Process Park JH, Kurosawa M, Kawabata N, Miyao M, Sadoh T
H235 - H237	H2O-Assisted O-2 Adsorption in Sol-Gel Derived Amorphous Indium Gallium Zinc Oxide Thin Film Transistors Chung WF, Chang TC, Li HW, Chen SC, Chen YC, Tseng TY, Tai YH
H238 - H240	Electrical Charging/Discharging Properties of Organic Memory Device Using CdSe Nanoparticles/PMMA Blend as the Tunneling Layer Kim JM, Lee DH, Yoon TS, Lee HH, Lee JW, Kim YS
H241 - H243	Millisecond Flash Annealing as a Flatband Voltage Shift Enabler for p-Type Metal-Oxide-Semiconductor Devices with High-k/Metal Gate Choi C, Narayanan V
H244 - H246	Roles and Effects of TiN and Pt Electrodes in Resistive-Switching HfO2 Systems Goux L, Wang XP, Chen YY, Pantisano L, Jossart N, Govoreanu B, Kittl JA, Jurczak M, Altimime L, Wouters DJ
H247 - H249	Amorphous Oxide Thin Film Transistors with Methyl Siloxane Based Gate Dielectric on Paper Substrate Choi N, Khan SA, Ma XX, Hatalis M