D5 - D7 |
Electrochemical synthesis of sodium peroxycarbonate at boron-doped diamond electrodes Saha MS, Furuta T, Nishiki Y |
L3 - L3 |
Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology (vol 6, pg G69, 2003) Chang TC, Tsai TM, Liu PT, Mor YS, Chen CW, Sheu JT, Tseng TY |
C97 - C99 |
Deposition of low resistivity copper conductive layers by electroplating from a copper hexafluorosilicate solution Hara T, Shimura Y, Toida H |
F21 - F23 |
Physical and electrical properties of Zr-silicate dielectric layers deposited by atomic layer deposition Rittersma ZM, Naburgh E, Dao T, Hendriks AHC, Besling WFA, Tois E, Vainonen-Ahlgren E, Tuominen M, Haukka S |
G85 - G87 |
Stability investigation of single-wafer process by using a spin etcher Kang TK, Wang CC, Tsui BY, Yang WL, Chien FT, Yang SY, Chang CY, Li YH |
G88 - G90 |
Formation of large highly textured crystalline Si film on SiO2 Huh H, Kim HS, Youm DJ, Shin JH |
G91 - G94 |
In situ AFM study of surface layer removal during copper CMP Berdyyeva TK, Emery SB, Sokolov IY |
G95 - G97 |
Tunneling component of the ballistic current in ultimate double-gate devices Autran JL, Munteanu D |
G98 - G100 |
The self-annealing phenomenon in copper interconnection Hara T, Toida H, Shimura Y |
H13 - H15 |
Luminescence properties of GdOBr : Tb green phosphors Park JK, Kim CH, Han CH, Park HD, Choi SY |
A125 - A128 |
PEMFC anode with very low Pt loadings using pulsed laser deposition Cunningham N, Irissou E, Lefevre M, Denis MC, Guay D, Dodelet JP |
A129 - A132 |
Electrochemical performance of SiAlSn films prepared by combinatorial sputtering Hatchard TD, Topple JM, Fleischauer MD, Dahn JR |
A133 - A135 |
Effect of transient ammonia concentrations on PEMFC performance Soto HJ, Lee WK, Van Zee JW, Murthy M |
A136 - A139 |
Analysis of the chemical composition of the passive film on Li-ion battery anodes using attentuated total reflection infrared Spectroscopy Zhuang GRV, Ross PN |
A140 - A143 |
Electrophoretic fabrication and cell performance of dense Sr- and Mg-doped LaGaO3-based electrolyte films Matsuda M, Ohara O, Murata K, Ohara S, Fukui T, Miyake M |
A144 - A148 |
Chemical analysis of graphite/electrolyte interface formed in LiBOB-based electrolytes Xu K, Lee U, Zhang SS, Wood M, Jow TR |
C100 - C102 |
Structure and room-temperature recrystallization of electrodeposited copper Vas'ko VA, Tabakovic I, Riemer SC |