Indian Journal of Chemical Technology, Vol.9, No.2, 97-102, 2002
Removal of heavy metal ions using novel polystyrene supported chelating polymer resins
A novel polystyrene supported chelating resins have been synthesized by the reaction of chloro-methylated polystyrene (CMPS) with 4-hydroxy benzoic acid, glycine, the Schiff base (derived from anthranilic acid and 4-hydroxy benzaldehyde) and diethanolamine. These resins have been further investigated by thermogravimetry and differential thermal analyses and their energy of activation was calculated. Heavy metal ions viz. Pb(II) and Cd(II) have been removed by using these chelating polymer resins. Metal uptake efficiency, reusability of resins, effect of pH and time on the metal removal, were also studied. Amount of metal removed by the resin was determined by using Atomic Absorption Spectrophotometer (AAS).