The metal ion uptake characteristics of two new chelating resins, o-HB-DDM-HCHO and o-HB-DD-HCHO, were examined towards transition metal ions like Cu2+, Ni2+ and UO22+ under both competitive and non-competitive conditions. The resin o-HB-DDM-HCHO was found to be more effective in removing metal ions in comparison to resin o-HB-DD-HCHO. Preferential adsorption of Cu2+ by both the resins was observed from the mixture of salt solution. Elution of the sorbed metal ions using dilute HCl resulted in removal of nearly 30-40% of the loaded Cu2+ and 34-45% of loaded UO22+ from the resin column.