Plasma Chemistry and Plasma Processing, Vol.28, No.4, 429-466, 2008
Plasma reactivity and plasma-surface interactions during treatment of toluene by a dielectric barrier discharge
Toluene removal is investigated in filamentary plasmas produced in N(2) and in N(2)/O(2) mixtures by a pulse high voltage energised DBD. Influence of the oxygen percentage (lower than 10%) and of the temperature (lower than 350C) is examined. Toluene is removed in N(2) through collisions with electrons and nitrogen excited states. The removal efficiency is a few higher in N(2)/O(2). It increases when the temperature increases for N(2) and N(2)/O(2). Both H- and O-atoms play an important role in toluene removal because H can readily recombine with O to form OH, which is much more reactive with toluene than O. H follows from dissociation of toluene and of hydrogenated by-products by electron collisions. Detection of cyanhidric acid, acetylene, formaldehyde, and methyl nitrate strengthens that dissociation processes, to produce H and CH(3), must be taken into account in kinetic analysis. Formation and treatment of deposits are also analysed.