Plasma Chemistry and Plasma Processing, Vol.30, No.2, 281-286, 2010
CCl4 Decomposition in RF Thermal Plasma in Inert and Oxidative Environments
The decomposition of carbon tetrachloride was investigated in an RF inductively coupled thermal plasma reactor in inert CCl4-Ar and in oxidative CCl4-O-2-Ar systems, respectively. The exhaust gases were analyzed by gas chromatography-mass spectrometry. The kinetics of CCl4 decomposition at the experimental conditions was modeled in the temperature range of 300-7,000 K. The simulations predicted 67.0 and 97.9% net conversions of CCl4 for CCl4-Ar and for CCl4-O-2-Ar, respectively. These values are close to the experimentally determined values of 60.6 and 92.5%. We concluded that in RF thermal plasma much less CCl4 reconstructed in oxidative environment than in an oxygen-free mixture.