The present paper describes a new method for manufacturing a nanostructured porous layer of TiO2 on a conducting glass substrate for use in a dye-sensitized photoelectrochemical cell. The method involves deposition of a layer of semiconductor particles onto a conducting substrate and compression of the particle layer to form a mechanically stable, electrically conducting, and porous nanostructured film at room temperature. Photoelectrochemical characteristics and morphology of the resulting nanostructured films are presented. The potential use of the new manufacturing method in the future applications of nanostructured systems is discussed. (C) 2002 Elsevier Science B.V. All rights reserved.