Here we review the different methods used to create thin-film silicon solar cells on the most suitable ceramic substrates, namely alumina and mullite. The chemical vapor deposition (CVD) process on bare ceramics, the CVD on glassy layers (CVD-OGL) process, and the aluminum-induced crystallization (AIC) technique are reported and compared in terms of grain size, grain distribution and crystallographic orientation. The electrical quality of such layers was investigated through their open-circuit voltage before and after hydrogenation. Values up to 410mV were measured on n(+)p mesa cell structures on ceramics. (c) 2005 Elsevier B.V. All rights reserved.