Nb-doped TiO2 films have been fabricated by RF magnetron sputtering as protective material for transparent-conducting oxide (TCO) films used in Si thin film solar cells. It is found that TiO2 has higher resistance against hydrogen radical exposure, utilizing the hot-wire CVD (catalytic CVD) apparatus, compared with SnO2 and ZnO. Further, the minimum thickness of TiO2 film as protective material for TCO was experimentally investigated. Electrical conductivity of TiO2 in the asdeposited film is found to be similar to 10(-6) S/cm due to the Nb doping. Higher conductivity of similar to 10(-2) S/Cm is achieved in thermally annealed films. Nitrogen treatments of Nb-doped TiO2 film have been also performed for improvements of optical and electric properties of the film. The electrical conductivity becomes 4.5 x 10(-2) S/cm by N-2 annealing of TiO2 films at 500 degrees C for 30 min. It is found that the refractive index n of Nb-doped Tio(2) films can be controlled by nitrogen doping (from n = 2.2 to 2.5 at lambda = 550 nm) using N-2 as a reactive gas. The controllability of n implies a better optical matching at the TCO/p-layer interface in Si thin film solar cells. (c) 2006 Elsevier B.V. All rights reserved.