Transparent conducting films of Ga-doped ZnO (GZO) and Ga-, B-codoped ZnO (GZOB) were deposited by dc magnetron sputtering. The dependence of the electrical and structural properties on the type of doping (Ga-doping or Ga-, B-codoping) and substrate temperature were investigated. Microstructural analysis suggests that the substrate temperature and the type of doping modify the microstructure and surface morphology of thin films. GZOB films grown at 200 degrees C showed a dense structure without columns, a low-resistivity value of 4.2 x 10(-4) Omega cm, and a visible transmission of 90% with a thickness of 200 nm. In addition, the thermal stability of resistivity of GZOB films was greater than one of GZO films. (c) 2006 Elsevier B.V. All rights reserved.