A deposition rate model for CdTe via close-spaced sublimation spanning the sublimation and diffusion-limited cases is presented. The approach consists of applying governing equations for each of the two limiting cases and selecting the minimum rate. The model is validated by comparing it to two experimental datasets and adjusting two fitting parameters so that a good quantitative fit is obtained. A good quantitative fit was obtained using the fitting parameter values of alpha = 0.36 and beta = 0.035 for all the datasets, spanning the sublimation and diffusion-limited cases. This gives confidence that the model is accurate and indicates that the fitting parameters represent physical phenomena. The model was validated within the temperature range from 400 to 600 degrees C, pressures from 10(-2) to 760 Torr, and substrate source distances from 0.87 to 1 mm but could have greater range of applicability. (C) 2008 Elsevier B.V. All rights reserved.