화학공학소재연구정보센터
Solar Energy Materials and Solar Cells, Vol.94, No.5, 921-923, 2010
Low temperature deposited boron nitride thin films for a robust anti-reflection coating of solar cells
Polycrystalline boron nitride thin films deposited at low temperatures (<200 degrees C) are shown here to be well adapted for anti-reflection coating of solar cells. The analyses of the optical properties reveal a nearly constant index of refraction (similar to 2.8) and negligible transmission losses over the useful range of the solar spectrum. Boron nitride thin films are found to be well adapted for integration as antireflection coating layers in multi-junction terrestrial and space solar cells due to their spectral stability, their robust ceramic nature and a fairly wide bandgap (6.2 eV). Test fabrication of double layer MgF2/BN anti-reflection coating on GaAs and Si demonstrated minimal reflection losses (<5%) over a wide window of the solar irradiance (1.1-3 eV). (C) 2010 Published by Elsevier B.V.