The influence of the gate voltage on photoconductivity in P-Si/SiO2/(nano)crystalline PbS, Metal-Oxide Semiconductor Field-Effect Transistor (MOSFET)-like structures is investigated. The effect on the photo-signal in the wavelength range 500-1180 nm is opposite compared to the effect in the wavelength range 1600-2500 nm: a negative gate voltage increases the signal in the short wavelength range and decreases it for the long wavelength range. The opposite is valid for a positive gate bias. An on-off ratio better than 85 times is obtained for the spectral range 500-1180 nm, corresponding to the absorption in p-Si and better than 3.5 times for the spectral range 1600-2500 nm corresponding to the absorption in the (nano)crystal line PbS region, respectively. (c) 2007 Elsevier B.V. All rights reserved.