We employ textured alpha-Cr2O3 thin films as templates for growth of alpha-Al2O3 by reactive inductively coupled plasma magnetron sputtering. The texture of the template has a strong influence on the nucleation and growth of alpha-Al2O3. Extended growth of alpha-Al2O3 at a substrate temperature of 450 degrees C is obtained using a predominantly [10 (1) over bar4]-textured alpha-Cr2O3 template layer, while only limited alpha-Al2O3 nucleation is seen on a [0001]-textured alpha-Cr2O3 template. (C) 2008 Elsevier B.V. All rights reserved.