화학공학소재연구정보센터
Thin Solid Films, Vol.516, No.23, 8749-8751, 2008
Post-heating of SiO2 films for optical coatings
Thin films of SiO2 have been prepared by reactive electron-beam evaporation at substrate temperatures of 200 to 300 degrees C and post-heating also in this temperature range. Typical values of the refractive index were 1.48 for as-deposited samples. The refractive index decreases with increasing post-heating temperature. Post-heated samples are more homogeneous and more stable in their optical properties. This behaviour is probably due to annealing of point defects and improves the films' properties as low-index material. (C) 2008 Elsevier B.V. All rights reserved.