화학공학소재연구정보센터
Thin Solid Films, Vol.517, No.2, 779-781, 2008
Transmission electron microscopy study on silicon nitride/stainless steel bonded interfaces
The reaction zone of a diffusion bonded Si(3)N(4)/stainless steel (ss) interface formed at 1100 degrees C was analyzed by transmission electron microscopy and X-ray diffraction (XRD). Besides the formation of various iron silicides, iron nitride and chromium nitride phases detected by XRD, Cr(3)Ni(5)Si(2) crystals were identified at the interface by TEM. (C) 2008 Elsevier B.V. All rights reserved.