A novel method for processing sub-50 nm structures by using carbon nanotube (CNT) masks and integrating quantum dots (QDs) on patterned polymer substrates has been established. Poly(styrene-alt-maleic anhydride) (PSMa) was prepared by the initiated chemical vapor deposition (iCVD) method, an alternative to spin-on deposition. The sub-50 nm PSMa polymer patterns were prepared by low energy oxygen plasma etching by using CNTs as the masks. The water soluble, amine-functionalized QDs underwent the nucleophilic acyl substitution reaction with the PSMa containing anhydride functional groups. This integration method was designed to incorporate high performance QDs on inexpensive, lightweight flexible substrates. (c) 2009 Elsevier B.V. All rights reserved.