Low-temperature plasma-enhanced diamond like carbon (DLC) film chemical deposition technique is developed. Emission spectra of plasma is digitized and processed for deposition process control. Electric field - transversely applied to plasma stream - permits to obtain coatings with predefined properties. The influence of this field on plasma characteristics and hence - on the properties of deposited coatings is studied. The specific resistance of nitrogen doped, hydrogenised DLC films could be varied from typically isolators down to -10(-4) Ohm cm. The coatings were of n-type. Mobility of major carriers approaches up to 40 cm(2)V(-1)s(-1) depending on the technological parameters. Obtained films were durable, transparent and have high refractive index reaching up to 3.1. (C) 2009 Elsevier B.V. All rights reserved.