Thin Solid Films, Vol.518, No.1, 269-273, 2009
Oxide heterogrowth on ion-exfoliated thin-film complex oxide substrates
Fabrication of a bilayer HfO(2)/single-crystal LiNbO(3) film is demonstrated using deep high-energy He(+) implantation in a LiNbO(3) wafer, followed by HfO(2) atomic layer deposition, and, then, selective etching exfoliation from the bulk LiNbO(3) crystal. The properties and morphology of these exfoliated bilayer films are characterized using a set of thin-film probes. Pre-exfoliation film patterning and one model application, in surface-refractive-index tuning of guided waves in a free-standing LiNbO(3) film, are also demonstrated. (C) 2009 Elsevier B.V. All rights reserved.