(AlCrTaTiZr)O-x films were deposited at 350 degrees C by DC magnetron sputtering from high-entropy alloy target. Oxygen concentration increases with oxygen flow ratio, and saturates near 67 at.%. As-deposited films have an amorphous structure. Their hardness fall in the range of 8-13 GPa. All amorphous oxide films maintain their amorphous structure up to 800 degrees C for at least 1 h. After 900 degrees C 5 h annealing, crystalline phases with the structures of ZrO2, TiO2, or Ti2ZrO6 form. Annealing enhances mechanical properties of the films. Their hardness and modulus attain to the values about 20 and 260 GPa, respectively. The resistivity of the metallic films is around 10(2) mu Omega cm but drastically rises to 10(12) mu Omega cm when oxygen concentration increases. (C) 2009 Elsevier B.V. All rights reserved.