Thin Solid Films, Vol.518, No.13, 3506-3508, 2010
Growth of well-aligned carbon nanotubes by RF-DC plasma chemical vapor deposition
Highly aligned carbon nanotubes (CNTs) were grown under high sheath electric field and gas pressure conditions by the radio frequency (RF) plasma-enhanced direct current (DC) plasma chemical vapor deposition (CVD) method due to a stabilized DC discharge. The uniform growth of highly aligned multi-walled CNTs was achieved over the entire surface area of a 50 x 50 mm(2) iron foil. The growth of multi-walled CNTs on a 75 x 75 mm(2) iron foil was also confirmed. (C )2009 Elsevier B.V. All rights reserved.
Keywords:Carbon nanotubes;DC plasma;Plasma chemical vapor deposition;Sheath;Ion bombardment;Aligned growth