Thin Solid Films, Vol.518, No.23, 7075-7080, 2010
Surface planarization and masked ion-beam structuring of YBa2Cu3O7 thin films
Surface planarization and masked ion-beam structuring (MIBS) of high-T-c superconducting (HTS) YBa(2)Cu(3)O7-delta(YBCO) thin films grown by pulsed-laser deposition (PLD) method is reported. Chemical-mechanical polishing, plasma etching, and oxygen annealing of YBCO films strongly reduce the particulate density (similar to 10(-2) X) and surface roughness (similar to 10(-1) x) of as-grown PLD layers. The resistivity, critical temperature T-c approximate to 90 K and critical current density J(c) (77 K)> 1 MA/cm(2) of films are not deteriorated by the planarization procedure. The YBCO films are modified and patterned by irradiation with He ions of 75 key energy. Superconducting tracks patterned by MIBS without removal of HIS material and, for comparison, by wet-chemical etching show same T-c and J(c) (T) values. Different micro- and nano-patterns are produced in parallel on planarized films. The size of irradiated pattern depends on the mask employed for beam shaping and features smaller than 70 nm are achieved. (C) 2010 Elsevier B.V. All rights reserved.
Keywords:High temperature superconductors;Pulsed-laser deposition;Thin films;Surface planarization;Ion irradiation;Masked ion-beam structuring